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Books and Other Publications Presentations Industrial Property Rights Research Projects Educational Activities Contributions Social Activities Media Coverage Other Masaru Nakagawa Section Institute of Multidisciplinary Research for Advanced Materials Job title Professor Degree 博士（工学）（上智大学） 修士（工学）（上智大学） researchmap https://researchmap.jp/read0143910 J-GLOBAL ID 200901089441194667 e-Rad No. 10293052 ORCID https://orcid.org/0000-0001-7735-0453 Research History 7 2021/04 - Present Tohoku University Institute of Multidisciplinary Research for Advanced Materials 2008/10 - Present Tohoku University Institute of Multidisciplinary Research for Advanced Materials Professor 2020/04 - 2021/03 Tohoku University Institute of Multidisciplinary Research for Advanced Materials 2017/04 - 2020/03 Tohoku University Institute of Multidisciplinary Research for Advanced Materials 2007/04 - 2008/09 Tokyo Institute of Technology Chemical Resources Laboratory Associate Professor 2002/11 - 2007/03 Tokyo Institute of Technology Chemical Resources Laboratory Associate Professor 1997/04 - 2002/10 Tokyo Institute of Technology Chemical Resources Laboratory Assistant Professor Show all Show first 5 Education 4 Sophia University Graduate School of Science and Technology Department of Applied Chemistry 1994/04 - 1997/03 Sophia University Graduate School of Science and Technology Department of Applied Chemistry 1992/04 - 1994/03 Sophia University Faculty of Science and Engineering Department of Chemistry 1988/04 - 1992/03 市川高等学校 - 1988/03 Committee Memberships 31 公益社団法人 高分子学会 第73 回高分子学会年次大会運営委員 2023/08 - Present 第29回ホトマスクジャパン 組織副委員長 2023/05 - Present 公益社団法人 応用物理学会ナノインプリント技術研究会 運営副委員長 2023/01 - Present 国立大学法人 東北大学 多元物質科学研究所 マテリアル・計測ハイブリッド研究センター長 2022/04 - Present 公益社団法人 高分子学会 印刷･情報･電子用材料研究会運営委員 2022/04 - Present 応用物理学会 次世代リソグラフィ技術研究会 分科会 運営幹事 2021/04 - Present 公益社団法人 高分子学会 東北支部 常任幹事 2017/04 - Present Photomask Japan Organizing Committee Vice Chair 2022/05 - 2023/04 21th International Conference on Nanoimprint and Nanoprint Technology (NNT 2022) Organizing Committee Vice Chair 2020/02 - 2022/12 公益社団法人応用物理学会 ナノインプリント技術研究会 運営委員 2008/02 - 2022/12 Photomask Japan 2022 Organizing Committee Vice Chair 2021/05 - 2022/04 公益社団法人 応用物理学会 極限ナノ造形・構造物性研究会 運営委員長 2015/01 - 2020/12 高分子学会 第 69 回高分子討論会運営委員 2019/10 - 2020/09 Photomask Japan 2020 Organizing Committee Vice Chair 2019/05 - 2020/04 Photomask Japan 2019 Organizing Committee Vice Chair 2018/05 - 2019/04 公益社団法人 高分子学会 第31期高分子基礎物性研究会運営委員 第33期高分子基礎物性研究会運営委員 運営委員 2012/06 - 2018/05 理化学研究所 若手研究人材育成制度推進委員会 審査部会委員 2014/05/01 - 2017/03/31 公益社団法人 高分子学会 東北支部 幹事 2014/04 - 2016/03 日本学術振興会 科学研究費委員会 専門委員 2014/08 - 2015/07 公益財団法人 応用物理学会 シングルナノパターニング研究グループ 副委員長 2013/01 - 2014/12 13th International Conference on Nanoimprint and Nanoprint Technology (NNT 2014) 組織委員会 実行委員長 2013/11 - 2014/10 社団法人 高分子学会 第31期 高分子基礎物性研究会 運営委員 2012/06 - 2014/05 12th International Conference on Nanoimprint and Nanoprint Technology (NNT 2013) 組織委員会 国際プログラム委員 2012/11 - 2013/10 第30期前期「高分子」編集委員会 委員 2010/06 - 2012/05 公益社団法人 高分子学会 第28期企画委員会委員 委員 2006/06 - 2008/06 公益社団法人 高分子学会 第28期「高分子」編集委員会 委員 2006/06 - 2008/05 社団法人 日本化学会 代議員 2005/11 - 2007/10 独立行政法人 産業技術総合研究所 中部センター「分子集積化技術と新産業育成フォーラム」 委員 2005/10 - 2006/09 社団法人 表面技術協会 ナノテク部会 企画幹事 2005/04 - 2006/03 財団法人 理工学振興会 技術顧問 2003/07 - 2004/03 公益社団法人 高分子学会 第30期「高分子」編集委員会 委員 Show all ︎Show first 5 Research Interests 8 laser-drilled screen printing demolding molecular layer adhesion molecular layer photopolymer fluorescence alignment polymer resist material nanoimprint functional monolayer Research Areas 3 Nanotechnology/Materials / Thin-film surfaces and interfaces / Nanotechnology/Materials / Polymer materials / Nanotechnology/Materials / Nano/micro-systems / Awards 9 Best Poster Award 2017/11 The 16th International Conference on Nanoimprint and Nanoprint Technology (NNT2017) Increase in viscosity of a low-viscosity monomer The third best short presentation for a poster/The First A3 Metamaterials Forum 2016/07/06 The First A3 Metamaterials Forum Fabrication of split-ring resonator arrays with 20-nm-wide gaps fabricated by UV nanoinprint lithography The Photopolymer Science and Technology Award NO.152200, the Best Paper Award 2015 2015/06/25 The 32nd International Conference of Photopolymer Science and Technolog（第32回 国際フォトポリマーコンファレンス） Breakthrough Achievement In Nanoimprint Lithography using PFP Condensable Gas Poster Award 2014/07/25 The 18th International Symposium on Advanced Display Materials and Devices (ADMD 2014, Sendai, Japan) Decrease of demolding energy in UV nanoimprinting using molecular and 論文賞 2011/05/30 社団法人粉体粉末冶金協会協会 FePt/SiO2複合型磁性ナノ粒子の作製 ＭＮＣ2009 Award for Most Impressive Poster 2010/11/10 23nd International Microprocesses and Nanotechnology Conference (MNC2010) Fluorescent UV-Curable Resists for UV Nanoimprint Lithography Best Poster Award 2nd Prize 2007/10/06 The 6th International Conference on Nanoimprint and Nanoprint Technology (NNT2007) Gel permeation printing of oleophilic gold nanoparticles 高分子学会日立化成賞 2005/09/21 高分子学会 精密化学めっきのために設計された高分子組織体表面 東京工業大学挑戦的研究賞 2004/12/03 東京工業大学 新規な磁性ニッケルナノチューブを利用した電子素子材料の開発 Show all ︎Show 5 Papers 182 Strong Light Confinement by a Plasmon-Coupled Parabolic Nanoresonator Array Tomoya Oshikiri, Toshiaki Hayakawa, Hiromasa Niinomi, Masaru Nakagawa The Journal of Physical Chemistry C 2024/03/14 Publisher: American Chemical Society (ACS) DOI： 10.1021/acs.jpcc.3c07224 ISSN：1932-7447 eISSN：1932-7455 Effect of thickness of surface silicon oxide on liquid advancement in nanogaps between synthetic quartz mold and silicon substrate surfaces in UV nanoimprinting Peer-reviewed Masaru Nakagawa, Akiko Onuma, Hiromasa Niinomi, Toshiya Asano, Shintaro Itoh, Kenji Fukuzawa Japanese Journal of Applied Physics 2024/02/14 Publisher: IOP Publishing DOI： 10.35848/1347-4065/ad2978 ISSN：0021-4922 eISSN：1347-4065 More details Close Abstract To understand the phenomenon in which shear stress increases in nanogaps between mold and substrate surfaces during alignment in ultraviolet (UV) nanoimprinting, we investigate the liquid advancement of UV-curable droplets on modified silicon surfaces. The droplets are pressed with a flat modified surface of a synthetic quartz mold, and the transformed droplets are cured individually. Subsequently, the mold is detached and the shapes of the transformed droplets are observed. Scanning electron microscopy is performed to determine whether the transformed shapes are affected by the pressing force and holding time under a fixed applied force. The areas on which the droplets spread on the modified silicon substrates are almost independent of the pressing force and holding time, whereas the thickness of the surface silicon oxide layer affects the liquid advancement of the UV-curable droplets sandwiched between the modified mold and substrate surfaces in the nanogaps. Selecting adhesive molecular layers with matched surface free energy and chemisorption for shape-fixed UV-cured thin films fabricated by micro-printing and nano-imprinting Peer-reviewed Masaru Nakagawa, Kanta Kawasaki, Akiko Onuma, Hiromasa Niinomi Japanese Journal of Applied Physics 62 SG1010-1-SG1010-10 2023/02 DOI： 10.35848/1347-4065/acb55c Photo-oxidative degradation of fluorinated chemisorbed monolayers studied by contact angle measurements and time-of-flight secondary ion mass spectrometry Peer-reviewed Kanta Kawasaki, Rie Shishido, Hiromasa Niinomi, Akiko Onuma, Masaru Nakagawa Japanese Journal of Applied Physics 62 SG1009-1-SG1009-7 2023/02 DOI： 10.35848/1347-4065/acb55b Fluorescence alignment simulation for atomic-scale position adjustment in ultraviolet nanoimprint lithography Peer-reviewed Hiromasa Niinomi, Subaru Harada, Toshiaki Hayakawa, Masaru Nakagawa Journal of Vacuum Science & Technology B 40 (6) 062602-1-062602-9 2022/12 Publisher: American Vacuum Society DOI： 10.1116/6.0002099 ISSN：2166-2746 eISSN：2166-2754 More details Close The alignment process of ultraviolet (UV) nanoimprint lithography requires a further sophisticated method to detect infinitesimal misalignments between a synthetic quartz mold and a silicon substrate. Previously, we proposed a fluorescence-alignment method based on the analysis of the additive-type moiré fringes generated by the interferences of fluorescence emission from fluorescent UV-curable liquid filling the concave bar-mark arrays on a synthetic quartz mold and a silicon substrate. The proposed method significantly reduces the cost of mold fabrication and simplifies the in-liquid process compared to the conventional method based on multiplicative-type moiré fringes prevailing in the industry. This is because the fluorescence-alignment method is free from the problem of the refractive index matching between mold and UV-curable liquid materials. However, its position accuracy remains as large as sub-10 nm scales in principle. In this study, through simulation using image drawing and analysis software, we demonstrate that a sophisticated fluorescence alignment can realize atomic-scale precision for position accuracy by attempting the following concepts: (i) the application of the principle on position determination of a fluorescent single-molecule to that of an individual bar-mark fluorescence signal; (ii) effective use of high bit-depth of recent imaging devices; and (iii) accumulations of the information on the positions of multiple bar-marks with periodicities by fitting their fluorescence intensity profiles using a periodic function. Micro-print and nano-imprint methods combining laser-drilled screen printing and ultraviolet nanoimprint lithography: a review Peer-reviewed Masaru Nakagawa Japanese Journal of Applied Physics 61 (SD) SD0805-1-SD0805-9 2022/06/01 Publisher: IOP Publishing DOI： 10.35848/1347-4065/ac575f ISSN：0021-4922 eISSN：1347-4065 More details Close Abstract Ultraviolet (UV) nanoimprint lithography consists of molding–demolding and lithographic etching processes, which enable the shape transfer of molded resist patterns to underlying substrate surfaces. UV nanoimprint lithography has been applied in various fields, including optics, electronics, biology, and energy engineering. An important key to shape transfer through resist masks is to level the thicknesses of thin residual layers. To solve this issue, the region-selective placement of UV-curable droplets on a substrate is effective for leveling the thickness of the residual layer regardless of the differences in mold pattern density. Herein, we developed laser-drilled screen printing that allows the quantitative placement of high-viscosity UV-curable liquids on substrate surfaces via screen printing using a polyimide through-hole stencil mask prepared via ultrashort-pulse laser drilling. This review explains the practical demonstrations of UV nanoimprint lithography involving laser-drilled screen printing: nano/micro fabrication of Au split ring resonators, Au four-terminal electrodes, and silicon line patterns. Nondestructive X-ray reflectivity analysis of Al distributions of ultraviolet-cured spin-coated resist films hybridized with trimethylaluminum Peer-reviewed Kohei Chiba, Masaru Nakagawa Journal of Vacuum Science & Technology B 40 (3) 032601-1-032601-11 2022/05 Publisher: American Vacuum Society DOI： 10.1116/6.0001747 ISSN：2166-2746 eISSN：2166-2754 More details Close Ultraviolet (UV)-cured spin-coated resist films of 100 nm and thinner thicknesses made with bisphenol A-based dimethacrylate monomers on silicon substrates were hybridized by multiple-pulsed vapor infiltration of sequential trimethylaluminum (TMA) doses and a final H2O dose. Nondestructive x-ray reflectivity measurements without film shrinkage enabled characterization of the internal layer structures of the UV-cured films unmodified before hybridization and hybridized by TMA infiltration and chemical fixing. It was possible to determine the thickness, density, and interface roughness of each layer in the unmodified and hybridized UV-cured films. The TMA infiltration and chemical fixing resulted in the formation of the highest-density Al-rich layer near the film surface. The presence of the highest-density layer arising from the most abundant component, Al, was confirmed through energy-dispersive x-ray spectroscopy and time-of-flight secondary ion mass spectrometry. The increase in the cycle number of TMA dose from 100 to 150 and 200 cycles had little effect on organic–inorganic hybridization of the 100 nm-thick UV-cured films. The thickness of the outermost Al-rich layer near the film surface was approximately 30 nm, which was unchanged when the film thicknesses of 100, 75, and 50 nm were changed. The outermost skin layer suppressed the infiltration of TMA into the UV-cured films. The infiltration of TMA into the UV-cured films progressed as the film thicknesses decreased. Selective dry etching of UV-nanoimprinted resin passivation masks for area selective atomic layer deposition of aluminum oxide Peer-reviewed Chiaki Miyajima, Shunya Ito, Masaru Nakagawa Journal of Vacuum Science & Technology B 39 (5) 052804-1-052804-9 2021/09/15 Publisher: American Vacuum Society DOI： 10.1116/6.0001250 ISSN：2166-2746 eISSN：2166-2754 Plastic deformation of synthetic quartz nanopillars by nanoindentation for multi-scale and multi-level security artefact metrics Peer-reviewed Shunya Ito, Toshiyuki Omori, Masao Ando, Hiroyuki Yamazaki, Masaru Nakagawa Scientific Reports 11 (1) 16550-(1-9) 2021/08/16 Publisher: Springer Science and Business Media LLC DOI： 10.1038/s41598-021-95953-0 eISSN：2045-2322 More details Close
AbstractIndividual authentication using artefact metrics has received increasing attention, as greater importance has been placed on the security of individual information. These artefact metrics must satisfy the requirements of individuality, measurement stability, durability, and clone resistance, in addition to possessing unique physical features. In this study, we proposed that nanostructures of synthetic quartz (SQ) deposited on an SQ plate may provide sophisticated artefact metrics if morphological changes could be intentionally introduced into the SQ nanostructures at certain positions. We fabricated SQ nanopillars using a mass-production method (ultraviolet nanoimprint lithography) and investigated their mechanical deformation using nanoindentation with a spheroid diamond tip through a loading and unloading cycle. The SQ nanopillars with an aspect ratio of 1 (i.e., diameters
D of 100 and 200 nm with corresponding heights
H of 100 and 200 nm, respectively) could be plastically deformed without collapsing within a specified pillar-array format at programmed positions. The plastically deformed SQ nanopillar arrays demonstrated multi-scale (sub-millimetre, micrometre, and nanometre) and multi-level (shape, area, diameter, and height) individuality authentication and clone resistance. Because SQ is physically and chemically stable and durable, individuality authentication can be a highly reliable tool on Earth and in space. Macromolecular chain structures of atactic poly(methyl methacrylate) visualized on hydrophilized graphene surfaces by atomic force microscopy Peer-reviewed Shunya Ito, Yoko Seto, Jiro Kumaki, Masaru Nakagawa Chemistry Letters 50 (7) 1403-1406 2021/07/05 Publisher: The Chemical Society of Japan DOI： 10.1246/cl.210143 ISSN：0366-7022 eISSN：1348-0715 Single pulse development of chromium-deposited imprint micro/nano patterns of photo-cured crosslinked resin using a femtosecond pulsed laser Peer-reviewed Yusuke Isawa, Takahiro Nakamura, Shunya Ito, Masaru Nakagawa Japanese Journal of Applied Physics 60 (SC) SCCJ02-(1-8) 2021/06/01 Publisher: IOP Publishing DOI： 10.35848/1347-4065/abec61 ISSN：0021-4922 eISSN：1347-4065 Suppression of resist pattern collapse by crosslinker in ultraviolet nanoimprinting involving sequential infiltration synthesis with trimethylaluminum Peer-reviewed Chiaki Miyajima, Shunya Ito, Masaru Nakagawa Journal of Vacuum Science & Technology B 39 (3) 032603-(1-12) 2021/05/10 Publisher: American Vacuum Society DOI： 10.1116/6.0001014 ISSN：2166-2746 eISSN：2166-2754 “Print-and-Imprint” Method : Novel Nanoimprint Technology Based on Laser-Drilled Screen Printing Peer-reviewed Shunya ITO, Masaru NAKAGAWA Vacuum and Surface Science 63 (11) 592-597 2020/11/10 Publisher: Surface Science Society Japan DOI： 10.1380/vss.63.592 ISSN：2433-5835 eISSN：2433-5843 Ultimate Nano Molding and Transferring by Novel Nanoimprint Technique of Print-and-Imprint Method Peer-reviewed Masaru Nakagawa Journal of The Surface Finishing Society of Japan 71 (7) 468-471 2020/07/01 Publisher: The Surface Finishing Society of Japan DOI： 10.4139/sfj.71.468 ISSN：0915-1869 eISSN：1884-3409 Depth profiles of aluminum component in sequential infiltration synthesis-treated electron beam resist films analyzed by time-of-flight secondary ion mass spectrometry Peer-reviewed Shunya Ito, Yuki Ozaki, Takahiro Nakamura, Masaru Nakagawa Japanese Journal of Applied Physics 59 SIIC03-1-SIIC03-6 2020/05/07 DOI： 10.35848/1347-4065/ab8a0a ISSN：0021-4922 eISSN：1347-4065 Organic–Inorganic Hybrid Replica Molds with High Mechanical Strength for Step-and-Repeat Ultraviolet Nanoimprinting Peer-reviewed Shunya Ito, Takahiro Nakamura, Masaru Nakagawa Bulletin of the Chemical Society of Japan 93 (7) 862-869 2020/04/24 DOI： 10.1246/bcsj.20200093 Reproduction of additive-type fluorescence moiré fringes by image drawing software and study of accuracy of fluorescence imprint alignment Peer-reviewed Masaru Nakagawa, Kazue Sutou, Toshiaki Hayakawa Japanese Journal of Applied Physics 59 SIIJ11-1-SIIJ11-8 2020/03/16 DOI： 10.35848/1347-4065/ab7ae1 ISSN：0021-4922 eISSN：1347-4065 Fluorescence imprint alignment using additive-type inclination moiré fringes Peer-reviewed Takuma Yoshida, Shunya Ito, Kento Ochiai, Takahiro Nakamura, Masaru Nakagawa Japanese Journal of Applied Physics 59 SIIJ04-1-SIIJ04-7 2020/03/09 DOI： 10.35848/1347-4065/ab7415 ISSN：0021-4922 eISSN：1347-4065 Photoinduced reorientation in thin films of a nematic liquid crystalline polymer anchored to interfaces and enhancement using small liquid crystalline molecules Peer-reviewed Shoichi Kubo, Mari Kumagai, Nobuhiro Kawatsuki, Masaru Nakagawa Langmuir 35 (44) 14222-14229 2019/10 DOI： 10.1021/acs.langmuir.9b02673 Selection of a polymerizable functional group of an adhesive monolayer to suppress increases in monomer viscosity under confinement in silica nano-gaps Peer-reviewed Shunya Ito, Motohiro Kasuya, Kazue Kurihara, Masaru Nakagawa Chemistry Letters 48 (8) 943-946 2019/08 Publisher: The Chemical Society of Japan DOI： 10.1246/cl.190273 ISSN：0366-7022 eISSN：1348-0715 Surface modification of polyimide laser-drilled screen-printing masks for low-viscosity liquids in print-and-imprint method Peer-reviewed Takahiro Nakamura, Narumi Endo, Shunya Ito, Rikuto Kuroda, Masaru Nakagawa Japanese Journal of Applied Physics 58 SDDJ06-1-SDDJ06-6 2019/05 DOI： 10.7567/1347-4065/ab138c Sequential infiltration synthesis- and solvent annealing-induced morphological changes in positive-tone e-beam resist patterns evaluated by atomic force microscopy Peer-reviewed Yuki Ozaki, Shunya Ito, Takahiro Nakamura, Masaru Nakagawa Japanese Journal of Applied Physics 58 SDDJ04-1-SDDJ04-8 2019/05 DOI： 10.7567/1347-4065/ab0496 Visualization of organic/inorganic hybridization of UV-cured films with trimethylaluminum by scanning transmission electron microscopy and energy dispersive X-ray spectroscopy Peer-reviewed Masaru Nakagawa, Takuya Uehara, Yuki Ozaki, Takahiro Nakamura, Shunya Ito Journal of Vacuum Science and Technology B 36 (6) 06JF02-1-06JF02-7 2018/11 DOI： 10.1116/1.5047822 Selection of diacrylate monomers for sub-15 nm ultraviolet nanoimprinting by resonance shear measurement Peer-reviewed Shunya Ito, Motohiro Kasuya, Kenji Kawasaki, Ryuta Washiya, Yuzuru Simazaki, Akihiro Miyauchi, Kazue Kurihara, Masaru Nakagawa Langmuir 34 9366-9375 2018/07 DOI： 10.1021/acs.langmuir.8b01881 Development of UV-curable liquid for in-liquid fluorescence alignment in ultraviolet nanoimprint lithography Peer-reviewed Kento Ochiai, Eri Kikuchi, Yota Ishito, Mari Kumagai, Takahiro Nakamura, Masaru Nakagawa Japanese Journal of Applied Physics 57 (6) 06HG02-1-06HG02-5 2018/06/01 Publisher: Japan Society of Applied Physics DOI： 10.7567/JJAP.57.06HG02 ISSN：1347-4065 0021-4922 More details Close We studied a fluorescent UV-curable resin suitable for fluorescence alignment in UV nanoimprinting. The addition of a cationic fluorescent dye caused radical photopolymerization of a UV-curable resin by exposure to visible excitation light for fluorescence microscope observation. The microscope observation of a resin film prepared by pressing resin droplets on a silica substrate with a fluorinated silica superstrate revealed that the cationic dye molecules were preferably adsorbed onto the silica surface. It was indicated that the dye molecules concentrated on the silica surface may cause the photocuring. A nonionic fluorescent dye was selected owing to its low polar symmetrical structure and its solubility parameter close to monomers. The fluorescent UV-curable resin with the nonionic dye showed uncured stability to exposure to visible excitation light for 30 min with a light intensity of 8.5mWcm-2 detected at 530 nm. Elemental depth profiles and plasma etching rates of positive-tone electron beam resists after sequential infiltration synthesis of alumina Peer-reviewed Yuki Ozaki, Shunya Ito, Nobuya Hiroshiba, Takahiro Nakamura, Masaru Nakagawa Japanese Journal of Applied Physics 57 (6) 06HG01-1-06HG01-6 2018/06/01 Publisher: Japan Society of Applied Physics DOI： 10.7567/JJAP.57.06HG01 ISSN：1347-4065 0021-4922 More details Close By scanning transmission electron microscopy and energy dispersive X-ray spectroscopy (STEM-EDS), we investigated the elemental depth profiles of organic electron beam resist films after the sequential infiltration synthesis (SIS) of inorganic alumina. Although a 40-nm-thick poly(methyl methacrylate) (PMMA) film was entirely hybridized with alumina, an uneven distribution was observed near the interface between the substrate and the resist as well as near the resist surface. The uneven distribution was observed around the center of a 100-nm-thick PMMA film. The thicknesses of the PMMA and CSAR62 resist films decreased almost linearly as functions of plasma etching period. The comparison of etching rate among oxygen reactive ion etching, C3F8 reactive ion beam etching (RIBE), and Ar ion beam milling suggested that the SIS treatment enhanced the etching resistance of the electron beam resists to chemical reactions rather than to ion collisions. We proposed oxygen- and Arassisted C3F8 RIBE for the fabrication of silica imprint molds by electron beam lithography. Surface forces between hydrophilic silica surfaces in a moisture-sensitive oleophilic diacrylate monomer liquid Peer-reviewed Shunya Ito, Motohiro Kasuya, Kazue Kurihara, Masaru Nakagawa AIP Advances 8 (2) 25122-1-25122-8 2018/02/01 Publisher: American Institute of Physics Inc. DOI： 10.1063/1.4991630 ISSN：2158-3226 More details Close We measured the surface forces generated between fused silica surfaces in a low-viscosity oleophilic diacrylate monomer for reliably repeated ultraviolet (UV) nanoimprinting, and studied the influence of water in monomer liquids on the forces. Fused silica surfaces, with a static contact angle of 52.6 ± 1.7° for water, owing to the low degree of hydroxylation, hardly showed reproducible surface forces with repeated scan cycles, comprising approach and separation, even in an identical liquid monomer medium with both of low and high water content. The monomer liquid with a high water content of approximately 420 ppm showed a greater tendency to increase the surface forces at longer surface-surface distances compared with the monomer liquid with a low water content of approximately 60 ppm. On the other hand, silica surfaces with a water contact angle of < 5° after exposure to vacuum UV (VUV) light under a reduced air pressure showed reproducible profiles of surfaces forces using the monomer with a low water concentration of approximately 60 ppm for repeated surface forces scan cycles even in separately prepared silica surfaces, whilst they showed less reproducible profiles in the liquids with high water content of 430 ppm. These results suggested that water possibly adsorbed on the hydrophilic and hydrophobic silica surfaces in the monomer liquid of the high water concentration influenced the repeatability of the surface forces profiles. Development of UV-curable resins suitable for reverse-tone lithography for au metamaterials using a print-and-imprint method Peer-reviewed Takuya Uehara, Shinya Sato, Shunya Ito, Haruna Yano, Takahiro Nakamura, Masaru Nakagawa Bulletin of the Chemical Society of Japan 91 (2) 178-186 2018 Publisher: Chemical Society of Japan DOI： 10.1246/bcsj.20170280 ISSN：1348-0634 0009-2673 More details Close We developed a UV-curable resin (NL-SU1) suitable for screen printing with laser-drilled polyimide masks and reversetone nanoimprint lithography. The viscosity of the UV-curable resin composed of two bisphenol A-based monomers was adjusted to 11.0 Pas for the screen printing process. It was determined by photo-differential scanning calorimetry that photoinitiator Irgacure 369 was suitable for high methacrylate consumption in UV curing. The UV-curable resin after curing could be used as a top-coated resist layer on another imprinted resist layer because of its sufficient contrast in oxygen reactive ion etching and argon ion milling. We demonstrated a method for reverse-Tone lithography in a printand- imprint method to fabricate 20-nm-Thick and 50-nm-linewide Au split-ring resonator arrays. Principle and observation of fluorescence moire fringes for alignment in print and imprint methods Peer-reviewed Eri Kikuchi, Yota Ishito, Shinya Matsubara, Takahiro Nakamura, Masayuki Abe, Masaru Nakagawa JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 35 (6) 06G303 2017/11 Publisher: A V S AMER INST PHYSICS DOI： 10.1116/1.4990844 ISSN：1071-1023 More details Close The authors report the principle and experimental observation of fluorescence moire interference fringes for alignment in the print and imprint methods. Concave bar and cross alignment marks on a silica mold and substrate without the deposition of any light-shielding or high-refractive-index layers could be visualized by fluorescence microscopy with a fluorescent liquid sandwiched between the patterned surfaces. Fluorescence moire interference fringes with a pitch of 44 mu m were generated by the superimposition of two sets of mold bar arrays with respective pitches of p(1) = 4.0 mu m and p(2) = 4.4 mu m on substrate bar arrays with different periodicity of p(2) and p(1) through a thin fluorescent liquid layer. The fluorescence moire fringes were attributed to an additive-type generation by the interference of two luminous gratings with different periodicities, which was different from a multiplicative-type generation by the superimposition of two light-shielding metal gratings with different periodicities under illumination. Coarse alignment with 2-mu m-wide cross marks was performed by manually operating the substrate-side stages, and the misalignment was evaluated with the two sets of fluorescence moire fringes. The alignment method by fluorescence microscopy with a fluorescent liquid provided the possibilities of not only fine alignment with fluorescence moire fringes but also in situ monitoring of the residual layer thickness formed between the mold and substrate surfaces before curing for ultraviolet nanoimprinting. (C) 2017 American Vacuum Society. Nanometer-Resolved Fluidity of an Oleophilic Monomer between Silica Surfaces Modified with Fluorinated Monolayers for Nanoimprinting Peer-reviewed Shunya Ito, Motohiro Kasuya, Kazue Kurihara, Masaru Nakagawa ACS APPLIED MATERIALS & INTERFACES 9 (7) 6591-6598 2017/02 Publisher: AMER CHEMICAL SOC DOI： 10.1021/acsami.6b15139 ISSN：1944-8244 More details Close Ultraviolet (UV) nanoimprinting has the potential to fabricate sub-15 nm resin patterns, but the interfacial fluidity of organic monomers near monomer liquid/mold solid interfaces related to filling nanoscale mold recesses with UV-curable resins still remains unclear. In this study, we demonstrated that surface forces and resonance shear measurements were helpful to select a surface modifier appropriate for silica mold surfaces for UV nanoimprinting with the low-viscosity monomer 1,10-decanediol diacrylate. Surface forces between silica surfaces mediated with the diacrylate monomer and fluidities of the monomer were investigated with nanometer resolution. Chemical vapor surface modification of silica surfaces with chlorodimethyl(3,3,3-trifluoropropyl)silane (FAS3-Cl) and tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane (FAS13) gave fluorinated silica surfaces with root-mean-square roughness of less than 0.24 nm suitable for the measurements. When the distance D between two silica surfaces was decreased stepwise in the range of 0-30 nm, monomer viscosity between cleaned silica surfaces increased markedly at D < 6 nm. Surface modification with FAS3-Cl suppressed this increase of interfacial monomer viscosity. In contrast, FAS13-modified silica surfaces caused a jump-in phenomenon at approximately D = 7-9 nm, suddenly decreasing to D = 1 nm as the monomer fluid layer was squeezed out. We concluded that FAS3-Cl was appropriate as a fluorinated surface modifier for silica molds used in UV nanoimprinting with an oleophilic low-viscosity monomer, because the chemisorbed monolayer maintained low monomer viscosity near the surface/monomer interface, in addition to its low surface free energy and short CF3CH2CH2- group. Condition Determination of Ultraviolet Light Exposure for High-throughput Nanoimprinting Peer-reviewed Yota Ishito, Haruna Yano, Nobuya Hiroshiba, Shoichi Kubo, Masaru Nakagawa CHEMISTRY LETTERS 45 (12) 1373-1375 2016/12 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/cl.160663 ISSN：0366-7022 eISSN：1348-0715 More details Close A method for determining the optimum condition of ultraviolet (UV) light exposure for high-throughput nanoimprinting was investigated by photo differential scanning calorimetry, atomic force microscopy, and fluorescence microscopy. The consumption of the acrylate moiety caused by radical photopolymerization of a UV-curable resin had a relationship with the square root of light intensity multiplied by the exposure period. Insufficiently cured resin gave round-shaped imprinted patterns and caused adhesion of the resin component to a mold surface owing to pull-out defects on demolding. We demonstrated that fluorescence microscopy was helpful for the optimum exposure condition in high-throughput UV nanoimprinting. Size-Dependent Filling Behavior of UV-Curable Di(meth)acrylate Resins into Carbon-Coated Anodic Aluminum Oxide Pores of around 20 nm Peer-reviewed Masaru Nakagawa, Akifumi Nakaya, Yasuto Hoshikawa, Shunya Ito, Nobuya Hiroshiba, Takashi Kyotani ACS APPLIED MATERIALS & INTERFACES 8 (44) 30628-30634 2016/11 Publisher: AMER CHEMICAL SOC DOI： 10.1021/acsami.6b10561 ISSN：1944-8244 More details Close Ultraviolet (UV) nanoimprint lithography is a promising nanofabrication technology with cost efficiency and high throughput for sub-20 nm size semiconductor, data storage, and optical devices. To test formability of organic resist mask patterns, we investigated whether the type of polymerizable di(meth)acrylate monomer affected the fabrication of cured resin nanopillars by UV nanoimprinting using molds with pores of around 20 nm. We used carbon-coated, porous, anodic aluminum oxide (AAO) films prepared by electrochemical oxidation and thermal chemical vapor deposition as molds, because the pore diameter distribution in the range of 10-40 nm was suitable for combinatorial testing to investigate whether UV-curable resins comprising each monomer were filled into the mold recesses in UV nanoimprinting. Although the UV-curable resins, except for a bisphenol A-based one, detached from the molds without pull-out defects after radical photopolymerization under UV light, the number of cured resin nanopillars was independent of the viscosity of the monomer(s) in each resin. The number of resin nanopillars increased and their diameter decreased as the number of hydroxy groups in the aliphatic diacrylate monomers increased. It was concluded that the filling of the carbon-coated pores having diameters of around 20 nm with UV curable resins was promoted by the presence of hydroxy groups in the aliphatic di(meth)acrylate monomers. Demolding in Ultraviolet Nanoimprinting Assisted by a Nanoscale Lubricating Fluid Layer of Condensed Alternative Chlorofluorocarbon Peer-reviewed Masaru Nakagawa, Shu Kaneko, Shunya Ito BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN 89 (7) 786-793 2016/07 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/bcsj.20160107 ISSN：0009-2673 eISSN：1348-0634 More details Close We demonstrated that demolding in ultraviolet (UV) nano imprinting was assisted by a nanoscale lubricating fluid layer of a liquefied 1,1,1,3,3-pentafluoropropane (PFP) gas. UV-curable Resin A composed of glycerol 1,3-diglycerolate diacrylate with low PFP absorption showed low surface roughness of 22-nm line-and-space imprint patterns with the smallest line edge roughness (LER) value of 3 sigma = 1.8 nm. As the molar ratio of 1,6-hexanediol diacrylate with large PFP absorption was increased in the UV-curable resin, the morphological characteristics worsened. Although thin cured films of Resin A possessed a large surface free energy of 57.6 mJ m(-2), Resin A could be used for step-and-repeat UV nanoimprinting with bare and fluorinated silica molds. Quartz crystal microbalance measurements suggested that a PFP adsorption layer was formed at a film surface of uncured Resin A upon exposure to PFP gas and functioned as a nanoscale lubricating fluid layer during UV nanoimprinting. Discharge of viscous UV-curable resin droplets by screen printing for UV nanoimprint lithography Peer-reviewed Akira Tanabe, Takuya Uehara, Kazuro Nagase, Hiroaki Ikedo, Nobuya Hiroshiba, Takahiro Nakamura, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 55 (6) 06GM01-1-06GM01-6 2016/06 Publisher: IOP PUBLISHING LTD DOI： 10.7567/JJAP.55.06GM01 ISSN：0021-4922 eISSN：1347-4065 More details Close We demonstrated a coating method of screen printing for discharging droplets of a high-viscosity resin on a substrate for ultraviolet (UV) nanoimprint lithography (NIL). Compared with a spin-coated resin film on a silicon substrate, discharged resin droplets on a silicon substrate were effective in terms of the uniformity of residual layer thickness (RLT) in contact with a mold with various pattern densities. Fluorescence microscope observations with a fluorescent-dye-containing UV-curable resin enabled the evaluation of the shapes of resin droplets discharged on a substrate surface. Widely used screen mesh plates composed of a stainless mesh covered with a patterned emulsion film caused defects of undischarged parts, whereas defects-free resin droplets with a narrow size distribution were discharged by mesh-free plates prepared with laser ablation. The pitch-to-diameter ratio in the configuration of 10-mu m-diameter holes needs to be larger than 2.5 times for printing a resin having a viscosity of 12,800mPas. (C) 2016 The Japan Society of Applied Physics Anisotropic Oxygen Reactive Ion Etching for Removing Residual Layers from 45 nm-width Imprint Patterns Peer-reviewed Takuya Uehara, Shoichi Kubo, Nobuya Hiroshiba, Masaru Nakagawa JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 29 (2) 201-208 2016 Publisher: TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN DOI： 10.2494/photopolymer.29.201 ISSN：0914-9244 More details Close We designed and set up an apparatus of oxygen reactive ion etching (O-2 RIE) with parallel electrode configuration to remove a residual layer located on concave parts of ultraviolet nanoimprinted resist patterns and to maintain the pattern linewidth after dry etching. Imprint resist patterns with 45 nm line-and-space on a silicon wafer were fabricated with a bisphenol A-based UV-curable resin (NL-KKl) and a fluorinated replica mold under an easily condensable gas atmosphere. Cross-sectional field-emission scanning electron microscope observations revealed that the etching parameters of O-2 mass flow rate, O-2 pressure, and radio frequency (RF) bias power changed the resist pattern shapes. Steep resist patterns of the hardly changed linewidth could be left without the residual layer on the silicon substrates by tuning the parameters which caused anisotropic O-2 RIE. The imprint resist mask was applied for a subsequent dry etching of underneath silicon without any metal hard mask layers, and 45 nm line-and-space silicon patterns could be obtained. Selection of Di(meth)acrylate Monomers for Low Pollution of Fluorinated Mold Surfaces in Ultraviolet Nanoimprint Lithography Peer-reviewed Masaru Nakagawa, Kei Kobayashi, Azusa N. Hattori, Shunya Ito, Nobuya Hiroshiba, Shoichi Kubo, Hidekazu Tanaka LANGMUIR 31 (14) 4188-4195 2015/04 Publisher: AMER CHEMICAL SOC DOI： 10.1021/acs.langmuir.5b00325 ISSN：0743-7463 More details Close We used fluorescence microscopy to show that low adsorption of resin components by a mold surface was necessary for continuous ultraviolet (UV) nanoimprinting, as well as generation of a low release energy on detachment of a cured resin from a template mold. This is because with low mold pollution, fracture on demolding occurred at the interface between the mold and cured resin surfaces rather than at the outermost part of the cured resin. To achieve low mold pollution, we investigated the radical photopolymerization behaviors of fluorescent UV-curable resins and the mechanical properties (fracture toughness, surface hardness, and release energy) of the cured resin films for six types of di(meth)acrylate-based monomers with similar chemical structures, in which polar hydroxy and aromatic bulky bisphenol moieties and methacryloyl or acryloyl reactive groups were present or absent. As a result, we selected bisphenol A glycerolate dimethacrylate (BPAGDM), which contains hydroxy, bisphenol, and methacryloyl moieties, which give good mechanical properties, monomer bulkiness, and mild reactivity, respectively, as a suitable base monomer for UV nanoimprinting under an easily condensable alternative chlorofluorocarbon (HFC-245fa) atmosphere. The fluorescent UV-curable BPAGDM resin was used for UV nanoimprinting and lithographic reactive ion etching of a silicon surface with 32 nm line-and-space patterns without a hard metal layer. Innovative UV nanoimprint lithography using a condensable alternative chlorofluorocarbon atmosphere Peer-reviewed Shinji Matsui, Hiroshi Hiroshima, Yoshihiko Hirai, Masaru Nakagawa MICROELECTRONIC ENGINEERING 133 134-155 2015/02 Publisher: ELSEVIER SCIENCE BV DOI： 10.1016/j.mee.2014.10.016 ISSN：0167-9317 eISSN：1873-5568 More details Close The effectiveness of using a condensable gas in UV nanoimprint lithography has been demonstrated. The problem of bubble defects, which is inherent in UV nanoimprinting under non-vacuum conditions, can be overcome using a condensable alternative chlorofluorocarbon gas, 1,1,1,3,3-pentafluoropropane (PFP). UV nanoimprint lithography using PFP was successfully performed for a 45-nm half-pitch pattern with a thin residual layer, which is required for UV nanoimprinting. PFP reduces the viscosity and demolding force of the UV-curable resins. These properties are helpful in increasing the throughput and reliability of the UV nanoimprinting process. PFP occasionally causes large pattern shrinkage and degrades the pattern quality depending on the monomer chemical structures included in the UV-curable resins. These drawbacks can be mitigated by selecting monomers with low PFP absorption. We demonstrated that appropriate line-width roughness and line-edge roughness can be obtained for 22-nm node NAND flash memories and 20,000 repeated imprints were achieved with a single mold by using PFP. (C) 2014 Elsevier B.V. All rights reserved. Investigation of Fluorinated (Meth)Acrylate Monomers and Macromonomers Suitable for a Hydroxy-Containing Acrylate Monomer in UV Nanoimprinting Peer-reviewed Shunya Ito, Shu Kaneko, Cheol Min Yun, Kei Kobayashi, Masaru Nakagawa LANGMUIR 30 (24) 7127-7133 2014/06 Publisher: AMER CHEMICAL SOC DOI： 10.1021/la501629n ISSN：0743-7463 More details Close We investigated reactive fluorinated (meth)acrylate monomers and macromonomers that caused segregation at the cured resin surface of a viscous hydroxy-containing monomer, glycerol 1,3-diglycerolate diacrylate (GDD), and decreased the demolding energy in ultraviolet (UV) nanoimprinting with spin-coated films under a condensable alternative chlorofluorocarbon, gas atmosphere. The X-ray photoelectron spectroscopy and contact angle measurements used to determine the surface free energy suggested that a nonvolatile silicone-based methacrylate macromonomer with fluorinated alkyl groups segregated at the GDD-based cured resin surface and decreased the surface free energy, while fluorinated acrylate monomers hardly decreased the surface free energy because of their evaporation during the annealing of the spin-coated films. The average demolding energy of GDD-based cured resins with the macromonomer having fluorinated alkyl groups was smaller than that with the macromonomer having hydrocarbon alkyl groups. The fluorinated alkyl groups were responsible for decreasing the demolding energy rather than the polysiloxane main chains. We demonstrated that the GDD-based UV-curable resin with the fluorinated silicone-based macromonomer was suitable for step-and-repeat UV nanoimprinting with a bare silica mold, in addition to silica molds treated by chemical vapor surface modification with trifluoro-1,1,2,2-tetrahydropropyltrimethoxysilane (FAS3) and tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane (FAS13). Formation of 0.3-nm-high stepped polymer surface by thermal nanoimprinting Peer-reviewed Geng Tan, Naoya Inoue, Tomoyuki Funabasama, Masahiro Mita, Norimichi Okuda, Junichi Mori, Koji Koyamas, Satoru Kaneko, Masaru Nakagawa, Akifumi Matsuda, Mamoru Yoshimoto APPLIED PHYSICS EXPRESS 7 (5) 055202-1-055202-3 2014/05 Publisher: IOP PUBLISHING LTD DOI： 10.7567/APEX.7.055202 ISSN：1882-0778 eISSN：1882-0786 More details Close We performed atomic-scale surface patterning with a vertical resolution of approximately 0.3 nm on a poly(methyl methacrylate) (PMMA) polymer sheet (10 x 10 mm(2)) by thermal nanoimprinting using an atomically stepped sapphire template (alpha-Al2O3 single crystal). The sapphire mold with (1012) r-plane exhibited regularly arranged straight steps with a uniform height of approximately 0.31 nm. The template nanopattern could be transferred onto the surface of the PMMA sheet under the imprinting conditions of 0.2 MPa load for 300s at 140 degrees C. Atomic stairs with approximately 0.26-nm-high straight steps and approximately 600-nm-wide terraces were formed on the PMMA surface. (C) 2014 The Japan Society of Applied Physics Split-ring resonators interacting with a magnetic field at visible frequencies Peer-reviewed T. Tomioka, S. Kubo, M. Nakagawa, M. Hoga, T. Tanaka APPLIED PHYSICS LETTERS 103 (7) 071104-1-071104-4 2013/08 Publisher: AMER INST PHYSICS DOI： 10.1063/1.4818666 ISSN：0003-6951 eISSN：1077-3118 More details Close Split-ring resonators (SRRs) are attractive owing to the interaction with a magnetic field of incident light. Here, we report the fabrication of uniform arrays of about 360 million Au SRRs with a line width of approximately 50nm by reactive-monolayer-assisted thermal nanoimprint lithography over a 5-mm square area. Furthermore, we present an experimental demonstration of the oscillation of free electrons excited by a magnetic field at 690nm in the visible frequency region. The fabrication and optical investigation of SRR arrays over such large areas will facilitate opportunities to realize advanced optical devices. (C) 2013 AIP Publishing LLC. Release layer-free acrylate resins with segregation auxiliary agents for ultraviolet nanoimprinting Peer-reviewed Shunya Ito, Cheol Min Yun, Kei Kobayashi, Masaru Nakagawa JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 30 (6) 06FB05-1-06FB05-7 2012/11 Publisher: A V S AMER INST PHYSICS DOI： 10.1116/1.4758769 ISSN：1071-1023 More details Close The authors prepared ultraviolet (UV)-cured resin films with glycerin 1,3-dimethacrylate (GDM), modified by the addition of reactive fluoroalkyl acrylates. The authors then measured the decrease in the surface free energy of these materials to investigate their potential for successful demolding in UV nanoimprinting with unmodified silica molds. The fluoroalkyl acrylates of CHF2-terminus hexadecafluoro-1,1,9-trihydrononyl acrylate (16F-AC) and octafluoro-1,1,5-trihydropentyl acrylate (8F-AC) and CF3-terminus heptafluoro-1,1,2,2-tetrahydrodecyl acrylate (17F-AC) were used. The addition of 16F-AC, with its fluorinated long alkyl chain, to GDM effectively decreased the surface free energies, in comparison with 8F-AC. The solubility of 17F-AC in GDM improved in the presence of the 16F-AC and 8F-AC. As a result, the cured resin films made with the ternary monomers of GDM, 17F-AC, and 16F-AC or 8F-AC showed low surface free energies at small fluorine atomic percentages in comparison with the cured resin films made with the binary monomers of GDM and 17F-AC, 16F-AC, or 8F-AC. X-ray photoelectron spectroscopy showed that the decrease in surface free energy in the ternary monomer system can be attributed to the effective surface segregation of the fluorinated alkyl moieties because of co-assembly of the fluoroalkyl acrylates. 16F-AC and 8F-AC function as surface segregation auxiliary agents for 17F-AC. Although it was difficult to perform repeated UV nanoimprinting in air, the ternary UV-curable resin with 17F-AC resulting in a low surface energy allowed step-and-repeat UV nanoimprinting using bare silica molds in a 1,1,1,3,3-petafluoropropane atmosphere. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4758769] Photochemically Grafted Polystyrene Layer Assisting Selective Au Electrodeposition Peer-reviewed Koichi Nagase, Shoichi Kubo, Masaru Nakagawa LANGMUIR 28 (31) 11646-11653 2012/08 Publisher: AMER CHEMICAL SOC DOI： 10.1021/la301632y ISSN：0743-7463 More details Close We describe the selective electrodeposition of submicrometer old (Au) patterns achieved by a thin film resist layer of polystyrene (PS) that was exposed to ultraviolet (UV) light on a photoreactive monolayer of a benzophenone-containing alkylthiol formed on a Au-plated substrate and patterned by thermal nanoimprint lithography. The presence of a PS graft layer caused by the benzophenone monolayer photochemistry at an interface between the PS resist layer and photoreactive monolayer played the important role of suppressing the unfavorable growth of tiny Au grains in regions masked with the PS resist layer, resulting in the selective Au electrodeposition in aperture regions of PS resist patterns. The suppressive effect on selective Au electrodeposition depended on the molecular weight of PS used as a resist material. Among unimodal PSs having weight-average molecular weights (M-w&＃39;s) of 2100, 10900, and 106 000 g mol(-1), the PS of M-w = 10 900 g mol(-1) functioned most effectively as the resist layer. Au electrodeposition at a low current density allowed the preparation of Au lines having widths of submicrometers and a uniform height independent of line widths in resist aperture regions. Submicrometer bump structures of Au lines could be fabricated on transparent silica substrates by the subsequent wet etching of a Au electrode layer and then a chromium adhesive layer. A magnetically guided anti-cancer drug delivery system using porous FePt capsules Peer-reviewed Teruaki Fuchigami, Ryo Kawamura, Yoshitaka Kitamoto, Masaru Nakagawa, Yoshihisa Namiki BIOMATERIALS 33 (5) 1682-1687 2012/02 Publisher: ELSEVIER SCI LTD DOI： 10.1016/j.biomaterials.2011.11.016 ISSN：0142-9612 More details Close Magnetic carriers with efficient loading, delivery, and release of drugs are required for magnetically guided drug delivery system (DDS) as the potential cancer therapy. The present article describes the fabrication of porous FePt capsules approximately 340 nm in diameter with large pores of 20 nm in an ultrathin shell of 10 nm and demonstrates their application to a magnetically guided DDS in vitro. An aqueous anti-cancer drug is easily introduced in the hollow space of the capsules without external stimuli and released to cancer cells on cue through the magnetic shell composed of an ordered-alloy FePt network structure, which exhibits superparamagnetic features at approximately body temperature. The drug-loaded magnetic capsules coated with a lipid membrane are efficiently guided to the cancer cells within 15 min using a NdFeB magnet (0.2 T), and more than 70% of the cancer cells are destroyed. (C) 2011 Elsevier Ltd. All rights reserved. Reactive-monolayer-assisted Thermal Nanoimprint Lithography Peer-reviewed Shoichi Kubo, Masaru Nakagawa JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 25 (2) 189-196 2012 Publisher: TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN DOI： 10.2494/photopolymer.25.189 ISSN：0914-9244 More details Close This article gives an overview of reactive-monolayer-assisted thermal nanoimprint lithography (R-TNIL) for the fabrication of patterned metal thin layers on substrates by simple wet etching using a thermoplastic polymer resist layer assisted by photochemically grafted polymer layer. A photoreactive monolayer causing a photoinduced graft reaction on the metal surface anchors interfacial resist polymers, resulting in the suppression of thermally induced dewetting of the resist layer and the improvement of lateral pattern resolution of metal thin layers. Line widths of metal patterns could be tuned by controlled side etching. Enhanced adhesion of resist layers was revealed by lateral force curves measured by scanning probe microscopy. It was demonstrated as an application that transparent conductive substrates having metal mesh structures were fabricated by R-TNIL. We also demonstrated R-TNIL involving electrodeposition, which allowed the preparation of metal patterns with controlled aspect ratio. It was proved that the photoreactive monolayer played important roles to fabricate submicrometer patterns of metal thin layers. Fluorescent UV-Curable Resists for UV Nanoimprint Lithography Peer-reviewed Kei Kobayashi, Nobuji Sakai, Shinji Matsui, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 49 (6) 06GL07-1-06GL07-6 2010 Publisher: JAPAN SOC APPLIED PHYSICS DOI： 10.1143/JJAP.49.06GL07 ISSN：0021-4922 More details Close We developed fluorescent UV-curable resists for UV nanoimprint lithography to readily detect residual layer thickness and analyze its profile in addition to pattern defects by fluorescence microscopy. A fluorescent dye of rhodamine 6G, 2-[6-(ethylamino)-3-(ethylimino)-2,7-dimethyl-3H-xanthen-9-yl]benzoic acid ethyl ester tetrafluoroborate 5a, showed sufficient durability of photobleaching in solution toward UV-light exposure at >350nm in the absence and presence of a radical photoinitiator. The decrease of fluorescence intensity from the dye in a UV-cured thin film of a radical photopolymerization resin PAK-01 was suppressed at approximately 5% in comparison with the fluorescence intensity before UV-curing at an exposure dose of 1.0 J cm(-2) monitored at 365 nm. It was confirmed that the fluorescence intensity of the UV-cured thin film showed a linear correlation to its thickness up to 100 nm. A dye-added PAK-01 resin was successfully available to UV nanoimprint. We demonstrated that the UV-cured thin film of the dye-containing resin was useful for facile confirmation and analysis of residual layer thickness in terms of its homogeneity. (C) 2010 The Japan Society of Applied Physics Photoreactive Chemisorbed Monolayer Suppressing Polymer Dewetting in Thermal Nanoimprint Lithography Peer-reviewed Hirokazu Oda, Tomoyuki Ohtake, Toshiaki Takaoka, Masaru Nakagawa LANGMUIR 25 (12) 6604-6606 2009/06 Publisher: AMER CHEMICAL SOC DOI： 10.1021/la900902f ISSN：0743-7463 More details Close We describe reactive-monolayer-assisted thermal nanoimprint lithography. The reactive monolayer inducing the graft reaction with thermoplastic poly(styrene) by ultraviolet light exposure was formed from 4-((10-mercaptodecyl)oxy)benzophenone on a gold thin film. The photochemical graft reaction suppressed the thermally induced dewetting of a poly(styrene) thin film on the modified gold surface. As a result, the poly(styrene) thin film used as a resist layer for wet etching could be patterned by thermal nanoimprint lithography, and 100-nm-scale patterns of a gold thin film could be prepared simply by wet etching. Thermally reversible structural transformation involving a C-H center dot center dot center dot O hydrogen bond in a supramolecular crystal Peer-reviewed Daisuke Ishii, Takeshi Yamada, Tomokazu Iyoda, Hirohisa Yoshida, Masaru Nakagawa CHEMISTRY LETTERS 35 (12) 1394-1395 2006/12 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/cl.2006.1394 ISSN：0366-7022 eISSN：1348-0715 More details Close A molecular crystal of 6-[2-propyl-4-(4-pyridylazo)phenoxy]hexanoic acid prepared by sublimation showed two thermally reversible transitions at 17 and 172 degrees C on heating. Temperature dependence of its X-ray diffraction profile analyzed on the basis of its crystal structure revealed that the reversible transitions were related to a thermally induced hierarchical structural transformation involving cleavage of a C-H center dot center dot center dot O hydrogen bond, followed by cleavage of a O-H center dot center dot center dot N hydrogen bond. Photocontrol of zeta-potential of poly(styrene) microspheres prepared by soap-free emulsion copolymerization Peer-reviewed Hiroaki Kishimoto, Masaru Watanabe, Tomokazu Iyoda, Katsutoshi Nagai, Masaru Nakagawa CHEMISTRY LETTERS 35 (6) 598-599 2006/06 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/cl.2006.598 ISSN：0366-7022 eISSN：1348-0715 More details Close Exposure to UV light at wavelengths of >= 254nm caused poly(styrene) microspheres in deionized water to exhibit a negatively shifted zeta-potential value by generation of carboxyl groups due to photooxidation. Their zeta-potential value could be tuned simply by an exposure dose without a change in their average diameter. Pd-promoted Ni-P electroless deposition on a hydrogen-bonded molecular surface of a supramolecular fibrous template Peer-reviewed D Ishii, T Nagashima, M Udatsu, RD Sun, Y Ishikawa, S Kawasaki, M Yamada, T Iyoda, M Nakagawa CHEMISTRY OF MATERIALS 18 (8) 2152-2158 2006/04 Publisher: AMER CHEMICAL SOC DOI： 10.1021/cm052050e ISSN：0897-4756 More details Close A nickel-phosphorus (Ni-P) hollow inicrofiber was obtained by simply immersing a recyclable hydrogen-bonded supramolecular fibrous template made of amphoteric azopyridine carboxylic acid in an HCl-acidic PdCl2 aqueous solution and in a Ni-P electroless plating bath, followed by template removal in an alkaline aqueous solution. The Ni-P hollow microfiber had an inner pore diameter of 0.5 mu m and a wall thickness of about 50 nm. The mechanism of the Pd-promoted Ni-P electroless deposition on the template surface was revealed by XPS analysis and TEM observation. Coordination of the [PdCl4](2-) species and its subsequent hydrolysis and condensation polymerization to a tubular Pd2+ nanosheet and formation of the Pd-0 nanoparticle as plating catalyst were brought about on the molecular surface of successive head-to-tail COOH center dot center dot center dot NC5H4 hydrogen bonds, which comprised the supramolecular fibrous template. The hydrogen-bonded surface ordered at a molecular level leading to the tubular Pd2+ nanosheet played an important role in homogeneous Pd-promoted Ni-P electroless deposition and allowed us to fabricate a uniform Ni-P hollow microfiber. Selective microsphere adsorption and metallization on photopatterned polycation single-layered adsorption films Invited Peer-reviewed M Nakagawa POLYMER JOURNAL 38 (6) 507-515 2006 Publisher: SOC POLYMER SCIENCE JAPAN DOI： 10.1295/polymj.PJ2005260 ISSN：0032-3896 More details Close Multivalent cationic molecular and macromolecular adsorbates with plural pyridinium groups were adsorbed irreversibly on a substrate surface taking a negative charge, giving their single-layered adsorption film showing high desorption resistance toward deionized water. The desorption resistance of the adsorbates toward aqueous electrolyte solutions could be controlled by photochemical means such as photodimerization and photodegradation. The desorption suppression and promotion by the photochemical means was due to increasing and decreasing the number of cationic adsorption sites per molecule, respectively. Positive- and negative-type micropatterning, consisting of the surface adsorption, the imagewise exposure, and the development, could be carried out on the basis of the desorption promotion and suppression. The photopatterned adsorption films were available as templates for selective microsphere adsorption and metallization by electroless deposition. In this review, the recent studies done by the author and co-workers were described. Tubular and twisted Ni-P fibers molded from morphology-tunable and recyclable organic templates of hydrogen-bonded supramolecular assemblages Peer-reviewed M Nakagawa, D Ishii, K Aoki, T Seki, T Iyoda ADVANCED MATERIALS 17 (2) 200-+ 2005/01 Publisher: WILEY-V C H VERLAG GMBH DOI： 10.1002/adma.200400520 ISSN：0935-9648 eISSN：1521-4095 More details Close Morphology-controlled nickel-phosphorus hollow microfibers (see Figure) have been fabricated by electro-less plating using hydrogen-bonded fibrous molecular aggregates as novel morphology-tunable and recyclable templates. The inner diameter and the tubular morphology are tunable by simply varying the amphoteric azopyridine carboxylic. acids forming the fibrous molecular aggregates. Selective Ni-P electroless plating on photopatterned cationic adsorption films influenced by alkyl chain lengths of polyelectrolyte adsorbates and additive surfactants Peer-reviewed M Nakagawa, N Nawa, T Iyoda LANGMUIR 20 (22) 9844-9851 2004/10 Publisher: AMER CHEMICAL SOC DOI： 10.1021/la048606e ISSN：0743-7463 More details Close We demonstrated that the photopatterned single-layer adsorption film of poly(1-dodecyl-4-pyridinium bromide) on a silica surface was available for a template of nickel-phosphorus (Ni-P) electroless plating through sensitization with a SnCl2 aqueous solution and activation with a PdCl2 aqueous solution. Four kinds of poly(l-alkyl-4-vinylpyridinium halide)s bearing methyl, propyl, hexyl, and dodecyl groups were prepared. The cationic polymers were adsorbed by a negatively charged silica surface from their solutions, to form single-layer adsorption films exhibiting desorption-resistance toward deionized water and ethanol. The organic adsorption films could be decomposed completely by exposure to 172 nm deep-UV light. The formation and decomposition of the single-layer films were confirmed by deep-UV absorption spectral measurement and zeta-potential measurement. Ni-P electroless plating was carried out on the photopatterned adsorption films, using three types of SnOx colloidal materials without and with cationic or anionic surfactant as catalyst precursors in the sensitization step. In the case of the negatively charged SnOx colloids surrounded by anionic surfactant, Ni-deposition took place preferentially on the cationic adsorption films remaining in unexposed regions. The Ni-deposition was accelerated significantly on the cationic adsorption film bearing dodecyl groups. It was obvious by ICP-AES analyses that the hydrophobic long-chain dodecyl groups in the adsorption film could promote the adsorption of the negative SnOx colloids on the film surface, followed by much nucleus formation of zerovalent Pd catalysts useful for the electroless plating. The result of our experiment clearly showed that, in addition to electrostatic interaction, van der Waals interaction generating between the hydrophobic long-chain hydrocarbons of the adsorption film and the surfactant improved significantly the adsorption stability of the SnOx colloids, resulting in highly selective Ni-deposition in accord with the photopattern shape of the cationic single-layer adsorption film. Photo-orientation of mesoporous silica materials via transfer from an azobenzene-containing polymer monolayer Peer-reviewed Y Kawashima, M Nakagawa, K Ichimura, T Seki JOURNAL OF MATERIALS CHEMISTRY 14 (3) 328-335 2004 Publisher: ROYAL SOC CHEMISTRY DOI： 10.1039/b310296c ISSN：0959-9428 eISSN：1364-5501 More details Close Successful photo-orientation of mesostructured surfactant/silica hybrids is performed via hierarchically relayed multiple transfers among hetero-interfaces. A Langmuir-Blodgett monolayer of the azobenzene-containing polymer was first optically oriented via irradiation with linearly polarized light, and the photoinduced anisotropy of this layer was then transferred and fixed to a thin film of polysilane [poly(di-n-hexylsilane), (PDHS)]. The Si backbone of PDHS is aligned perpendicular to the polarization plane of the light, which is in accord with the direction of the photoaligned azobenzene monolayer. On this photoaligned polymer surface, the sol - gel process from the precursor with surfactants was performed. The photo-orientated mesochannels had a preferential orientation perpendicular to the direction of the pre-irradiated actinic polarized light over the whole plane when PDHS (M-w = 4.5 x 10(4)) was used for the preparation. The mixture of a liquid crystal and a dichroic dye can be incorporated into the mesochannels by capillary action. The photo- oriented mesochannels produced an anisotropic alignment of the incorporated dye. The alignment of functional molecules in the uniaxially aligned mesochanneled film may lead to new technological aspects. Photoinduced polar transition of substrate surfaces by photodegradable cationic adsorbate monolayers Peer-reviewed M Nakagawa, N Nawa, T Seki, T Iyoda LANGMUIR 19 (21) 8769-8776 2003/10 Publisher: AMER CHEMICAL SOC DOI： 10.1021/la0347758 ISSN：0743-7463 More details Close We describe a novel method to prepare adsorption templates for colloidal particle partterning on silica and poly(ethylene terephthalate) (PET) plates using environment-friendly water media by convenient photolithography of an adsorbed monolayer formed from a new photodegradable multivalent cationic adsorbate. The photodegradable decaphenylcyclopentasilane derivative possessing quaternary pyridinium groups was adsorbed by a negatively charged silica or PET surface from the aqueous solutions to form a photodegradable cationic adsorbed monolayer exhibiting desorption resistance toward deionized water. Exposure to UV light emitting from a widely used low-pressure mercury lamp resulted in photodegradation of the photoreactive cyclopentasilane skeleton in the adsorbate molecule and reduced markedly the desorption resistance of the photodegraded adsorbate toward deionized water because of a photochemical decrease in adsorption sites per molecule. The photodegraded adsorbate desorption from the substrate surface was confirmed by UV-visible absorption spectroscopy and contact-angle and zeta-potential measurements. As a result, it was found that the photodegradable cationic adsorbed monolayer exhibiting a positive zeta-potential value was capable of inducing a polar transition to a negative zeta-potential value near the initial substrate surface by UV exposure. Taking into account the overall facts, we successfully prepared a photopatterned cationic adsorbed monolayer of the quaternized cyclopentasilane derivative on a silica or PET plate by imagewise UV exposure and multiple rinses with deionized water. The substrate surface possessing a photopatterned surface-charge heterogeneity was available to adhesive templates for the site-selective surface adsorption of carboxy- and amino-modified polystyrene spheres charged with negative and positive signs, respectively. Furthermore, a new approach to fabricate binary particle arrays consisting of both the carboxy- and amino-modified spheres on the substrate surface was demonstrated by controlling the electrostatic interaction among the particles, the UV-exposed surface, and the unexposed surface as a function of pH values. Controlling packing structure of hydrophobic alkyl tails of monolayered films of ion-paired macrocyclic amphiphiles as studied by sum-frequency generation spectroscopy Peer-reviewed Ken Onda, Masaru Nakagawa, Toshiaki Asakai, Reiko Watase, Akihide Wada, Kunihiro Ichimura, Chiaki Hirose Journal of Physical Chemistry B 106 (15) 3855-3859 2002/04/18 DOI： 10.1021/jp013939v ISSN：1089-5647 More details Close Two kinds of monolayered films of ion-paired macrocyclic amphiphiles formed from anionic surfactant 1,2-bis[(dodecyloxy)carbonyl]ethane-1-sulfonate and tetracationic macrocycles with different molecular sizes were prepared on hydrophilic silica plates by the Langmuir-Blodgett technique. Vibrational sum-frequency generation (SFG) spectroscopy was applied to investigate the packing structure of the alkyl chains of the films. The SF intensity ratio of the CH symmetric stretching mode of the methylene group to that of methyl group in the alkyl chains increased when the occupied area of the macrocycle was larger than the sum of the cross-sectional areas of the hydrophobic alkyl tails. The appearance of a methylene CH band in the SFG spectra implies the presence of gauche conformation in the alkyl chains. This indicates that the molecular size of the cyclic tetracation hydrophilic head exclusively governs the packing structure of the alkyl group hydrophobic tails in the monolayer state. The results show that monolayer fabrication using ion-paired macrocyclic amphiphiles has advantages in allowing control over the packing structure of the outermost alkyl chains of solid surfaces through the choice of the size of the tetracation. Self-assembly of amphoteric azopyridine carboxylic acids: Organized structures and macroscopic organized morphology influenced by heat, pH change, and light Peer-reviewed K Aoki, M Nakagawa, K Ichimura JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 122 (44) 10997-11004 2000/11 Publisher: AMER CHEMICAL SOC DOI： 10.1021/ja001790f ISSN：0002-7863 More details Close In this paper, we describe the synthesis of novel amphoteric azopyridine carboxylic acids (2b, 3a, 3b, 4a, and 4b), having both a carboxyl group as a hydrogen donor and a pyridyl group as an acceptor at each molecular terminus, and their self-organization, which is markedly affected by external stimuli including heat, pH changes, and light. The amphoteric compounds form intermolecular hydrogen bonds between pyridyl and carboxyl groups in a head-to-tail manner in the solid state to give linear pseudopolymer structures, as supported by FT-IR analysis. Heating and cooling across their melting points induced thermoreversible supramolecular depolymerization to and polymerization from small molecular components of monomers and the corresponding carboxylic acid dimers. In alkaline aqueous media, these amphoteric compounds, dissolved as carboxylate anions, were gradually neutralized by atmospheric carbon dioxide, leading to their deposition as novel fibrous materials from 3b and 4b, substituted with a propyl group at the phenyl ring, and as leaflet crystals from 3a and 4a bearing no substituent. FT-IR and X-ray diffraction measurements supported the conclusion that the formation of fibrous materials from 3b and 4b arises from their intermolecular hydrogen bonding in a head-to-tail manner as well as the suppressive effect of propyl substitution on the pi-pi stacking of the molecules. UV irradiation of alkaline solutions of 4b resulted in the modification of the morphology of fibrous materials, probably because the photoisomerized Z-isomer of 4b affected the nucleation process in the fibrous formation. These results suggest that morphological properties of these macroscopic self-assemblages are tunable by appropriate choices of environmental stimuli such as heat, pH, and light. Light-driven motion of liquids on a photoresponsive surface Peer-reviewed K Ichimura, SK Oh, M Nakagawa SCIENCE 288 (5471) 1624-1626 2000/06 Publisher: AMER ASSOC ADVANCEMENT SCIENCE DOI： 10.1126/science.288.5471.1624 ISSN：0036-8075 More details Close The macroscopic motion of Liquids an a flat solid surface was manipulated reversibly by photoirradiation of a photoisomerizable monolayer covering the surface. When a liquid droplet several millimeters in diameter was placed on a substrate surface modified with a calix[4]resorcinarene derivative having photochromic azobenzene units, asymmetrical photoirradiation caused a gradient in surface free energy due to the photoisomerization of surface azobenzenes, leading to the directional motion of the droplet. The direction and velocity of the motion were tunable by varying the direction and steepness of the gradient in Light intensity. The light-driven motion of a fluid substance in a surface-modified glass tube suggests potential applicability to microscale chemical process systems. Photopatterning and visualization of adsorbed monolayers of bis(1-benzyl-4-pyridinio)ethylene moieties Peer-reviewed M Nakagawa, SK Oh, K Ichimura ADVANCED MATERIALS 12 (6) 403-+ 2000/03 Publisher: WILEY-V C H VERLAG GMBH DOI： 10.1002/(SICI)1521-4095(200003)12:6<403::AID-ADMA403>3.0.CO;2-3 ISSN：0935-9648 More details Close Communication: Photopatterning of adsorbed monolayers has been achieved using a photopolymerizable cationic adsorbate (see Figure) that undergoes stepwise UV-induced polymerization. The technique uses a conventional light source, and development of the photolithographic pattern involves only aqueous solutions, which makes it an environmentally friendly process. Preparation of monolayers of ion-paired macrocyclic amphiphiles to estimate a critical free space required for azobenzene photoisomerization Peer-reviewed M Nakagawa, R Watase, K Ichimura CHEMISTRY LETTERS 28 (11) 1209-1210 1999/11 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/cl.1999.1209 ISSN：0366-7022 eISSN：1348-0715 More details Close a novel family of ion-paired macrocyclic amphiphiles consisting of a tetracationic cyclophane and long-chain sulfonates was developed to form stable monolayers incorporating azobenzene moieties with tailor-made photoisomerizability. Self-assembled monolayers derived from calix[4]resorcinarenes exhibiting excellent desorption-resistance and their applicability to surface energy photocontrol Peer-reviewed SK Oh, M Nakagawa, K Ichimura CHEMISTRY LETTERS 28 (4) 349-350 1999/04 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/cl.1999.349 ISSN：0366-7022 eISSN：1348-0715 More details Close Self-assembled monolayers exhibiting excellent desorption resistance was readily available by the adsorption of crown conformers of O-carboxymethylated calix[4]resorcinarenes on aminated silica substrates through multi-point adsorption. Self-assembling formation of a [2]catenane consisting of cyclobis (4,4″-azopyridinium-p-phenylene) and bis-p-phenylene-34-crown-10 Peer-reviewed Masaru Nakagawa, Masahiro Rikukawa, Kohei Sanui, Naoya Ogata Supramolecular Science 5 (1-2) 83-87 1998 Publisher: Elsevier Sci Ltd DOI： 10.1016/S0968-5677(97)00072-2 ISSN：0968-5677 More details Close A [2]catenane consisting of a π-electron-accepting tetracationic cyclophane of cyclobis(4,4′-azopyridinium-p-phenylene) and a π-electron-donating macrocyclic polyether of bis-p-phenylene-34-crown-10 was synthesized via a template-directed synthesis in 68% yield. The [2]catenane exhibited charge transfer bands with λmax = 526 nm in CH3CN. A precursor of the cyclophane, bis[4-(4-pyridylazo)pyridinium], spontaneously formed a charge transfer complex with the macrocyclic polyether. The investigation of the charge transfer complex using UV-visible and 1H NMR spectroscopy revealed that the complex had a pseudo-rotaxane structure with a stability constant (Ka) of 120 dm3 mol-1 at 25°C in CH3CN. The highly efficient catenation of 68% yield was attributable to cooperative self-assembling processes derived from the strongly π-electron deficient 4,4′-azopyridinium and 4-(4-pyridylazo)pyridinium units. These results suggested that there was a new formation mechanism of the catenated structure through preorganization of the charge transfer complex. Photochromic, electrochemical, and photoelectrochemical properties of novel azopyridinium derivatives Peer-reviewed M Nakagawa, M Rikukawa, M Watanabe, K Sanui, N Ogata BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN 70 (4) 737-744 1997/04 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/bcsj.70.737 ISSN：0009-2673 eISSN：1348-0634 More details Close Organic photochrome azopyridiniums were systematically prepared by quaternizing azopyridines with either dimethyl sulfate or 1,3-propanesultone. photochemical, electrochemical, and photoelectrochemical studies on the azopyridiniums as methyl sulfate, hexafluorophosphate, and zwitterionic compounds were carried out in aprotic solvents and in aqueous solutions. The azopyridiniums, which have 3-located quaternized nitrogens to the azo group, exhibited photochemical activity of trans reversible arrow cis isomerization. Quaternization of the pyridine moiety decreased the photochemical conversion between the trans and cis forms. The photochromic properties were influenced by an electronic effect of quaternized nitrogens and an electrostatic interaction of counter anions. In electrochemical studies, new redox-active azopyridiniums were found by using cyclic voltammetry and an electrochemical technique coupled with UV-vis spectroscopy. By the quaternization of azopyridines, the formal reduction potentials were shifted to a positive region up to -0.27 V vs. Fc/Fc(+). The reversibility of the electrochemical reactions was strongly dependent on the location of quaternized nitrogen. The trans reversible arrow cia photoisomerization of electroactive azopyridiniums influenced their electrochemical properties. The photochromic molecules exhibited a photoelectric effect, which was a change in the cathodic limiting currents of azopyridiniums, reversibly modulated by ultraviolet light of an external stimulation. Self-organization and electrical properties of head-to-tail poly(3-hexylthiophene) in Langmuir-Blodgett films Peer-reviewed M Rikukawa, M Nakagawa, Y Tabuchi, K Sanui, N Ogata SYNTHETIC METALS 84 (1-3) 233-234 1997/01 Publisher: ELSEVIER SCIENCE SA LAUSANNE DOI： 10.1016/S0379-6779(97)80728-X ISSN：0379-6779 More details Close The conductive ultra thin films were fabricated from mixed monolayers containing stearic acid and Head-to-Tail poly(3-alkylthiophene). These films exhibited well-defined layered structures as determined by optical absorption and X-ray diffraction measurements. The UV-Vis absorption spectra of these films showed lower energy absorption shifts of 48 nm from that of the random poly(3-alkylthiophene)/stearic acid LB films. The blue shift of absorption maximum of the LB film is attributed to the increase of pi-conjugation length caused by no steric hindrance of alkyl side chains. The conductivity of the Head-to-Tail poly(3-hexylthiophene)/stearic acid LB films was greatly improved in the range of 67-100 S/cm. Mie-Resonant Nanophotonic-Enhancement of Asymmetry in Sodium Chlorate Chiral Crystallization. International-journal Hiromasa Niinomi, Kazuhiro Gotoh, Naoki Takano, Miho Tagawa, Iori Morita, Akiko Onuma, Hiroshi Y Yoshikawa, Ryuzo Kawamura, Tomoya Oshikiri, Masaru Nakagawa The journal of physical chemistry letters 1564-1571 2024/02/05 DOI： 10.1021/acs.jpclett.3c03303 More details Close Studies on chiral spectroscopy have recently demonstrated strong enhancement of chiral light-matter interaction in the chiral near-field of Mie resonance in high-refractive-index dielectric nanostructures by studies on chiral spectroscopy. This situation has motivated researchers to demonstrate effective chiral photosynthesis under a chiral near-field beyond circularly polarized light (CPL) as a chiral source. However, the effectivity of the chiral near-field of Mie resonance for chiral photosynthesis has not been clearly demonstrated. One major challenge is the experimental difficulty in evaluating enantiomeric excess of a trace amount of chiral products synthesized in the near-field. Here, by adopting sodium chlorate chiral crystallization as a phenomenon that includes both synthesis and the amplification of chiral products, we show that crystallization on a Mie-resonant silicon metasurface excited by CPL yields a statistically significant large crystal enantiomeric excess of ∼18%, which cannot be achieved merely by CPL. This result provides implications for efficient chiral photosynthesis in a chiral near-field. Volume compensating materials after vapor phase infiltration: effect of different butyl isomers of polymer side-chains on high process temperature durability Peer-reviewed Norikatsu Sasao, Shinobu Sugimura, Koji Asakawa, Tomoya Oshikiri, Masaru Nakagawa Japanese Journal of Applied Physics 2024/02 Publisher: IOP Publishing DOI： 10.35848/1347-4065/ad2977 ISSN：0021-4922 eISSN：1347-4065 More details Close Abstract Vapor phase infiltration (VPI) is a facile process that adds metallic features to organic polymer patterns. Generally, volume expansion in typical polymers such as poly(methyl methacrylate) (PMMA) is observed after metal infiltration, which limits the application of this technique in nanofabrication processes. In this study, poly(sec-butyl methacrylate) P(sBuMA) and poly(iso-butyl methacrylate) P(iBuMA) with leaving groups were selected as alternatives for PMMA and poly(tert-butyl methacrylate) P(tBuMA), and their aluminum (Al) infiltration behaviors were investigated. Notably, Al species infiltrated into P(sBuMA) and P(iBuMA) at 200 °C, whereas no Al infiltration was observed at 100 °C. Volume shrinkage was observed for both polymers after infiltration. This shows that the volume change in the base material after metal infiltration can be minimized by combining a conventional volume-expanding polymer, such as PMMA, with volume-shrinking polymers with high process temperature durability. Chiral Spinodal-like Ordering of Homoimmiscible Water at Interface between Water and Chiral Ice III Hiromasa Niinomi, Tomoya Yamazaki, Hiroki Nada, Tetsuya Hama, Akira Kouchi, Tomoya Oshikiri, Masaru Nakagawa, Yuki Kimura The Journal of Physical Chemistry Letters 659-664 2024/01/11 Publisher: American Chemical Society (ACS) DOI： 10.1021/acs.jpclett.3c03006 ISSN：1948-7185 eISSN：1948-7185 Anisotropy in spinodal-like dynamics of unknown water at ice V–water interface Hiromasa Niinomi, Tomoya Yamazaki, Hiroki Nada, Tetsuya Hama, Akira Kouchi, Tomoya Oshikiri, Masaru Nakagawa, Yuki Kimura Scientific Reports 13 (1) 2023/10/11 Publisher: Springer Science and Business Media LLC DOI： 10.1038/s41598-023-43295-4 eISSN：2045-2322 More details Close Abstract Experimentally demonstrating the existence of waters with local structures unlike that of common water is critical for understanding both the origin of the mysterious properties of water and liquid polymorphism in single component liquids. At the interfaces between water and ices I
h, III, and VI grown/melted under pressure, we previously discovered low- and high-density unknown waters, that are immiscible with the surrounding water. Here, we show, by in-situ optical microscopy, that an unknown water appears at the ice V–water interface via spinodal-like dynamics. The dewetting dynamics of the unknown water indicate that its characteristic velocity is ~ 90 m/s. The time evolution of the characteristic length of the spinodal-like undulation suggests that the dynamics may be described by a common model for spinodal decomposition of an immiscible liquid mixture. Spinodal-like dewetting dynamics of the unknown water transiently showed anisotropy, implying the property of a liquid crystal. Porous nanosheet wrapping for live imaging of suspension cells International-journal Peer-reviewed Hong Zhang, Takuto Aoki, Kanae Hatano, Kazuya Kabayama, Masaru Nakagawa, Koichi Fukase, Yosuke Okamura Journal of Materials Chemistry B 6 (41) 6622-6628 2018/09 DOI： 10.1039/C8TB01943F More details Close In the field of cell imaging, it is still a practical challenge to obtain the high quality live imaging of suspension cells, mainly due to undesirable cell movement in the imaging field during observation. This study describes a porous nanosheet wrapping method to noninvasively immobilize suspension cells for their live imaging. Perforated nanopores are fabricated on a nanosheet to enable the addition of external chemicals to cells, ranging from small molecules to macromolecules. Through several case studies, such as the live imaging of membrane staining of liposomes, transferrin endocytosis of B cells, and activation of platelets, it is verified that the confined space made by the nanosheet could provide a hydrodynamically stable environment for suspension cells, even if an aqueous stimulus is added through the nanopores in a static or a flowing condition. With this method, the live imaging of the whole activation process on a specific suspension cell in the imaging field is achieved, which is not feasible with the existing cell immobilization methods. This study suggests that the method of porous nanosheet wrapping will facilitate the visualization of the dynamic functions of suspension cells. Pulsed Laser Drilling of Engineering Plastic Films to Fabricate Through-Hole Membranes for Print-and-Imprint Method Peer-reviewed Takahiro Nakamura, Kento Seki, Kazuro Nagase, Masaru Nakagawa Transactions of the Materials Research Society of Japan 43 (5) 289-292 2018/08 DOI： 10.14723/tmrsj.43.289 High-Intensity Laser Irradiation Inducing Au Nanoparticles in Viscous Glycerin Peer-reviewed Rikuto Kuroda, Takahiro Nakamura, Masaru Nakagawa Transactions of the Materials Research Society of Japan(MRS-J) 43 (5) 283-287 2018/08 DOI： 10.14723/tmrsj.43.283 Gold microelectrodes fabricated by a print-and-imprint method using laser-drilled polyimide through-hole masks Peer-reviewed Takahiro Nakamura, Kento Seki, Kazuro Nagase, Masaru Nakagawa JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 35 (6) 06G301 2017/11 Publisher: A V S AMER INST PHYSICS DOI： 10.1116/1.4991629 ISSN：1071-1023 More details Close Multiple sets of gold (Au) four-terminal microelectrodes comprising 100 mu m-scale pad electrodes and 20 mu m-wide lead lines were fabricated on a silicon substrate by a print-and-imprint method involving laser drilling and screen printing. Laser drilling of 12.5 mu m-thick polyimide (PI) sheets with a picosecond-pulse laser enabled the fabrication of PI membranes with designed patterns of through holes. The through holes had a frustum shape, and the average hole diameters on both the laser entry and exit sides of the PI films enlarged with an increase in the applied repetition rate. The hole patterns designed with submicrometer position accuracy were prepared using a linear motor stage. Liquid ultraviolet (UV)-curable resin, exhibiting a high viscosity (11.0 Pa s) and a high dryetching resistance to argon (Ar) ion beam milling after UV curing, was placed onto a substrate surface as droplets by screen printing, corresponding to the hole patterns of the PI through-hole masks. The average volume of the liquid droplets could be tuned in the range of 0.02-0.54 pl, which depended on the volumes of the laser-drilled frustum holes. The volumes of liquid resin necessary to fill the mold recesses were adjusted site-selectively by the number of resin droplets printed on a metal-deposited substrate surface. Fluorescence microscopy with a fluorescent dye-doped resin indicated that the imprinted resist patterns had a residual layer thickness in the range of 15-28 nm. The Au electrodes with a 30 nm-thickness could be fabricated by subsequent Ar ion beam milling and removal of a sacrificial metal layer. (C) 2017 American Vacuum Society. Silica imprint templates with concave patterns from single-digit nanometers fabricated by electron beam lithography involving argon ion beam milling Peer-reviewed Shunya Ito, Eri Kikuchi, Masahiko Watanabe, Yoshinari Sugiyama, Yoshiaki Kanamori, Masaru Nakagawa Japanese Journal of Applied Physics 56 (6) 06GL01 2017/06/01 Publisher: Japan Society of Applied Physics DOI： 10.7567/JJAP.56.06GL01 ISSN：1347-4065 0021-4922 More details Close To maintain the silica surface of imprint templates without a fluorine-containing passivation layer on sidewalls after dry etching, we investigated whether a physical dry etching process entailing exposure to Ar ion beam is useful for the fabrication of silica templates. An almost same etching rate of a positive-tone electron beam (EB) resist as silica in Ar ion beam milling allowed for the fabrication of bar-shaped patterns with micrometer lengths and widths for moiré alignment and of hole patterns with diameters of around 20nm in silica templates. The EB resist layer of 40nm thickness generated partially non-etched defects of 10-nm-diameter holes in silica templates because the Ar ion beam was completely unable to reach silica surfaces through resist sidewalls with a depth of 40nm. The break-through etching of a hard mask sacrifice Cr layer with a thickness of 5 nm by Ar ion milling and the subsequent inductively coupled plasma etching of silica enabled the fabrication of silica hole templates with diameters of 7-20nm and depths of 20-30 nm. Unimodal Nematic Liquid Crystalline Random Copolymers Designed for Accepting Chiral Dopants Peer-reviewed Takumi Sodemura, Shoichi Kubo, Hiroki Higuchi, Hirotsugu Kikuchi, Masaru Nakagawa BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN 90 (2) 216-222 2017/02 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/bcsj.20160343 ISSN：0009-2673 eISSN：1348-0634 More details Close The miscibility of chiral molecules to unimodal side-chain nematic liquid crystalline (LC) polymers was studied to generate chiral nematic phases. Chiral dopants, a phenyl benzoate derivative S-811 and an isosorbide dibenzoate derivative ISO-(6OBA)(2) were miscible to the nematic LC polymer PMA(4OPB) tethering phenyl benzoate moieties as side-chain mesogens by preparing mixtures in solutions rather than directly melting the powders together. Nematic LC random copolymers containing non-LC side chains were designed to promote the interaction between mesogens and chiral molecules. The introduction of hexyl chains as side chains randomly into nematic LC polymers improved the miscibility of chiral molecules of an isosorbide dibenzoate derivative with hexyl tails. The hexyl chains of the polymer provided spaces for the chiral molecules and caused alkyl-alkyl interactions. We demonstrated that the randomly introduced hexyl chains promoted the interaction of chiral molecules with LC mesogens to generate chiral nematic phases. Viscosity range of UV-curable resins usable in print and imprint method for preparing sub-100-nm-wide resin patterns Peer-reviewed Takuya Uehara, Akiko Onuma, Akira Tanabe, Kazuro Nagase, Hiroaki Ikedo, Nobuya Hiroshiba, Takahiro Nakamura, Masaru Nakagawa JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 34 (6) 06K404-1-06K404-6 2016/11 Publisher: A V S AMER INST PHYSICS DOI： 10.1116/1.4963374 ISSN：1071-1023 More details Close The authors demonstrated a &＃34;print and imprint&＃34; method comprising screen printing and ultraviolet (UV) nanoimprinting for preparing sub-100-nm-wide cured resin patterns. In the screen printing, UV-curable resins with viscosities in the range of 6.26-266 Pa s were deposited as droplet shapes on Si surfaces using a polyimide through-hole membrane mask with a hole diameter of 10 mu m and a hole pitch of 45 mu m. The low-volatile high-viscosity resin of 12.8 Pa s had an advantage of maintaining the droplet shapes 3 h after deposition. The spherical segmentshaped droplets showed an average diameter of 18.9 mu m and height of 1.63 mu m. The average volume was approximately 230 mu m(3) (0.230 pl) which was close to that dispensed by ink-jet printing. The droplet resin on a modified Si surface was filled into recesses of a fluorinated silica mold, and the molded resin was cured by UV nanoimprinting. Although the displacement of resin droplets was periodically uniform on substrate surfaces, the thicknesses of residual layers were almost identical to 0.12 mu m in 45, 60, 80, and 100-nm-wide line and space patterns in the range of 1mm length. The authors confirmed that the resin droplets with a viscosity of 12.8 Pa s could be transformed into imprinted resin patterns with a residual layer thickness of 0.12 mu m without obvious nonfill defects. (C) 2016 American Vacuum Society. Chlorine-based inductively coupled plasma etching of GaAs wafer using tripodal paraffinic triptycene as an etching resist mask Peer-reviewed Akihiro Matsutani, Fumitaka Ishiwari, Yoshiaki Shoji, Takashi Kajitani, Takuya Uehara, Masaru Nakagawa, Takanori Fukushima JAPANESE JOURNAL OF APPLIED PHYSICS 55 (6) 06GL01-1-06GL01-3 2016/06 Publisher: IOP PUBLISHING LTD DOI： 10.7567/JJAP.55.06GL01 ISSN：0021-4922 eISSN：1347-4065 More details Close We report the etching properties of tripodal paraffinic triptycene (TripC(12)) used as a thermal nanoimprint lithography (TNIL) resist mask in Cl-2 plasma etching. Using thermally nanoimprinted TripC(12) films, we achieved microfabrication of a GaAs substrate by Cl-2-based inductively coupled plasma (ICP) etching. Attenuated total reflection Fourier transform infrared (ATR- FTIR) spectroscopy confirmed that the chemical structure of TripC(12) remains intact after the ICP etching process using Cl-2. We believe that TNIL using TripC(12) films is useful for fabricating optical/electrical devices and micro-electro-mechanical systems (MEMSs). (C) 2016 The Japan Society of Applied Physics Durability to oxygen reactive ion etching enhanced by addition of synthesized bis(trimethylsilyl)phenyl-containing (meth)acrylates in ultraviolet nanoimprint lithography Peer-reviewed Shunya Ito, Hiroki Sato, Yuhei Tasaki, Kimihito Watanuki, Nobukatsu Nemoto, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 55 (6) 06GM02-1-06GM02-7 2016/06 Publisher: IOP PUBLISHING LTD DOI： 10.7567/JJAP.55.06GM02 ISSN：0021-4922 eISSN：1347-4065 More details Close We investigated the selection of bis(trimethylsilyl)phenyl-containing (meth)acrylates as additives to improve the durability to oxygen reactive ion etching (O-2 RIE) of sub-50nm imprint resist patterns suitable for bubble-defect-free UV nanoimprinting with a readily condensable gas. 2,5-Bis(2-acryloyloxyethoxy)-1,4-bis(trimethylsilyl)benzene, which has a diacrylate chemical structure similar to that of glycerol 1,3-diglycerolate diacrylate used as a base monomer, and 3-(2-methacryloyloxyethoxy)-1-(hydroxylethoxy)-2-propoxy-3,5-bis(trimethylsilyl)benzene, which has a hydroxy group similar to the base monomer, were synthesized taking into consideration the Ohnishi and ring parameters, and the oxidization of the trimethylsilyl moiety to inorganic species during O-2 RIE. The addition of the latter liquid additive to the base monomer decreased etching rate owing to the good miscibility of the additive in the base monomer, while the addition of the former crystalline additive caused phase separation after UV nanoimprinting. The latter additive worked as a compatibilizer to the former additive, which is preferred for etching durability improvement. The coexistence of the additives enabled the fabrication of a 45 nm line- and-space resist pattern by UV nanoimprinting, and its residual layer could be removed by O-2 RIE. (C) 2016 The Japan Society of Applied Physics Monitoring Thermally Induced Cylindrical Microphase Separation of Polystyrene-block-poly(methyl methacrylate) by Atomic Force Microscopy Peer-reviewed Nobuya Hiroshiba, Ryo Okubo, Azusa N. Hattori, Hidekazu Tanaka, Masaru Nakagawa JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 29 (5) 659-665 2016 Publisher: TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN DOI： 10.2494/photopolymer.29.659 ISSN：0914-9244 More details Close Thermally induced growth of cylindrical microphase separation was observed for polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) thin films on native oxide silicon substrates unmodified and modified with hydroxy-terminated polystyrene (PS-OH) by atomic force microscopy in dynamic force mode. The degrees of long-range order of the cylindrical microphase separation structures were investigated using the correlation length values. The correlation length became constant over 30 seconds regardless of the kind of substrates, while the PS-OH modified substrate caused a longer correlation length and a shorter closely packed periodicity in the cylindrical microphase separation than the bare silicon substrate did. Reverse-tone ultraviolet nanoimprint lithography with fluorescent UV-curable resins Peer-reviewed Takuya Uehara, Shoichi Kubo, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 54 (6) 06FM02-1-06FM02-6 2015/06 Publisher: IOP PUBLISHING LTD DOI： 10.7567/JJAP.54.06FM02 ISSN：0021-4922 eISSN：1347-4065 More details Close The usefulness of fluorescent ultraviolet (UV)-curable resins for reverse-tone UV nanoimprint lithography was demonstrated. Nanoimprinted concave patterns were fabricated as an underlayer on a Au-deposited substrate using a fluorescent UV-curable resin with a low etching durability after curing. The underlayer was coated with another fluorescent UV-curable resin with a high etching durability after curing. Fluorescence microscopic observation allowed the inspection of the morphological uniformity and thickness of both under and top layers in a nondestructive manner. UV-curing of the top layer in combination with pressing with a flat substrate was necessary for obtaining a flattened top layer surface, which was responsible for allowing the reverse-tone UV nanoimprint lithography. We demonstrated the fabrication of 10-nm-thick Au split-ring resonator structures with a line width of 55 +/- 4 nm corresponding to the underlayer concave resist patterns by dry etching during Ar ion milling under the condition that the etching rate ratio of the underlayer to the top layer was 6. (C) 2015 The Japan Society of Applied Physics Directed self-assembly of nematic liquid crystalline polymers on a rubbed polyimide alignment layer Peer-reviewed Shoichi Kubo, Sho Kobayashi, Shingo Hadano, Motonori Komura, Tomokazu Iyoda, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 53 (6) 06JC04-1-06JC04-5 2014/06 Publisher: IOP PUBLISHING LTD DOI： 10.7567/JJAP.53.06JC04 ISSN：0021-4922 eISSN：1347-4065 More details Close Amphiphilic diblock copolymers PEO-b-PMA(4OPB) comprising hydrophilic poly(ethylene oxide) (PEO) and hydrophobic nematic liquid crystalline polymethacrylate [PMA(4OPB)] subunits were synthesized by atom transfer radical polymerization. The liquid crystalline property and microphase-separated structure were investigated by differential scanning calorimetry, polarized optical microscopy, atomic force microscopy, and X-ray diffraction analysis. Unimodal PEO-b-PMA(4OPB) with 114 ethylene oxide repeating units and phenylbenzoate moieties as methacrylate side chain mesogens showed a nematic phase when the methacrylate repeating unit was around 57. Hexagonal cylinders of the PEO subunits were formed in nematic phase and supercooling states. The thin film on a rubbed polyimide alignment layer showed a microphase-separated structure independent of the rubbing direction, while horizontally aligned cylinders were observed in the presence of small nematic liquid crystalline molecules of 4-cyano-4&＃39;-pentyloxybiphenyl (5OCB). The assistance of nematic liquid crystalline molecules was necessary for directed self-assembly of the nematic liquid crystalline diblock copolymer in accordance with the rubbing direction of the polyimide alignment layer. (C) 2014 The Japan Society of Applied Physics Surface-Assisted Unidirectional Orientation of ZnO Nanorods Hybridized with Nematic Liquid Crystals Peer-reviewed Shoichi Kubo, Rei Taguchi, Shingo Hadano, Mamiko Narita, Osamu Watanabe, Tomokazu Iyoda, Masaru Nakagawa ACS APPLIED MATERIALS & INTERFACES 6 (2) 811-818 2014/01 Publisher: AMER CHEMICAL SOC DOI： 10.1021/am404451z ISSN：1944-8244 More details Close Inorganic semiconductor nanorods are regarded as the primary components of optical and electrical nanoscale devices. In this paper, we demonstrate the unidirectional alignment of monolayered and dispersed ZnO nanorods on a rubbed polyimide alignment layer, which was achieved by a conventional liquid crystal alignment technique. The outermost surfaces of the ZnO nanorods (average diameter 7 nm; length SO nm) were modified by polymerization initiator moieties, and nematic liquid crystalline (LC) methacrylate polymers were grown by atom transfer radical polymerization. By regulating the densities of the polymerization initiator moieties, we successfully hybridized LC-polymer-grafted ZnO nanorods and small nematic LC molecules. The LC-polymer-modified ZnO nanorods were hierarchically aligned on the substrate via cooperative molecular interactions among the liquid crystal mesogens, which induced molecular orientation on the rubbed polyimide alignment layer. Breakthrough Achievement In Nanoimprint Lithography Using PFP Condensable Gas Peer-reviewed Shinji Matsui, Hiroshi Hiroshima, Yoshihiko Hirai, Masaru Nakagawa JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 27 (1) 61-72 2014 Publisher: TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN DOI： 10.2494/photopolymer.27.61 ISSN：0914-9244 More details Close The effectiveness of condensable gas, used as ambience, in UV nanoimprint lithography has been demonstrated. Bubble defect problem, which is inherent in UV nanoimprint under non vacuum ambience, can be solved by PFP condensable gas. UV nanoimprint lithography using PFP was validated for 45 nm pattern fabrication under thin residual layer conditions, which are required for UV nanoimprint used as UV nanoimprint lithography. PFP reduces the viscosity and demolding force of UV curable resins. These properties are helpful in increasing the throughput and reliability of UV nanoimprint. PFP occasionally produces large shrinkages, and degrades pattern quality depending on UV curable resin. These drawbacks can be mitigated by selecting UV curable monomers with a low PFP absorption. In the end, we have demonstrated the satisfied LER and LWR values requested in 22 nm node NAND flash memories and 20,000 repeated imprints with a single mold by UV nanoimprint using PFP. Fabrication of Gold Split-ring Resonator Arrays by Surface-assisted Ultraviolet Nanoimprint Lithography Using Hydroxy-terminated Alkanethiol Monolayers Peer-reviewed Takuya Uehara, Tatsuya Tomioka, Shoichi Kubo, Morihisa Hoga, Masaru Nakagawa CHEMISTRY LETTERS 42 (12) 1475-1477 2013/12 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/cl.130720 ISSN：0366-7022 eISSN：1348-0715 More details Close Dewetting behaviors of sub-50-nm-thick ultraviolet-curable resin films comprising hydroxy-containing (meth)acrylate monomers on modified Au-plated substrates were investigated by fluorescence microscopy. Hydroxy-terminated alkanethiol-adsorbed monolayers on Au surfaces suppressed dewetting of the thin spin-coated films and allowed the fabrication of 50-nm-line-width Au split-ring resonator (SRR) arrays by ultraviolet nanoimprint lithography. Super-resolution fluorescence imaging of nanoimprinted polymer patterns by selective fluorophore adsorption combined with redox switching Peer-reviewed Yu Yabiku, Shoichi Kubo, Masaru Nakagawa, Martin Vacha, Satoshi Habuchi AIP ADVANCES 3 (10) 102128-1-102128-7 2013/10 Publisher: AMER INST PHYSICS DOI： 10.1063/1.4827155 ISSN：2158-3226 More details Close We applied a super-resolution fluorescence imaging based on selective adsorption and redox switching of the fluorescent dye molecules for studying polymer nanostructures. We demonstrate that nano-scale structures of polymer thin films can be visualized with the image resolution better than 80 nm. The method was applied to image 100 nm-wide polymer nanopatterns fabricated by thermal nanoimprinting. The results point to the applicability of the method for evaluating residual polymer thin films and dewetting defect of the polymer resist patterns which are important for the quality control of the fine nanoimprinted patterns. (C) 2013 Author(s). Liquid Crystallinity of Random Copolymers of Polymethacrylates Containing Biphenyl Moieties Synthesized by Atom Transfer Radical Polymerization Peer-reviewed Rei Taguchi, Shoichi Kubo, Shingo Hadano, Tomokazu Iyoda, Masaru Nakagawa MOLECULAR CRYSTALS AND LIQUID CRYSTALS 579 (1) 30-33 2013/09 Publisher: TAYLOR & FRANCIS LTD DOI： 10.1080/15421406.2013.805049 ISSN：1542-1406 eISSN：1563-5287 More details Close 4-(4 &＃39;-Cyanobiphenyloxy)butyl methacrylate, MA(4OCB), was copolymerized with 8-(4 &＃39;-hexyloxybiphenyloxy)octyl methacrylate, MA(8O6RB), or butyl methacrylate, MA(Bu), by atom transfer radical polymerization. Phase transition behaviors and liquid crystalline properties of the random copolymers with small polydispersity were compared with those of respective homopolymers. The thermal analysis suggested that both biphenyl mesogens in the p[MA(4OCB)-co-(8O6RB)] random copolymers were oriented together rather than segregated. In the case of the p[MA(4OCB)-co-MA(Bu)] random copolymers, the butyl side-chains worked to diminish liquid crystallinity by disturbing orientation of the biphenyl mesogen due to thermal fluctuation. Preparation of UV-cured organic-inorganic hybrid materials with low refractive index for multilayer film applications Peer-reviewed Takuya Uehara, Masaru Nakagawa, Okihiro Sugihara OPTICAL MATERIALS EXPRESS 3 (9) 1351-1357 2013/09 Publisher: OPTICAL SOC AMER DOI： 10.1364/OME.3.001351 ISSN：2159-3930 More details Close Ultraviolet (UV)-cured organic-inorganic hybrid materials with low refractive index (<1.40) were prepared for multilayer film applications. The hybrid materials comprised hollow silica nanoparticles modified with trialkoxysilane-derived reactive coupling agents. The average number of modifier molecules on the surface of a hollow silica nanoparticle was 0.47 molecule/nm(2). The modified hollow silica nanoparticles were homogeneously mixed with UV-curable resins, which induced radical photopolymerization. A UV-cured film containing 60 wt% hollow silica nanoparticles showed a transmittance of >99% in the visible and near-infrared regions and a low refractive index of 1.372 at 633 nm. A TiO2-containing UV-cured hybrid film with high refractive index was easily coated on the UV-cured low-refractive-index film. (c) 2013 Optical Society of America Gas permeability of patterned polydimethylsiloxane-grafted polyimide membranes fabricated by nanocasting method Peer-reviewed Cheol Min Yun, Yu Nagase, Masaru Nakagawa Molecular Crystals and Liquid Crystals 580 (1) 35-38 2013/09/01 DOI： 10.1080/15421406.2013.803910 ISSN：1542-1406 1563-5287 More details Close We showed a new approach to fabricate separation membranes with enlarged surface areas by nanocasting and investigated the effects of the enlarged surface area on the gas permeability of polydimethylsiloxane (PDMS)-grafted polyimide membranes. A PDMSgrafted polyimide dissolving in solvent was cast onto a patterned nickel (Ni) substrate. The thermal crosslinking reactions occurring among intermolecular PDMS segments allowed the fabrication of insoluble patterned PDMS-grafted polyimide membranes by demolding. The patterned membranes showed higher gas permeability coefficients than the corresponding flat membranes and showed an increasing permeation selectivity for carbon dioxide. © 2013 Taylor and Francis, LLC. Resolution Limits of Nanoimprinted Patterns by Fluorescence Microscopy Peer-reviewed Shoichi Kubo, Tatsuya Tomioka, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 52 (6) 06GJ01-1-06GJ01-6 2013/06 Publisher: IOP PUBLISHING LTD DOI： 10.7567/JJAP.52.06GJ01 ISSN：0021-4922 eISSN：1347-4065 More details Close The authors investigated optical resolution limits to identify minimum distances between convex lines of fluorescent dye-doped nanoimprinted resist patterns by fluorescence microscopy. Fluorescent ultraviolet (UV)-curable resin and thermoplastic resin films were transformed into line-and-space patterns by UV nanoimprinting and thermal nanoimprinting, respectively. Fluorescence immersion observation needed an immersion medium immiscible to the resist films, and an ionic liquid of triisobutyl methylphosphonium tosylate was appropriate for soluble thermoplastic polystyrene patterns. Observation with various numerical aperture (NA) values and two detection wavelength ranges showed that the resolution limits were smaller than the values estimated by the Sparrow criterion. The space width to identify line patterns became narrower as the line width increased. The space width of 100 nm was demonstrated to be sufficient to resolve 300-nm-wide lines in the detection wavelength range of 575-625 nm using an objective lens of NA = 1.40. (c) 2013 The Japan Society of Applied Physics Study of Demolding Characteristics in Step-and-Repeat Ultraviolet Nanoimprinting Peer-reviewed Shuso Iyoshi, Makoto Okada, Tetsuya Katase, Katsuhiko Tone, Kei Kobayashi, Shu Kaneko, Yuichi Haruyama, Masaru Nakagawa, Hiroshi Hiroshima, Shinji Matsui JAPANESE JOURNAL OF APPLIED PHYSICS 52 (6) 06GJ04-1-06GJ04-9 2013/06 Publisher: IOP PUBLISHING LTD DOI： 10.7567/JJAP.52.06GJ04 ISSN：0021-4922 eISSN：1347-4065 More details Close Ultraviolet (UV) nanoimprinting includes a contact process necessary for transferring nanoscale features from a mold to a UV-curable resist coated on a substrate. The demolding that comes with the contact process is a source of defects, and an obstacle to be overcome for nanodevice fabrications. In this study, we aim to execute more than 10000 times of step-and-repeat UV nanoimprinting with a single mold, tracing demolding forces and water contact angles of the mold surface as the indication of mold-resist/substrate interface and mold degradation. A condensable gas, a UV-curable resist, and a fluorosurfactant were considered in this study. It was revealed that 1,1,1,3,3-pentafluoropropane (PFP) or HFC-245fa, which is the common industrial name, as a condensable gas and a type of fluorosurfactant played an important role in minimizing the demolding impact and thus helped in increasing mold lifetime. The surfactant-added resists performed 6500 imprinting steps in PFP. (c) 2013 The Japan Society of Applied Physics Innovative Nano imprint Lithography Using PFP Condensable Gas Invited Peer-reviewed Hiroshi Hiroshima, Masaru Nakagawa, Yoshihiko Hirai, Shinji Matsui JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 26 (1) 87-96 2013 Publisher: TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN DOI： 10.2494/photopolymer.26.87 ISSN：0914-9244 More details Close The effectiveness of condensable gas, used as ambience, in UV nanoimprint lithography has been demonstrated. Bubble defect problem, which is inherent in UV nanoimprint under non vacuum ambience, can be solved by PFP condensable gas. UV nanoimprint lithography using PFP was validated for 45 nm pattern fabrication under thin residual layer conditions, which are required for UV nanoimprint used as UV nanoimprint lithography. PFP reduces the viscosity and demolding force of UV curable resins. These properties are helpful in increasing the throughput and reliability of UV nanoimprint. PFP occasionally produces large shrinkages, and degrades pattern quality depending on UV curable resin. These drawbacks can be mitigated by selecting UV curable monomers with a low PFP absorption with a solubility parameter away from 20( J/cm(3))(1/2). UV nanoimprint using PFP is so striking that we now think use of PFP be an integral part of UV nanoimprint. Photochemical grafting reactions of a benzophenone-containing alkanethiol monolayer on au with deuterated polystyrene Peer-reviewed Hirokazu Oda, Ken Onda, Masaru Nakagawa Bulletin of the Chemical Society of Japan 86 (9) 1035-1040 2013 DOI： 10.1246/bcsj.20130137 ISSN：0009-2673 1348-0634 More details Close Photochemical reactions of 4-[(10-sulfanyldecyl)oxy]benzophenone with deuterated polystyrene (PS-d8) were studied using Fourier-transform infrared (FT-IR) spectroscopy and vibrational sum frequency generation (VSFG) spectroscopy. The FT-IR spectral changes of PS thin films indicated that exposure to ultraviolet (UV) light caused photochemical consumption of the benzophenone moiety by a hydrogen abstraction reaction of the carbonyl group the reaction was almost complete at an exposure energy of 2.0 J cm-2 at 254 nm. The VSFG spectral changes of the adsorbed monolayer on Au on UV exposure revealed that the carbonyl groups oriented parallel to the Au substrate surface were consumed at more exposure energies. The exposure-energy-dependent formation of PS-grafted layers was confirmed by atomic force microscopy observations of Au surfaces modified with a photoreactive monolayer. © 2013 The Chemical Society of Japan. Fabrication of Au nanorod and nanogap split-ring structures by reactive-monolayer-assisted thermal nanoimprint lithography involving electrodeposition Peer-reviewed Tatsuya Tomioka, Shoichi Kubo, Koichi Nagase, Morihisa Hoga, Masaru Nakagawa JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 30 (6) 06FB02-1-06FB02-7 2012/11 Publisher: A V S AMER INST PHYSICS DOI： 10.1116/1.4755817 ISSN：1071-1023 More details Close Au nanorods and Au nanogap split-ring (SR) structures were fabricated to investigate the ability of wet etching and Ar ion milling processes to remove an underlying Au electrode layer on shapes of electrodeposited Au structures. A reactive-monolayer-assisted thermal nanoimprint lithography process involving Au electrodeposition was used to make 100nm x 500 nm Au nanorods and Au nanogap SR structures with widths of 125 nm and two 20 nm gaps. Individual Au bump structures were successfully demonstrated on transparent silica substrates by Ar ion milling and subsequent Cr wet etching. Au nanorod and nanogap SR structures were obtained almost uniformly over a 100-mu m square area, which was sufficient to investigate their optical properties. The array comprising electrodeposited Au nanorods showed an anisotropic absorption band, attributable to a transverse plasmon band at wavelengths ranging from 500 to 700 nm when an incident light was linearly polarized perpendicular to the long axis of Au nanorods. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4755817] Investigation of nonreactive fluoroalkyl-containing surfactants for reducing release energy of ultraviolet-cured acrylate resins Peer-reviewed Masaru Nakagawa, Ayako Endo, Yoshitaka Tsukidate JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 30 (6) 06FB10-1-06FB10-5 2012/11 Publisher: A V S AMER INST PHYSICS DOI： 10.1116/1.4766880 ISSN：1071-1023 More details Close The authors investigated the types of additive nonreactive fluorinated surfactants that effectively decrease the release energy of a certain ultraviolet-cured base resin for radical photopolymerization. The release energies of resins containing various surfactants were compared in two atmospheres, namely air and 1,1,1,3,3-pentafluoropropane (PFP, HFC-245fa). Tridecafluoro-1,1,2,2-tetrahydrooctan-1-ol functioned as the most effective surfactant under an air atmosphere, for detachment of a silica surface modified with tridecafluoro-1,1,2,2-tetrahydrotrimethoxysilane from the cured resins. Under a PFP atmosphere, heptadecafluoro-1,1,2,2-tetrahydrodecan-1-ol with a longer fluoroalkyl chain was necessary to effectively decrease the release energy. It was indicated that the segregation of liquid fluoroalkyl alcohols between the cured resin and modified mold was effective in decreasing the release energy of cured resins. (C) 2012 American Vacuum Society. [http://dx.doi.org/10.1116/1.4766880] Gold Mesh Structures with Controlled Aperture Ratios Fabricated by Reactive-monolayer-assisted Thermal Nanoimprint Lithography Peer-reviewed Shoichi Kubo, Koichi Nagase, Masaru Nakagawa CHEMISTRY LETTERS 41 (10) 1291-1293 2012/10 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/cl.2012.1291 ISSN：0366-7022 eISSN：1348-0715 More details Close Fabrication of Au mesh structures by reactive-monolayer-assisted thermal nanoimprint lithography was demonstrated. A fluorescent dye-doped polystyrene thin film on a Au-plated substrate modified with a photoreactive monolayer was transformed using a mold with a lattice pattern. Au mesh patterns were obtained by removal of the residual layers and subsequent wet etching. The aperture ratio could be tuned by controlled side-etching. Au mesh structures with a Au line width of approximately 1 mu m are promising for transparent conductive substrates. Surface Segregation of 1H,1H,9H-Hexadecafluorononyl Acrylate in Dimethacrylate Resin Films Cured by Exposure to Ultraviolet Light Peer-reviewed Shunya Ito, Cheol Min Yun, Kei Kobayashi, Masaru Nakagawa CHEMISTRY LETTERS 41 (10) 1294-1296 2012/10 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/cl.2012.1294 ISSN：0366-7022 eISSN：1348-0715 More details Close The surface free energies of dimethacrylate resin films containing a fluorinated reactive additive, 1H,1H,9H-hexadecafluorononyl acrylate, cured by exposure to ultraviolet (UV) light, were investigated. Hansen&＃39;s solubility parameter was useful for choosing a base monomer suitable for the fluorinated additive, which lowered the surface free energy of the cured resin film and decreased the release energy on demolding in UV nanoimprinting. Gram-scale Synthesis of Zinc Oxide Nanorods in Basic Ethanol Solutions Peer-reviewed Shoichi Kubo, Masaru Nakagawa CHEMISTRY LETTERS 41 (10) 1137-1138 2012/10 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/cl.2012.1137 ISSN：0366-7022 eISSN：1348-0715 More details Close ZnO nanocrystals were obtained by adding an alcoholic solution of sodium methoxide containing a small amount of water to an alcoholic solution of zinc acetate dihydrate. Rod-like ZnO nanocrystals were obtained in ethanol solutions, while cubic ZnO nanocrystals were obtained in methanol solutions. X-ray diffraction analysis, UV-visible absorption spectroscopy, and transmission electron microscopy revealed that ZnO nanorods having a length of about 50 mn and width of about 5 nm were thus synthesized easily on a gram scale. Silica/Ultraviolet-Cured Resin Nanocomposites for Replica Molds in Ultraviolet Nanoimprinting Peer-reviewed Cheol Min Yun, Shimpei Kudo, Koichi Nagase, Shoichi Kubo, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 51 (6) 06FJ04-1-06FJ04-7 2012/06 Publisher: IOP PUBLISHING LTD DOI： 10.1143/JJAP.51.06FJ04 ISSN：0021-4922 eISSN：1347-4065 More details Close Fluid UV-curable composite resins made with methacrylate-modified silica nanoparticles (NPs), a diacrylate monomer, and a photoinitiator without nonreactive solvents were prepared to develop composite replica molds in UV nanoimprinting. 1,4-Bis(acryloyloxy) butane was compatible with NPs up to an inorganic silica component of 60 wt %, and its cured composite films showed a high transmittance of >89% at an i-line wavelength of 365 nm. The fluorinated antisticking layer obtained from an antisticking reagent was formed effectively on a composite surface at which bare silica surfaces of NPs appeared by photooxidation of the composite film surface. Composite replica molds could be fabricated by putting a droplet of the composite resin on a silica substrate modified with a reactive adhesion layer, filling cavities of a fluorinated master mold with the resin under a pentafluoropropane (PFP) atmosphere, curing the molded resin by exposure to UV light, and treating the surface of the cured resin with the antisticking reagent after demolding. It was confirmed that the composite replica molds were available for step-and-repeat UV nanoimprinting using an acrylate-type UV-curable resin in PFP. The composite replica molds showed remarkably smaller release energies than the replica mold without NPs. (C) 2012 The Japan Society of Applied Physics Morphological Changes in Ultraviolet-Nanoimprinted Resin Patterns Caused by Ultraviolet-Curable Resins Absorbing Pentafluoropropane Peer-reviewed Shu Kaneko, Kei Kobayashi, Yoshitaka Tsukidate, Hiroshi Hiroshima, Shinji Matsui, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 51 (6) 06FJ05-1-06FJ05-6 2012/06 Publisher: IOP PUBLISHING LTD DOI： 10.1143/JJAP.51.06FJ05 ISSN：0021-4922 eISSN：1347-4065 More details Close In this article, we revealed the maximum values of pentafluoropropane (PFP) absorbed by acrylate-type monomers and UV-curable resins causing radical photopolymerization and measured the viscosities in a state saturated with PFP. We described the influences of PFP condensable gas effectively used in UV nanoimprinting on the morphologies of resin patterns fabricated by UV nanoimprinting. The weights of the resins and monomers were increased by exposure to a PFP atmosphere, while the viscosities were reduced markedly. The absorption of PFP depended on the chemical structures of the monomers. The solubility parameter calculated by the Hoy method clearly suggested that the monomer with a solubility parameter of 20 (Jcm(-3))(1/2) absorbed the most PFP. The UV-curable resin composed of the monomer absorbing a large amount of PFP resulted in morphological changes in nanoimprinted resin patterns where the height was lowered and the outermost surface became rough. The UV-curable resins having hydroxyl groups play an important role in preserving the size fidelity of UV-nanoimprinted resin patterns. (C) 2012 The Japan Society of Applied Physics Step and Repeat Ultraviolet Nanoimprinting under Pentafluoropropane Gas Ambient Peer-reviewed Shuso Iyoshi, Makoto Okada, Tetsuya Katase, Katsuhiko Tone, Kei Kobayashi, Shu Kaneko, Yuichi Haruyama, Masaru Nakagawa, Hiroshi Hiroshima, Shinji Matsui JAPANESE JOURNAL OF APPLIED PHYSICS 51 (6) 06FJ08-1-06FJ08-6 2012/06 Publisher: IOP PUBLISHING LTD DOI： 10.1143/JJAP.51.06FJ08 ISSN：0021-4922 eISSN：1347-4065 More details Close In the UV nanoimprinting process an antisticking layer such as fluorinated self-assembled monolayer (F-SAM) is grafted on the mold surface to diminish the demolding impact. These layers are supposed to deteriorate as the imprint steps mount up, resulting in defects in the cured resist layer. In this work, continuous multiple shots of UV nanoimprint were conducted in the air and in pentafluoropropane (PFP) gas environment and demolding forces in every imprint step were determined. The experiments revealed that the demolding forces for the imprint in PFP atmosphere drastically reduced compared with those in the air. Water contact angles of the mold surface were also determined in every 225 imprint steps to observe the degree of degradation of the antisticking layer. It was found that the antisticking layer was less damaged or contaminated in the PFP environment than it was in the air after a certain number of imprint steps. (C) 2012 The Japan Society of Applied Physics Monolayer Engineering in Nanoimprint Lithography Nakagawa Masaru Abstract of annual meeting of the Surface Science of Japan 32 273-273 2012 Publisher: The Surface Science Society of Japan DOI： 10.14886/sssj2008.32.0_273 Fabrication of Left-Handed Metal Microcoil from Spiral Vessel of Vascular Plant Peer-reviewed Kaori Kamata, Soichiro Suzuki, Masayuki Ohtsuka, Masaru Nakagawa, Tomokazu Iyoda, Atsushi Yamada ADVANCED MATERIALS 23 (46) 5509-+ 2011/12 Publisher: WILEY-BLACKWELL DOI： 10.1002/adma.201103605 ISSN：0935-9648 More details Close Silver microcoil is fabricated through a biotemplating process combined with electroless plating. Spiral vessels in Lotus root are employed as a biotemplate because of their left-handed coil structure. The silver microcoil exhibits a solenoidal microcoil showing self-inductance in the level of picohenry, which could be applied for electromagnetic-responsive materials in the high-frequency region such as millimeter waves or terahertz waves. Nanomedicine for Cancer: Lipid-Based Nanostructures for Drug Delivery and Monitoring Peer-reviewed Yoshihisa Namiki, Teruaki Fuchigami, Norio Tada, Ryo Kawamura, Satoshi Matsunuma, Yoshitaka Kitamoto, Masaru Nakagawa ACCOUNTS OF CHEMICAL RESEARCH 44 (10) 1080-1093 2011/10 Publisher: AMER CHEMICAL SOC DOI： 10.1021/ar200011r ISSN：0001-4842 eISSN：1520-4898 More details Close Recent advances in nanotechnology, materials science, and biotechnology have led to innovations in the field of nanomedicine. Improvements in the diagnosis and treatment of cancer are urgently needed, and it may now be possible to achieve marked improvements in both of these areas using nanomedicine. Lipid-coated nanoparticles containing diagnostic or therapeutic agents have been developed and studied for biomedical applications and provide a nanomedicine strategy with great potential. Lipid nanoparticles have cationic headgroups on their surfaces that bind anionic nucleic acids and contain hydrophobic drugs at the lipid membrane and hydrophilic drugs inside the hollow space in the interior. Moreover, researchers can design nanoparticles to work in combination with external stimuli such as magnetic field, light, and ionizing radiation, which adds further utility In biomedical applications. In this Account, we review several examples of lipid-based nanoparticles and describe their potential for cancer treatment and diagnosis. (1) The development of a lipid-based nanoparticle that induded a promoter-enhancer and transcriptional activator greatly improved gene therapy. (2) The addition of a radiosensitive promoter to lipid nanoparticles was sufficient to confer radioisotope-activated expression of the genes delivered by the nanoparticles. (3) We successfully tailored lipid nanoparticle composition to increase gene transduction in scirrhous gastric cancer cells. (4) When lipophilic photosensitizing molecules were incorporated into lipid nanoparticles, those particles showed an increased photodynamic cytotoxic effect on the target cancer. (5) Coating an Fe3O4 nanocrystal with lipids proved to be an efficient strategy for magnetically guided gene-silencing in tumor tissues. (6) An Fe16N2/lipid nanocomposite displayed effective magnetism and gene delivery in cancer cells. (7) Lipid-coated magnetic hollow capsules carried aqueous anticancer drugs and delivered them in response to a magnetic field. (8) Fluorescent lipid-coated and antibody-conjugated magnetic nanoparticles detected cancer-associated antigen in a microfluidic channel. We believe that the continuing development of lipid-based nanomedicine will lead to the sensitive minimally Invasive treatment of cancer. Moreover, the fusion of different scientific fields is accelerating these developments, and we expect these interdisciplinary efforts to have considerable ripple effects on various fields of research. Fluorescent Microscopy Proving Resin Adhesion to a Fluorinated Mold Surface Suppressed by Pentafluoropropane in Step-and-Repeat Ultraviolet Nanoimprinting Peer-reviewed Kei Kobayashi, Shoichi Kubo, Hiroshi Hiroshima, Shinji Matsui, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 50 (6) 06GK02-1-06GK02-10 2011/06 Publisher: JAPAN SOC APPLIED PHYSICS DOI： 10.1143/JJAP.50.06GK02 ISSN：0021-4922 More details Close Resin adsorption on fluorinated silica mold surfaces during step-and-repeat ultraviolet nanoimprinting was studied by fluorescent microscopy using a fluorescent UV-curable resist. The fluorescence intensity indicating resin adsorption to the mold surfaces in step-and-repeat UV nanoimprinting under air atmosphere was significantly higher than that under condensable gas pentafluoropropane (PFP) atmosphere. The larger resin adsorption in air was attributable to sticking uncured resin around trapped air bubbles preventing the UV-curable resist from causing acrylate radical photopolymerization and to the small amount of resin components adhering to the mold surface. The entire adsorption of resin components, not only a fluorescent dye doped in a UV-curable resin, was confirmed by high-sensitivity UV-visible absorption spectroscopy and atomic force microscopy in a frictional mode. PFP suppressed obviously stuck uncured resin and entirely adhered resin components to the fluorinated mold surface. The entire adsorption of resin components was compared among three kinds of fluorinated mold surface treated with commercially available antisticking reagents, FAS13 (tridecafluoro-1,1,2,2-tetrahydro-octyltrimethoxysilane), OPTOOL DSX, and OPTOOL AES4-E. It was proved by the fluorescent microscopy that the fluorinated mold surface prepared by chemical vapor surface modification with FAS13 showed the best antisticking property among the fluorinated mold surfaces, because the entire adsorption of resin components was hardly affected by the number of cycles of step-and-repeat UV nanoimprinting and by the positions in the mold surface. (C) 2011 The Japan Society of Applied Physics Optically Transparent and Refractive Index-Tunable ZrO2/Photopolymer Composites Designed for Ultraviolet Nanoimprinting Peer-reviewed Shimpei Kudo, Koichi Nagase, Shoichi Kubo, Okihiro Sugihara, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 50 (6) 06GK12-1-06GK12-7 2011/06 Publisher: JAPAN SOC APPLIED PHYSICS DOI： 10.1143/JJAP.50.06GK12 ISSN：0021-4922 More details Close Epoxy-based, acrylate-based, and urethane-based ultraviolet (UV)-curable resins containing acrylate-modified zirconia nanoparticles (ZrO2-NPs) were prepared. UV-cured composite films fabricated using an acrylate-based resin and an epoxy-based resin exhibited a high transmittance > 90% at visible and near-infrared wavelengths until the weight fraction of ZrO2-NPs having an average zirconia core diameter of 4.0nm reached 0.66. Their refractive indices at 633nm were widely controllable between 1.515 and 1.659 for the acrylate-based composite films and between 1.589 and 1.679 for the epoxy-based composite films. Thin films of the UV-curable composite resins could be transformed by UV nanoimprinting in pentafluoropropane using a fluorinated silica mold. Among the composite resins, the acrylate-based UV-curable composite resins showed facile workability by UV nanoimprinting. The epoxy-based UV-curable composite resins formed pattern shapes independent of the weight fraction of ZrO2-NPs. These results indicated that the acrylate-based and epoxy-based composite films with optical transparency, refractive index controllability, and workability had potential as optical materials of optical devices and as resist materials for dry etching. (C) 2011 The Japan Society of Applied Physics Photoassisted Fusion Behavior of Decanethiol-Passivated Gold Nanoparticles by Vacuum Ultraviolet Light Exposure Peer-reviewed Motohiro Tagaya, Masaru Nakagawa INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH 50 (12) 7398-7402 2011/06 Publisher: AMER CHEMICAL SOC DOI： 10.1021/ie200089n ISSN：0888-5885 More details Close The photoassisted fusion of a decanethiol-passivated Au-nanoparticle film on a glass substrate by exposure to vacuum-ultraviolet (vacuum-UV) light at 172 nm was investigated and compared to that by thermal fusion. On the basis of the thermal treatment at 200 degrees C, the X-ray diffraction patterns indicated that the Au-nanoparticle film with the particle diameter of 2.1 nm is completely converted to a crystalline Au film, and the film surface was coarsely granular, having a roughness of several tens of nanometers by field emission-scanning electron microscopy observation. After exposure to vacuum-UV light, the UV-vis absorption spectra revealed that the surface plasmon band at 535 nm showed a red shift with the increasing exposure time, and then the absorption band at 770 nm was clearly observed at 30 min. The diameter of the fused Au nanoparticles was larger than 20 nm on the basis of a transmission electron microscopy observation. These changes indicated that the Au nanoparticles were converted to the crystalline state due to photodecomposition of the decanethiol. Thus, the controllable mild fusion among neighboring Au nanoparticles at room temperature was achieved by vacuum-UV-light exposure due to photodecomposition of the decanethiol. Resist Pattern Inspection Using Fluorescent Dye-Doped Polystyrene Thin Films in Reactive-Monolayer-Assisted Thermal Nanoimprint Lithography Peer-reviewed Shoichi Kubo, Yuko Sato, Yoshihiko Hirai, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 50 (6) 06GK10-1-06GK10-9 2011/06 Publisher: JAPAN SOC APPLIED PHYSICS DOI： 10.1143/JJAP.50.06GK10 ISSN：0021-4922 More details Close Fluorescent dye-doped polystyrene (PS) thin films were studied for defect inspection of PS resist patterns by fluorescence microscopy in reactive-monolayer-assisted thermal nanoimprint lithography using a photoreactive monolayer. A fluorescent dye of N,N&＃39;-bis(2,6-dimethylphenyl-perylene-3,4,9,10-tetracarboxylic diimide doped in a PS resist thin film maintained an almost identical fluorescence intensity after annealing at a temperature necessary for thermal nanoimprinting. To avoid degradation of a dye doped in a resist film owing to exposure to ultraviolet light for preparing a PS graft layer on the photoreactive monolayer, a double coating method for preparing a dye-doped PS resist layer on the PS graft layer was adopted. It was demonstrated by the fluorescent microscopic defect inspection that resist pattern defects due to unleveled residual layers after thermal nanoimprinting were significantly decreased by adding low-molecular-weight PS (5,100 g mol(-1)) to high-molecular-weight PS (360,000 g mol(-1)). The rheological study revealed that the low-molecular-weight PS obviously functioned as a plasticizer, which flattened residual layers and decreased their thickness. (C) 2011 The Japan Society of Applied Physics Ferromagnetic FePt-Nanoparticles/Polycation Hybrid Capsules Designed for a Magnetically Guided Drug Delivery System Peer-reviewed Teruaki Fuchigami, Ryo Kawamura, Yoshitaka Kitamoto, Masaru Nakagawa, Yoshihisa Namiki LANGMUIR 27 (6) 2923-2928 2011/03 Publisher: AMER CHEMICAL SOC DOI： 10.1021/la1041019 ISSN：0743-7463 More details Close The present Article describes the synthesis of ferromagnetic capsules approximately 330 nm in diameter with a nanometer-thick shell to apply to magnetic carriers in a magnetically guided drug delivery system. The magnetic shell of 5 nm in thickness is a nanohybrid, composed of ordered alloy FePt nanoparticles of approximately 3-4 nm in size and a polymer layer of a cationic polyelectrolyte, poly(diaryldimethylammonium chloride) (PDDA). The magnetic capsules have an excellent capacity for carrying medical drugs and genes. Surface-modified silica particles with PDDA were used as a template for the capsules. FePt nanoparticles were deposited on the PDDA-modified silica particles through a polyol method followed by dissolving the silica particles with a NaOH solution, resulting in the formation of the magnetic capsules as the final product. A three-dimensional hollow structure is maintained by the nanohybrid shell. The FePt-nanoparticles/PDDA nanohybrid shell also exhibits, a ferromagnetic feature at room temperature because the FePt nanoparticles of an ordered-alloy phase are formed with the aid of PDDA despite the small size Facile wide-scale defect detection of UV-nanoimprinted resist patterns by fluorescent microscopy Peer-reviewed Kei Kobayashi, Shoichi Kubo, Shinji Matsui, Masaru Nakagawa JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 28 (6) C6M50-C6M56 2010/11 Publisher: A V S AMER INST PHYSICS DOI： 10.1116/1.3507440 ISSN：1071-1023 More details Close The occurrence of resist pattern defects in UV nanoimprinting with a spincoated resin thin film on a silicon wafer was studied by fluorescent microscopy using a fluorescent UV-curable liquid resin causing radical photopolymerization. The generation of nonfill defects with a surface-modified silica mold with submicrometer line cavities was compared between UV nanoimprinting atmospheres of air and pentafluoropropane. It was visualized in a rapid and nondestructive manner that nonfill defects were hardly induced by UV nanoimprinting under easily condensable pentafluoropropane atmosphere, while nonfill defects owing to bubble trap and resin adhesion to a mold surface were observed in the case of UV nanoimprinting under air atmosphere. The fluorescent microscopy using the fluorescent UV-curable resin was useful for mold inspection whether or not the submicrometer-scale mold cavities were partially filled with the resin. To investigate a resolution limit to nonfill defect, the authors examined a pattern pitch and a space width for convex resist line patterns in the line width range of 80-3000 nm with various ratios of space width to line width. Linear analysis of fluorescence intensity using fluorescent microscope images revealed that line pattern pitches with a space width of 0.30 mu m could be detected by fluorescent microscopy. The 0.30 mu m space width was almost consistent with a value calculated according to a Sparrow resolution limit. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3507440] Enhanced Durability of Antisticking Layers by Recoating a Silica Surface with Fluorinated Alkylsilane Derivatives by Chemical Vapor Surface Modification Peer-reviewed Akihiro Kohno, Nobuji Sakai, Shinji Matsui, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 49 (6) 06GL12-1-06GL12-6 2010 Publisher: JAPAN SOC APPLIED PHYSICS DOI： 10.1143/JJAP.49.06GL12 ISSN：0021-4922 More details Close Adsorbed monolayers from (3,3,3-trifluoropropyl) trimethoxysilane (FAS3), (tridecafluoro-1,1,2,2-tetrahydrooctyl) trimethoxysilane (FAS13), (heptadecafluoro-1,1,2,2-tetrahydrodecyl) trimethoxysilane (FAS17), and (heptadecafluoro-1,1,2,2-tetrahydrodecyl) trichlorosilane (FAS17-Cl) were formed by chemical vapor surface modification (CVSM) on silica lens surfaces cleaned by exposure to vacuum ultraviolet (VUV) light at 172 nm. Changes in monolayer-modified lens surfaces concomitant with repeating a cycle of curing to induce the radical polymerization of a UV-curable resin and detaching the UV-cured resin were monitored by contact angle measurement with water and atomic force microscopy to investigate the property of the adsorbed monolayers as antisticking layers in UV nanoimprint lithography. A decrease of the contact angle for water with increasing the number of repeated cycles was mainly responsible for the removal of surface impurities in the form of nanoparticles on detaching the cured resin repeatedly. It was found that recoating the silica lens surface with monolayers from FAS13, FAS17, and FAS17-Cl after cleaning by VUV-light exposure resulted in the suppression of the decrease in the contact angle. These results indicate that the durability of an antisticking layer in UV nanoimprint lithography is markedly improved by the recoating. (C) 2010 The Japan Society of Applied Physics Growth Behavior of an Adsorbed Monolayer from a Benzophenone-Containing Trimethoxysilane Derivative on a Fused Silica Surface for Nanoimprint Molds by Chemical Vapor Surface Modification Peer-reviewed Shoichi Kubo, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 49 (6) 06GL03-1-06GL03-5 2010 Publisher: JAPAN SOC APPLIED PHYSICS DOI： 10.1143/JJAP.49.06GL03 ISSN：0021-4922 More details Close The formation of a monolayer from a benzophenone-containing trimethoxysilane derivative was studied to understand the growth behavior of an antisticking layer from a trimethoxysilane derivative with an alkyl long tail often used as an antisticking layer in nanoimprint lithography. An adsorbed monolayer was formed from 4-{[(3-trimethoxysilyl)propyl]oxy} benzophenone on a fused silica surface by chemical vapor surface modification (CVSM). The growth behavior of the adsorbed monolayer was monitored by UV-visible spectroscopy, and the results were compared with those obtained by contact angle measurement for water and atomic force microscopy. The monolayer formation was confirmed with absorption spectra showing a characteristic absorption band derived from a benzophenone moiety. Changes in contact angle and absorbance with an increase in CVSM period suggested that the monolayer formation was completed in 2 h. The period of 2 h suitable for CVSM was also supported by atomic force microscopy topographic images. These results suggested that the monolayer growth comprises the following three steps: the surface adsorption, condensation and packing, and excess adsorption steps. (C) 2010 The Japan Society of Applied Physics Resist Properties of Thin Poly(methyl methacrylate) and Polystyrene Films Patterned by Thermal Nanoimprint Lithography for Au Electrodeposition Peer-reviewed Koichi Nagase, Shoichi Kubo, Masaru Nakagawa JAPANESE JOURNAL OF APPLIED PHYSICS 49 (6) 06GL05-1-06GL05-5 2010 Publisher: JAPAN SOC APPLIED PHYSICS DOI： 10.1143/JJAP.49.06GL05 ISSN：0021-4922 More details Close Gold (Au) line patterns of 0.5 and 1 mm widths were fabricated on a silicon substrate covered with a Au thin film by thermal nanoimprint lithography with poly(methyl methacrylate) (PMMA) and polystyrene (PS), followed by Au electrodeposition with their thin films as resist masks. We described the differences in the fidelity of the deposited Au patterns for linewidth and linewidth roughness and differences in undesired Au deposition in the masked regions between thin PMMA and PS films. The linewidths of the convex deposited Au pattern were larger than those of the concave nanoimprinted polymer pattern, and the deviation from the polymer concave pattern in the case of PS was significantly smaller than that in the case of PMMA. The linewidth roughness of the Au lines deposited with a PMMA mask was markedly high owing to particle-like Au deposition in comparison with that deposited with a PS mask. Undesired Au deposition occurred even on electrode surfaces masked with the thin PMMA and PS films. It was considered from these results that the difference in the size accuracy of Au electrodeposition between PMMA and PS was responsible for the resistance in the oxygen dry-etching step of a residual layer during thermal nanoimprint lithography in addition to polymer water absorbability in Au electrodeposition. (C) 2010 The Japan Society of Applied Physics Semitransparent Conductive Thin Porous Au Films on a Thiol-containing Primer Layer formed from Au Nanoparticle Ink Peer-reviewed Koichi Nagase, Masahiko Kawashima, Masaru Nakagawa JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 23 (2) 265-268 2010 Publisher: TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN DOI： 10.2494/photopolymer.23.265 ISSN：0914-9244 More details Close We demonstrated that thin porous Au films showing semi-transparency in the region of visible light and electric conductivity were prepared by spincoating an alpha-terpineol ink containing decanethiol-passivated Au nanoparticles onto silica and silicon substrates modified with 3-mercaptopropyltriethoxysilane and subsequent annealing for sintering the Au nanoparticles. A thin film of the alpha-terpineol ink was transformed to droplets on unmodified silica and silicon substrates by dewetting after spincoating, while it was changed to a thin porous film on the modified substrates by suppressing a progress of dewetting. The porous structure remained after sintering at 300 degrees C, resulting in the formation of semitransparent and conductive thin porous Au films with a transmittance of about 40 % in the visible light region and a surface resistivity of 10(-2) - 10(-3) Omega/square. We also demonstrated that the thin porous Au film was available as a wet etching mask for silicon microprocessing using a hydrogen fluoride (HF) aqueous solution. Formation of an Adsorbed Monolayer from Pentafluorophenyltriethoxysilane and its Antisticking Property to a UV-curable Resin studied by High-sensitive UV-visible Spectroscopy Peer-reviewed Sosuke Korenaga, Kei Kobayashi, Akihiro Kohno, Shoichi Kubo, Masaru Nakagawa JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 23 (1) 59-64 2010 Publisher: TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN DOI： 10.2494/photopolymer.23.59 ISSN：0914-9244 More details Close Surface modification of a fused silica substrate was carried out by chemical vapor surface modification (CVSM) with (pentafluorophenyl)triethoxylsilane (F5Ph). The adsorption behavior of F5Ph was studied by high-sensitive UV-visible spectroscopy, contact angle measurement, and atomic force microscopy. The F5Ph adsorption on a silica substrate reached to the saturation by CVSM at 150 C for 2 h. As a result, the adsorbed monolayer without aggregates was formed. The antisticking property of the F5Ph-adsorbed silica substrate to UV-curable resin causing radical photopolymerization was investigated. After curing and detaching a droplet of the resin, some organic components derived from the resin remained. The amount of remaining resin components on the F5Ph-adsorbed silica substrate was almost the same as that measured on silica substrates modified with (3,3,3-trifluoropropyl)trimethoxysilane (FAS3) and Optool-DSX forming antisticking layers. These results indicate that the F5Ph adsorbed monolayer is available as an antisticking layer in UV nanoimprint lithography. It was clear that high-sensitive UV-visible spectroscopy was a powerful tool to quantify adsorbed molecules on a silica mold surface and detect the adhesion of resin components after detachment. Reactive-monolayer-assisted Thermal Nanoimprint Lithography with a Benzophenone-containing Trimethoxysilane Derivative for patterning Thin Chromium and Copper Films Peer-reviewed Shoichi Kubo, Tomoyuki Ohtake, Eui-Chul Kang, Masaru Nakagawa JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 23 (1) 83-86 2010 Publisher: TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN DOI： 10.2494/photopolymer.23.83 ISSN：0914-9244 More details Close Reactive-monolayer-assisted thermal nanoimprint lithography was applied for patterning thin films of chromium (Cr) and copper (Cu). The metal surfaces with the oxide layer were modified with a benzophenone-containing trimethoxysilane derivative to induce a surface graft reaction of the benzophenone moiety with poly(styrene) (PS) used for a resist polymer. A thin PS film was successfully prepared as a resist layer for wet etching on the modified metal surfaces by spin-coating, followed by exposure to ultraviolet light and annealing without dewetting the resist layer. The thin PS film could be patterned by thermal nanoimprinting involving a removal of the residual layer by exposure to UV/ozone. The patterned PS film worked as a resist mask for acidic aqueous wet etchants for Cr and Cu. We demonstrated that thin patterned films of Cr and Cu on micrometer scales could be fabricated by simple wet etching. Thermal Nanoimprint of a Polystyrene and Poly(4-vinylpyridine) Double-Layer Thin Film and Visualization Determination of Its Internal Structure by Transmission Electron Microscopy Peer-reviewed Masaru Nakagawa, Noriyoshi Kamata, Tomokazu Iyoda, Shinji Matsui JAPANESE JOURNAL OF APPLIED PHYSICS 48 (6) 06FH12 2009/06 Publisher: JAPAN SOCIETY APPLIED PHYSICS DOI： 10.1143/JJAP.48.06FH12 ISSN：0021-4922 More details Close In this research, we studied the morphological transformation of a poly(4-vinylpyridine), P4VP, thin film on a polyimide substrate after thermal nanoimprint and investigated its effect on electron beam (EB) exposure by atomic force microscopy. On the basis of the results, we designed a patterned double-layer thin film consisting of polystyrene, PSt, as the outermost inactive layer and P4VP as the underlying active layer for Cu electroless deposition. We studied how to prepare and confirm the integrity of a double-layer structure on the polyimide substrate after thermal nanoimprint. A P4VP thin film of 60 nm thickness started to be transformed by thermal nanoimprint at 80 degrees C owing to a thin-film effect lowering the glass transition temperature (T(g) = 137 degrees C) of its bulk state. EB exposure caused P4VP crosslinking and resulted in the P4VP layer becoming insoluble in toluene and being hardly transformed by thermal nanoimprint even at 160 degrees C. As a result, an outermost layer of PSt exhibiting a lower Tg than P4VP was successfully prepared by spin coating and was transformed only by thermal nanoimprint. The designed internal structure of the double-layer thin film patterned by thermal nanoimprint was confirmed by transmission electron microscopy (TEM) as a cross-sectional image using HAuCl(4) and RUO(4) as stain reagents for P4VP and PSt, respectively. (C) 2009 The Japan Society of Applied Physics ポリ（メタクリル酸メチル）へのベンゾフェノン誘導体の光グラフト反応 Peer-reviewed 大嶽知之, 高岡利明, 中川勝 高分子論文集 66 (3) 111-117 2009/03 DOI： 10.1295/koron.66.111 Dewetting Photocontrol of Poly(styrene) Thin Films by a Photocrosslinkable Monolayer in Thermal Nanoimprint Lithography Peer-reviewed Hirokazu Oda, Tomoyuki Ohtake, Toshiaki Takaoka, Masaru Nakagawa JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 22 (2) 195-199 2009 Publisher: TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN DOI： 10.2494/photopolymer.22.195 ISSN：0914-9244 More details Close In this article, we investigated dewetting behaviors of monodisperse-poly(styrene) thin films on a photocrosslinkable monolayer bearing a benzophenone moiety affected by ultraviolet light exposure dose, irradiation wavelength, and molecular weight. The thermally induced dewetting was suppressed by UV exposure at either 365-nm exposure dose of 200 J cm(-2) or 254-nm exposure dose of 1.0 J cm(-2). The dewetting behaviors were induced for low-molecular-weight poly(styrene) of the weight-average molecular weight (M(w)) 2,200 g mol(-1) and not observed for poly(styrene) of more than M(w) = 10,800 g mol(-1). The gel permeation chromatography analysis indicated that the thermally induced dewetting behaviors were not responsible for photochemistry of poly(styrene) such as depolymerization and disproportionation and responsible for monolayer photochemistry of the benzophenone moiety grafting poly(styrene) at the polymer/monolayer interface. Optical Monitoring of a Poly(styrene) Residual Layer on a Photocrosslinkable Monolayer in Thermal Nanoimprint Lithography Peer-reviewed Koichi Nagase, Tomoyuki Ohtake, Toshiaki Takaoka, Shoichi Kubo, Masaru Nakagawa JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 22 (2) 201-204 2009 Publisher: TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN DOI： 10.2494/photopolymer.22.201 ISSN：0914-9244 More details Close We investigated the residual layer thickness of a poly(styrene) thin film patterned by the reactive-monolayer-assisted thermal nanoimprint lithography using a SiO(2) mold with convex patterns on mm-scale. The profile of the residual layer thickness was monitored optically with a reflective thickness monitor. We presented that the residual layer thickness was significantly influenced by maintained temperatures, molecular weights, and additives. Poly(styrene) containing its low molecular-weight component showed suitable concave patterns with the residual layer thickness uniform. Photo-induced Graft Reactions of 4-Methoxybenzophenone with Thermoplastic Polymers Designed for Reactive-Monolayer-Assisted Thermal Nanoimprint Lithography Peer-reviewed Tomoyuki Ohtake, Hirokazu Oda, Toshiaki Takaoka, Masaru Nakagawa JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 22 (2) 205-211 2009 Publisher: TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN DOI： 10.2494/photopolymer.22.205 ISSN：0914-9244 More details Close The photo-induced graft reactions of 4-methoxybenzophenone (MBP) with thermoplastic polymers of poly(styrene) (PS), poly(vinyltoluene) (PVT), poly(benzyl methacrylate) (PBzMA), and poly(methyl methacrylate) (PMMA) in their thin film states were studied. The FT-IR analysis revealed that photochemical decreases of MBP were more rapid in the order of PVT > PBzMA approximate to PMMA > PS. The calculation by Gaussian03 implied that a C-H bond with smaller dissociation energy showed a more rapid photochemical decrease of MBP due to hydrogen abstraction reactions. The correlation of the photochemical decreases with the dissociation energies revealed that the hydrogen abstraction reactions with the thermoplastic polymers occurred at the side chains rather than the main chains. The gel permeation chromatography (GPC) analysis revealed that the photo-induced graft reaction was more induced in the order of PVT > PS > PBzMA approximate to PMMA at an identical exposure dose of 3 J cm(-2) monitored at 365 nm. It was led to the conclusion that PVT was a suitable thermoplastic polymer for reactive-monolayer-assisted thermal nanoimprint lithography. Magnetic property and crystallinity of a Ni-P hollow microfiber affected by immersion in a NaOH aqueous solution Peer-reviewed Hirokazu Oda, Tomokazu Iyoda, Masaru Nakagawa TRANSACTIONS OF THE MATERIALS RESEARCH SOCIETY OF JAPAN, VOL 33, NO 1 33 (1) 153-156 2008 Publisher: MATERIALS RESEARCH SOCIETY JAPAN-MRS-J More details Close An amorphous nickel-phosphorus (Ni-P) hollow microfiber is prepared by template-synthesis with a hydrogen-bonded fibrous supramolecular template by Pd-promoted electroless deposition. To let the Ni-P microfiber show conductivity and magnetic property in this study, we carried out thermal annealing at 500 degrees C under an argon atmosphere in different two ways. One is the annealing after template removal with a 1 mol dm(-3) NaOH aqueous solution. Another is the annealing without template removal, which was intended to reduce fabrication procedures. As a result, an annealed Ni-P hollow microfiber showed a different saturated magnetization value of 14 emu g(-1) in the former and 9 emu g(-1) in the latter. To understand the phenomena, we investigated the two kinds of annealed Ni-P microfibers by transmission electron microscopy (TEM), inductively coupled plasma atomic emission spectrometry (ICP-AES), and X-ray diffractometry (XRD). Although the powder conductivity and chemical composition were hardly affected, formation of an f.c.c. nickel phase related to the magnetic property was significantly suppressed in the latter case of annealing without template removal. It was suggested that carbonization of the supramolecular template upon annealing suppressed the formation of an f.c.c. nickel crystalline phase. Reversible photoswitching of ferromagnetic FePt nanoparticles at room temperature Peer-reviewed Masayuki Suda, Masaru Nakagawa, Tomokazu Iyoda, Yasuaki Einaga JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 129 (17) 5538-5543 2007/05 Publisher: AMER CHEMICAL SOC DOI： 10.1021/ja0682374 ISSN：0002-7863 More details Close There has been a great interest in developing photoswitchable magnetic materials because of their possible applications for future high-density information storage media. In fact, however, the examples reported so far did not show ferromagnetic behavior at room temperature. From the viewpoint of their practical application to magnetic recording systems, the ability to fix their magnetic moments such that they still exhibit room-temperature ferromagnetism is an absolute requirement. Here, we have designed reversible photoswitchable ferromagnetic FePt nanoparticles whose surfaces were coated with azobenzene-derivatized ligands. On the surfaces of core particles, reversible photoisomerization of azobenzene in the solid state was realized by using spacer ligands that provide sufficient free volume. These photoisomerizations brought about changes in the electrostatic field around the core-FePt nanoparticles. As a result, we have succeeded in controlling the magnetic properties of these ferromagnetic composite nanoparticles by alternating the photoillumination in the solid state at room temperature. Photochromism induced magnetization changes in Prussian Blue ultrathin films fabricated into the Langmuir-Blodgett films composed of an amphiphilic azobenzene and a deoxyribonucleic acid Peer-reviewed Takashi Yamamoto, Yasushi Umemura, Masaru Nakagawa, Tomokazu Iyoda, Yasuaki Einaga THIN SOLID FILMS 515 (13) 5476-5483 2007/05 Publisher: ELSEVIER SCIENCE SA DOI： 10.1016/j.tsf.2007.01.019 ISSN：0040-6090 More details Close A photomagnetic ultrathin film consisting of an azobenzene, a deoxyribonucleic acid, and Prussian Blue has been fabricated by the Langmuir-Blodgett method. Prussian Blue layers in the films were a two-dimensional structure with the height of 50 A and the average coherence length of 210 A. Reversible photoisomerization of the azobenzenes was observed even in the films. The films exhibit the long-range ferromagnetic order below 4.2 K and moreover, upon photoillumination at 2 K, reversible changes in the magnetization were realized with the value of ca. 1.0%. This photoswitching in the magnetization is due to changes in the electrostatic field induced by photoisomerization. (C) 2007 Elsevier B.V. All rights reserved. Thermal stability and magnetic property of Ni-Co-P hollow microfibers prepared by electroless plating Peer-reviewed H. Oda, T. Shimazu, T. Iyoda, M. Nakagawa Transactions of the Materials Research Society of Japan 32 429-502 2007 Thermally induced structural transformation in a hydrogen-bonded supramolecular single-crystal - DSC-FTIR studies Peer-reviewed D. Ishii, T. Yamada, M. Nakagawa, T. Iyoda, H. Yoshida JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY 86 (3) 681-685 2006/12 Publisher: SPRINGER DOI： 10.1007/s10973-006-7893-7 ISSN：1388-6150 More details Close The thermally induced structural transformation of a hydrogen-bonded crystal formed from an amphoteric molecule of 6-[2-methoxy-4-(pyridylazo)phenoxy]hexanoic acid MeO was studied using differential scanning calorimetry (DSC), Fourier transform infrared spectroscopy (FTIR) and X-ray diffraction measurement (XRD). Crystal form of the hydrogen-bonded crystal was measured by single crystal four circle diffractometer (Mo-K-alpha radiation). As a result, the crystal of MeO was stabilized by many C-H center dot center dot center dot O hydrogen bonds, and the C-H center dot center dot center dot O hydrogen bonds were broken by thermal energy reversibly. After transformation the supramolecular architecture was composed of supramolecular polymer including free-rotation pentamethylene main chains. Photocontrolled magnetization of CdS-modified Prussian blue nanoparticles Peer-reviewed Minori Taguchi, Ichizo Yagi, Masaru Nakagawa, Tomokazu Iyoda, Yasuaki Einaga JOURNAL OF THE AMERICAN CHEMICAL SOCIETY 128 (33) 10978-10982 2006/08 Publisher: AMER CHEMICAL SOC DOI： 10.1021/ja063461e ISSN：0002-7863 More details Close The first photocontrollable magnetic nanoparticles containing CdS and Prussian blue (PB) have been created using reverse micelles as nanoreactors. Photoinduced electron transfer from CdS to PB in the reverse micelle changed the magnetic properties of the composite nanoparticles from ferromagnetic to paramagnetic. The magnetization in the ferromagnetic region below 4 K was substantially decreased after UV light illumination and could be restored almost to its original level by thermal treatment at room temperature. This novel strategy of designing composite nanoparticles containing photoconductive semiconductors and magnetic materials to create photoswitchable magnetic materials may open many possibilities in the development of magneto-optical devices. Utilization of industrially available 2,3-dichloro-1,3-butadiene for direct synthesis of 2,3-diaryl-1,3-butadienes Peer-reviewed T Yamamoto, T Yasuda, K Kobayashi, Yamaguchi, I, T Koizumi, D Ishii, M Nakagawa, Y Mashiko, N Shimizu BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN 79 (3) 498-500 2006/03 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/bcsj.79.498 ISSN：0009-2673 eISSN：1348-0634 More details Close It is shown that industrially available 2,3-dichloro-1,3-butadiene is a useful starting material for the synthesis of 2,3-diaryl-1,3-butadienes. Ni(II)-catalyzed cross-coupling reaction of 2,3-dichloro-1,3-butadiene with ArMgBr (Ar = 2-thienyl, phenyl, 4-dodecyloxyphenyl, and 4-fluorophenyl) gives the corresponding 2,3-diaryl-1,3-butadienes in good yields. Printing of Au nanoparticles by VUV-exposed patterned surfaces of a poly(dimethylsiloxane) film Peer-reviewed Motohiro Tagaya, Motonori Komura, Tomokazu Iyoda, Masaru Nakagawa Transactions of the Materials Research Society of Japan, Vol 31, No 2 31 (2) 273-276 2006 Publisher: ELSEVIER SCIENCE BV More details Close This paper dealt with exposure of a nanometer-level flat cross-linked poly(dimethylsiloxane) film to vacuum ultraviolet light (VUV) at a wavelength of 172 nm and its application to printing of Au nanoparticles. FTIR and contact angle measurements allowed us to confirm the formation of a silica outermost layer on the PDMS film due to photo-oxidation of a methylsilyl group to a silanol group and condensation to a Si-O-Si moiety. It was indicated by AFM observation on a PDMS film surface patterned by imagewise VUV-exposure that the height of VUV-exposed regions was lower than that of unexposed regions by approximately 10 nm due to shrinkage by condensation among the photogenerated silanol groups. Location-selective inking of an Au-nanoparticle/toluene solution was possible on the VUV-exposed patterned PDMS surfaces. Au-nanoparticle micropatterns in about 30 Pm size were successfully transcribed on a silica substrate surface from the inked PDMS film. Formation process of silver-polypyrrole coaxial nanocables synthesized by redox reaction between AgNO3 and pyrrole in the presence of poly(vinylpyrrolidone) Peer-reviewed AH Chen, K Kamata, M Nakagawa, T Iyoda, HQ Wang, XY Li JOURNAL OF PHYSICAL CHEMISTRY B 109 (39) 18283-18288 2005/10 Publisher: AMER CHEMICAL SOC DOI： 10.1021/jp053247x ISSN：1520-6106 More details Close We have recently demonstrated a one-step process to fabricate silver-polypyrrole (PPy) coaxial nanocables (Chen, A.; Wang, H.; Li, X. Chem. Commun. 2005, 14, 1863). The formation process of silver-PPy coaxial nanocables is discussed in this article. It was found from the results of TEM and SEM images that large numbers of silver atoms were formed when AgNO3 was added to a pyrrole solution. Then silver atoms transform to silver-PPy nanosheets with regular morphology, which will connect together to be more stable. Silver-PPy nanocables will be able to grow at the expense of the silver-PPy nanosheets. Poly(vinylpyrrolidone) (PVP) plays crucial roles in this process: as a capping agent to form silver nanowires, and as a dispersant of pyrrole monomers, which can influence the site at which pyrrole monomer exists. On the basis of experimental analysis, the possible mechanism was proposed. Because of the effect of PVP, silver ions and pyrrole monomers are apt to be adsorbed at the [111] and [100] facets of silver nanosheets, respectively. Obvious polymerization will take place on the boundary of the [111] and [ 100] facets. The PPy layer stays stable on the [ 100] facets. Meanwhile, newly formed silver atoms and silver nanosheets will further ripen and grow on the [111] facets. In a word, the morphology of final products and the formation process are determined by the reaction site between AgNO3 and the pyrrole monomer, which is influenced by PVP. DSC studies on thermally induced structural transformation of hydrogen-bonded amphoteric molecular assemblage Peer-reviewed D Ishii, T Yamada, M Nakagawa, T Iyoda, H Yoshida JOURNAL OF THERMAL ANALYSIS AND CALORIMETRY 81 (3) 569-573 2005/08 Publisher: SPRINGER DOI： 10.1007/s10973-005-0825-0 ISSN：1388-6150 More details Close Thermally induced structural transformation of fibrous hydrogen-bonded molecular assemblage formed from an amphoteric pyridinecarboxylic acid of 6-[2-propyl- 4-(4-pyridylazo)phenoxy]hexanoic acid (C5PR) was studied using differential scanning calorimetry (DSC), differential thermal analysis (DTA), and thermogravimetry (TG). The organized fibrous morphology formed in an aqueous solution was stable at temperatures below 150 degrees C. The ordered crystalline solid phase (K1) of the original fibrous material altered to a disordered crystalline solid phase (K2) at 150 degrees C and subsequently to an isotropic phase (I) at 172 degrees C. In the isotropic state, the C5PR molecule was slowly decomposed by decarboxylation. Once the molecular assemblage was subjected to the mesophase by heating, another ordered crystalline solid phase (K3) appeared reversibly at 17 degrees C. The heat budget analyses by DSC indicated that a conformational entropy change such as the side-chain propyl group and the main-chain pentamethylene unit in the hydrogen-bonded molecular assemblage took place between the two ordered crystalline solid phases K1 and K3. Aggregation control and photochemical behaviors in UV-sensitive organosilane monolayers bearing naphthlymethylsulfonyl groups Peer-reviewed M. Tagaya, M. Nakagawa, T. Iyoda Transactions of the Materials Research Society of Japan 30 (1) 163-166 2005 Thickness control of polycationic single-layer adsorption films by mix proportion of poor solvent to good solvent Peer-reviewed Y. Suzuki, M. Komura, M. Nakagawa, T. Iyoda Transactions of the Materials Research Society of Japan 30 (3) 695-698 2005 Morphology control of hollow Ni-P microfibers Peer-reviewed Mitsuru Udatsu, Daisuke Ishii, Masaru Nakagawa, Tomokazu Iyoda, Taichi Nagashima, Mitsuaki Yamada Transactions of the Materials Research Society of Japan, Vol 30, No 4 30 (4) 1219-1222 2005 Publisher: ELSEVIER SCIENCE BV More details Close In our previous paper [Trans. Mater. Res, Soc. Jpn. 29, 889 (2004)], we demonstrated that the macroscopic morphologies of hydrogen-bonded fibrous molecular assemblages formed from 6-[2-propyl-4-(4-pyridylazo)phenoxy]hexinoic acid could be controlled by four kinds of self-assembling methods. The four methods were categorized into (i) air neutralization, GO CO2 neutralization, (iii) crystal growth, and (iv) air neutralization with anionic surfactant. In this paper, we investigated the shapes of hollow Ni-P microfibers obtained through electroless plating from the four types of fibrous template materials. The following results were obtained. The inner diameter (500 nm) of the hollow Ni-P microfibers was almost identical to the outer diameter of the organic template microfibers prepared by (i) air neutralization. The Ni-P nanotubes having an outer diameter of 70 - 130 nm were formed using the template fibers prepared by (ii) CO2 neutralization. The hollow Ni-P microfibers having a range of 1 - 2 mu m in inner diameter were obtained from the template fibers by (iii) crystal growth. Ni-P nanotubes with rough surfaces were successfully obtained from template microfibers prepared by (iv) air neutralization with anionic surfactant of sodium dodecyl sulfate. We demonstrated that several types of hollow Ni-P microfibers with different morphology could be fabricated from one amphoteric compound. The formation mechanisms were proposed. Spectroscopic study of thermally induced changes of molecular alignment in hydrogen-bonded fibrous molecular assemblages Peer-reviewed D. Ishii, T. Yamada, M. Nakagawa, H. Yoshida, T. Iyoda Transactions of the Materials Research Society of Japan 30 (2) 357-360 2005 Photopattern shapes of a photodegradable polyelectrolyte monolayer affected by an ionic strength of aqueous developer solutions Peer-reviewed N. Nawa, M. Nakagawa, T. Seki, T. Iyoda Transactions of the Materials Research Society of Japan 29 (3) 881-884 2004 Morphology control of fibrous molecular self-assemblages formed from an azopyridine carboxylic acid Peer-reviewed D. Ishii, M. Udatsu, M. Nakagawa, T. Iyoda Transactions of the Materials Research Society of Japan 29 (3) 889-892 2004 Fabrication of Ni tubes using amphoteric azopyridine carboxylic acids Peer-reviewed D Ishii, M Nakagawa, K Aoki, T Seki, T Iyoda NONTRADITIONAL APPROACHES TO PATTERNING EXS-2 97-99 2004 Publisher: MATERIALS RESEARCH SOCIETY More details Close We describe here a template-synthesis method to prepare nickel tubes. The nickel tubes with a submicron pore were obtained through dissociation of intermolecular hydrogen bonds to achieve the template removal of organic molecular assemblages. This study was focused on entire morphologies of hydrogen-bonded fibrous templates formed from amphoteric azopyridine carboxylic acids, which were investigated by SEM observation. Size distributions of the template fibers were highly affected by a substituent group on a phenyl ring included in component organic molecules. Relationship of Zeta potential to molecular structure of multivalent cationic adsorbates on silica and PET substrates Peer-reviewed N. Nawa, M. Nakagawa, T. Seki, T. Iyoda Transactions of the Materials Research Society of Japan 28 (3) 573-576 2003 Preparation of copper tubes with a submicron pore Peer-reviewed D. Ishii, M. Nakagawa, T. Seki, T. Iyoda Transactions of the Materials Research Society of Japan 28 (3) 577-580 2003 多価カチオン性分子から形成される静電吸着単分子膜のネガ型とポジ型光パターン形成法 Peer-reviewed 中川勝, 名輪希 高分子論文集 60 (10) 531-538 2003 DOI： 10.1295/koron.60.531 ISSN：0386-2186 1881-5685 Self-assembly of amphoteric azopyridine carboxylic acids II: Aspect ratio control of anisotropic self-assembled fibers by tuning the pi-pi stacking interaction Peer-reviewed K Aoki, M Nakagawa, T Seki, K Ichimura BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN 75 (11) 2533-2539 2002/11 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/bcsj.75.2533 ISSN：0009-2673 eISSN：1348-0634 More details Close Two ways to control the macroscopic morphology of fibrous organizates of amphoteric azopyridine carboxylic acids by tuning the strength of pi-pi stacking among the component molecules are presented. The self-organization of the azopyridine carboxylic acids (1-5) from aqueous solutions is governed not only by carboxyl/pyridyl hydrogen bondings, but also by dipole-dipole and pi-pi stacking interactions. The level of the latter could be tuned by the substituent structure at the phenyl ring. As a result, whereas leaflet crystals were formed from non-substituted derivative 1, 3 with a propyl substituent gave fibrous assemblages, and needle-like assemblages were obtained from 2, 4, and 5 with methyl, s-butyl, and ethoxy substituents, respectively. The propyl-substitution is likely to enhance an anisotropic growth rate of the intermolecular hydrogen bonds due to efficient suppression of pi-pi stacking among aromatic cores, leading to the appearance of microfibers with the highest aspect ratio. The second way to control the organization morphology is based on &＃34;supramolecular copolymerization&＃34;, which is attained by mixing 1 and 3 to modulate the strength of the pi-pi stacking. The aspect ratio of fibrous materials was significantly influenced by the mixing ratio. Photocontrol of liquid motion on an azobenzene monolayer Peer-reviewed SK Oh, M Nakagawa, K Ichimura JOURNAL OF MATERIALS CHEMISTRY 12 (8) 2262-2269 2002/08 Publisher: ROYAL SOC CHEMISTRY DOI： 10.1039/b110825p ISSN：0959-9428 More details Close This paper describes a novel strategy for the non-mechanical motion of a liquid droplet by photoisomerization of surface-immobilized azobenzenes. When a liquid droplet is placed on a substrate surface that has been modified with a monolayer of azobenzene-terminated calix[4]resorcinarenes, alternating irradiation with UV and blue light causes in situ changes in the contact angle of the droplet. The spreading/retraction motion of a liquid droplet is based on the reversible change in surface free energy of the photoresponsive surface due to the trans-cis isomerization of the azobenzene molecules. By measuring the hysteresis in contact angles of various liquids, we determined the principal requirement for the motion of a liquid droplet to occur a receding contact angle on a trans-rich surface should be larger than an advancing contact angle on a cis-rich surface. Localized illumination of a liquid droplet of several millimeters in diameter causes it to move vectorially across the photoresponsive surface. The direction and velocity of the motion are tailored by manipulating both the direction and steepness of an applied tight intensity gradient. Detailed profiles of a moving droplet support the assumption that the surface-assisted motion is ascribed to an imbalance in contact angles. The potential applicability of light-driven motion to lab-on-a-chip technology was presented by delivery of reactants for a chemical reaction on a photoresponsive surface by illumination. Photo-orientation of mesostructured silica via hierarchical multiple transfer Peer-reviewed Y Kawashima, M Nakagawa, T Seki, K Ichimura CHEMISTRY OF MATERIALS 14 (7) 2842-+ 2002/07 Publisher: AMER CHEMICAL SOC DOI： 10.1021/cm025515z ISSN：0897-4756 More details Close Successful photoalignment of a mesostructured inorganic material synthesized through supramolecular templating of surfactants is performed via hierarchically relayed multiple transfer among heterointerfaces. The directional information possessed by linearly polarized light is initially captured by a latent photochromic monolayer and then fixed by a robust polymer. The photoaligned polymer film is eventually inherited to an oriented nucleation of a mesostructured surfactant/silica hybrid in the sol-gel polymerization. Photopatterning of self-assembled monolayers to generate aniline moieties Peer-reviewed M Nakagawa, K Ichimura COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS 204 (1-3) 1-7 2002/05 Publisher: ELSEVIER SCIENCE BV DOI： 10.1016/S0927-7757(01)01002-0 ISSN：0927-7757 eISSN：1873-4359 More details Close Comparative studies on the image-wise formation of surface aniline moieties in monolayers of silica substrates prepared by the photodegradation of surface-adsorbed 4-aminophenyltrimethoxysilane and the photodeprotection of chemisorbed o-nitrobenzyl N-phenylcarbamate monolayers were described. The difference in physicochemical affinity of imagewise UV-exposed surfaces was visualized clearly by the adsorption of fluorescent polystyrene microspheres on areas incorporating aniline moieties through diazotization. (C) 2002 Elsevier Science B.V. All rights reserved. Solvent effect on morphology of self-assembled fibrous materials derived from an azopyridine carboxylic acid Peer-reviewed K Aoki, M Nakagawa, T Seki, K Ichimura CHEMISTRY LETTERS 31 (3) 378-379 2002/03 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/cl.2002.378 ISSN：0366-7022 eISSN：1348-0715 More details Close The macroscopic morphology of fibrous materials deposited from solutions of an azopyridine carboxylic acid dissolved in organic solvents was critically corelated with solvent parameters. Holographic Bragg gratings in a photoresponsive cross-linked polymer-liquid-crystal composite Peer-reviewed N Yoshimoto, S Morino, M Nakagawa, K Ichimura OPTICS LETTERS 27 (3) 182-184 2002/02 Publisher: OPTICAL SOC AMER DOI： 10.1364/OL.27.000182 ISSN：0146-9592 More details Close Holographic gratings were in a composite material that comprised a cross-linked polymer with azobenzene side chains and a nematic liquid crystal. Holographic recording was based on the photoinduced alignment of the nematic liquid crystal inside a cell as a result of amplification of the photoreorientation of azobenzene residues. The diffraction efficiency depends on cell thickness and reading angle of the gratings, so this composite material exhibits volume holographic properties with Bragg diffraction. (C) 2002 Optical Society of America. Preparation of hollow nickel microtubes by electroless plating Peer-reviewed D. Ishii, K. Aoki, M. Nakagawa, T. Seki Transactions of the Materials Research Society of Japan 27 (3) 517-520 2002 Photo-orientation of a mesostructured surfactant/silica hybrid by an azobenzene monolayer Peer-reviewed Y. Kawashima, M. Nakagawa, T. Seki, K. Ichimura Transactions of the Materials Research Society of Japan 27 (3) 509-512 2002 Periodic change in the deposition behavior with increase in the spacer length of azobenzene-containing urea amphiphiles Peer-reviewed T. Kobayashi, M. Nakagawa, T. Seki Transactions of the Materials Research Society of Japan 27 (3) 513-516 2002 Polarized photoluminescence from photopatterned discotic liquid crystal films Peer-reviewed S Furumi, D Janietz, M Kidowaki, M Nakagawa, S Morino, J Stumpe, K Ichimura CHEMISTRY OF MATERIALS 13 (5) 1434-+ 2001/05 Publisher: AMER CHEMICAL SOC DOI： 10.1021/cm000919h ISSN：0897-4756 More details Close We have presented polarized photoluminescence (PL) from photopatterned discotic liquid crystal (DLC) film. Photopatterned DLC film was accomplished by the photoalignment technique consisting of oblique photoirradiation with nonpolarized light and the subsequent annealing of an azobenzene-containing polymer thin film. The DLC molecules were aligned in a tilted hybrid manner as a result of the inclined orientation of the azobenzene moieties. Micropatterned PL was observable by imagewise nonpolarized excitation of the photoaligned DLC film. Photochemical behavior and the ability to control liquid crystal alignment of polymethacrylates with styrylpyridine side chains Peer-reviewed S Yamaki, M Nakagawa, S Morino, K Ichimura MACROMOLECULAR CHEMISTRY AND PHYSICS 202 (2) 325-334 2001/02 Publisher: WILEY-V C H VERLAG GMBH DOI： 10.1002/1521-3935(20010101)202:2<325::AID-MACP325>3.0.CO;2-L ISSN：1022-1352 eISSN：1521-3935 More details Close Photoproduct distribution of styrylpyridine (SP) side chains tethered to polymethacrylate backbones upon irradiation with 313 nm light was analyzed UV-spectroscopically in solutions and films of a homopolymer and copolymers of 2-[2-(4-methacryloxyphenyl)ethenyl]pyridine. Whereas E-to-Z photoisomerization of SP moieties proceeds in solution, followed by the slow oxidative photocyclization to give an azaphenanthrene, the predominant photochemistry in films consists of photodimerization and E-to-Z photoisomerization. Irradiation of films of the SP-polymers with linearly polarized 313 nm light generated dichroism of the chromophore due to the axis-selective consumption of the E-isomer. Exposing films of SP-polymers to relatively lower doses of linearly polarized light induced homogenous alignment of a nematic liquid crystal with a perpendicular orientation with respect to the polarization plane of the light. The photoalignment was thermally stabilized by efficient photodimerization leading to crosslinked structures. However, prolonged irradiation wit the polarized light deteriorated the photoalignment. On the basis of these results, it is concluded that the homogenous photoalignment is determined by remaining E-isomers whereas the photodimerization yielding crosslinks enhances the thermal stability of the alignment. Effect of methylene spacers in poly(methacrylate)s bearing styrylpyridine side chains on the ability to control liquid crystal alignment Peer-reviewed S Yamaki, M Nakagawa, S Morino, K Ichimura MACROMOLECULAR CHEMISTRY AND PHYSICS 202 (2) 354-361 2001/02 Publisher: WILEY-V C H VERLAG GMBH DOI： 10.1002/1521-3935(20010101)202:2<354::AID-MACP354>3.0.CO;2-D ISSN：1022-1352 eISSN：1521-3935 More details Close The photochemistry, photoinsolubilization and ability to control surface-assisted liquid crystal (LC) alignment of poly(methacrylates) tethering styrylpyridine (SP) side chains through methylene spacers (m = 2, 6 and 12) are described. The extent of (2+2) photodimerization and E-to-Z isomerization of SP side chains was markedly affected by the length of methylene spacers. In the early stage of photoirradiation, the photodimerization took place preferentially for SP-polymers with a shorter methylene spacer, whereas the photodimerization was accompanied by the E-to-Z photoisomerization for the polymers with longer spacers even in the early stage of photoirradiation. Irradiation of thin films with linearly polarized light resulted in the generation of dichroism of SP moieties owing to the angular-selective consumption of E-isomer, leading to surface-assisted homogeneous LC aligment. The direction of LC photoalignment was reversed from perpendicular to parallel orientation when SP moieties were tethered to polymer backbones through spacers. The working mechanism of the alignment reversion was discussed, based on the angular-selective E-to-Z photoisomerization and photodimerization. Chiroptical properties of cholesteric liquid crystals induced by chiral photochromic 3,3 &＃39;-dialkoxyazobenzenes Peer-reviewed C Ruslim, M Nakagawa, S Morino, K Ichimura MOLECULAR CRYSTALS AND LIQUID CRYSTALS 365 (1) 1011-+ 2001 Publisher: TAYLOR & FRANCIS LTD DOI： 10.1080/10587250108025281 ISSN：1542-1406 More details Close The spectroscopic features and photoisomerization behaviors of chiral photochromic 3,3&＃39;-dialkoxyazobenzenes were evaluated in an isotropic solution and a nematic solvent. The effect of photoisomerization on the helical twisting power and handedness of these chiral dopants in induced cholesteric liquid crystals were studied. Depending on the distance of the chiral center from the azo-core, elongation of the helical pitch and reversion of the handedness upon E-to-Z photoisomerization were observed. These characteristics are interesting for optical devices based on light-controlled phase switching. Surface-assisted orientational control of discotic liquid crystals by light Peer-reviewed S Furumi, D Janietz, M Kidowaki, M Nakagawa, SY Morino, J Stumpe, K Ichimura MOLECULAR CRYSTALS AND LIQUID CRYSTALS 368 (1) 4285-4292 2001 Publisher: GORDON BREACH PUBLISHING, TAYLOR & FRANCIS GROUP DOI： 10.1080/10587250108029983 ISSN：1058-725X More details Close This paper reports photoalignment control of discotic liquid crystal (DLC). a pentakis-(phenylethynyl)benzene derivative, using a thin film of an azobenzene-containing polymer. The polymer films was irradiated with non-polarized light obliquely, subsequently annealed at 240 degreesC and coated with a DLC solution to give a mono-domain texture of DLC films with excellent optical quality. Photopatterning of DLC films was achieved by imagewise irradiation of the polymer film at an oblique incident. Relationship between the ability to control liquid crystal alignment and wetting properties of calix[4]resorcinarene monolayers Peer-reviewed SK Oh, M Nakagawa, K Ichimura JOURNAL OF MATERIALS CHEMISTRY 11 (6) 1563-1569 2001 Publisher: ROYAL SOC CHEMISTRY DOI： 10.1039/b007739i ISSN：0959-9428 More details Close This paper describes the correlation between the ability to control nematic liquid crystal (LC) alignment and wetting properties of mixed monolayers formed by coadsorption of two O-octacarboxymethylated calix[4]resorcinarenes (CRA-CMs) with either perfluorooctyl- or octylazobenzene units. Photoirradiation of CRA-CM monolayers induces reversible photoisomerization reaction of the surface azobenzenes, which causes changes in LC alignment and wettability of the monolayers. The photogenerated LC alignments are considerably influenced by the surface compositions of the mixed monolayers. When LC cells fabricated with substrate plates modified with single-component monolayers of CRA-CM with p-octylazobenzenes are subjected to oblique irradiation with non-polarized UV light, the orientation of LC molecules is changed from homeotropic to homogeneous alignments tilting toward the direction of light propagation. In contrast, single-component and mixed monolayers of CRA-CM with p-perfluorooctylazobenzenes cause homeotropic alignments and tilted alignments with high pretilt angles, respectively. The level of photoisomerization and surface free energy of the CRA-CM monolayers are not a sufficient condition to cause the contrasting alignment behaviors. We conclude that the molecular-level morphology and/or fluidity of the monolayer surfaces of CRA-CMs, which is deduced from the contact angle hysteresis of anisotropic liquids for the surfaces, is the most significant factor to induce the LC alignment alterations observed. Photochromism of 4-cyanophenylazobenzene in liquid crystalline-coil AB diblock copolymers: The influence of microstructure Peer-reviewed Keiichi Moriya, Takahiro Seki, Masaru Nakagawa, Guoping Mao, Christopher K. Ober Macromolecular Rapid Communications 21 (18) 1309-1312 2000/12/29 Publisher: Wiley-VCH Verlag DOI： 10.1002/1521-3927(20001201)21:18<1309::AID-MARC1309>3.0.CO;2-1 ISSN：1022-1336 More details Close The UV and V spectral features of an AB diblock copolymer composed of polystyrene and a poly(1,2 & 3,4)isoprene-based polymer with a pendant liquid crystalline 4-cyanophenylazobenzene (Az) group in comparison with those of a corresponding LC polyisoprene homopolymer are reported. The orientational and photochromic behavior of an AB diblock copolymer in thin films shows distinct differences from that of a corresponding Az homopolymer. This can be attributed to the influence of the phase separated polymer coil microdomain of polystyrene in the AB block copolymer film. © Wiley-VCH Verlag GmbH, 2000. Photoregulation of liquid crystal alignment by a composite polymer film containing retinoic acid Peer-reviewed Seiichi Furumi, Masaru Nakagawa, Shinya Morino, Kunihiro Ichimura Polymers for Advanced Technologies 11 (8-12) 427-433 2000/08 Publisher: John Wiley & Sons Ltd DOI： 10.1002/1099-1581(200008/12)11:8/12<427::AID-PAT988>3.0.CO;2-6 ISSN：1042-7147 More details Close The surface-assisted orientational photocontrol of nematic liquid crystal alignment by composite polymer films containing all-trans retinoic acid is described. The visual pigment derivative of retinoic acid was immobilized in poly(4-vinylpyridine) film through intermolecular hydrogen bonding between carboxyl group of the acid and pyridyl residues of the polymer. UV-vis spectral analysis indicated that photoirradiation of the polymer composite film with 365 nm light leads to E/Z photoisomerization of the retinoic acid unless exposure energies do not exceed about 1.0 J/cm2 while further irradiation gives rise to irreversible consumption of the chromophore. Illumination of the films with linearly polarized light at 365 nm brought about photodichroism, whose direction was perpendicular to the electric vector of the polarized light, as a result of the axially selective photochemical reactions of the all-trans-retinoic acid. A composite polymer film irradiated with linearly polarized 365 nm light exhibited the photocontrollability for azimuthal alignment of nematic liquid crystal molecules. The orientational direction of uniaxial liquid crystal alignment was perpendicular to the polarization plane of the actinic light, being consistent with the director of optical anisotropy induced by the polarization photochemistry of all-trans-retinoic acid. These results suggest that the surface-assisted photocontrol of liquid crystal alignment is attributable to the anisotropic orientation of the retinoic acid at an outermost surface of a photoactive composite polymer film. Photocontrolled orientation of a discotic liquid crystal Peer-reviewed Kunihiro Ichimura, Seiichi Furumi, Shin&＃39;ya Morino, Masatoshi Kidowaki, Masaru Nakagawa, Masataka Ogawa, Yosuke Nishiura Advanced Materials 12 (13) 950-953 2000/06 DOI： 10.1002/1521-4095(200006)12:13<950::AID-ADMA950>3.0.CO;2-V ISSN：0935-9648 Surface relief gratings generated by a photocrosslinkable polymer with styrylpyridine side chains Peer-reviewed S Yamaki, M Nakagawa, S Morino, K Ichimura APPLIED PHYSICS LETTERS 76 (18) 2520-2522 2000/05 Publisher: AMER INST PHYSICS DOI： 10.1063/1.126395 ISSN：0003-6951 More details Close The formation of holographic surface relief gratings on thin films of a liquid-crystalline polymethacrylate with styrylpyridine side chains is described. A film of the polymer was treated with hydrogen chloride to protonate the side chain moieties, followed by holographic exposure to p-polarized Ar+ laser beams at 488 nm and by post-exposure baking to give rise to surface relief gratings. The depth of the surface relief in a typical case was 15 nm which is approximately 15% of the original film thickness. On the basis of the temperature dependence of diffraction efficiencies of the grating, the mechanism of the generation of the relief gratings is discussed. (C) 2000 American Institute of Physics. [S0003-6951(00)00818-4]. Photoinduced alignment control of discotic liquid crystals Furumi Seiichi, Janietz Dietmar, Stumpe Joachim, Kidowaki Masatoshi, Nakagawa Masaru, Morino Shin&＃39;ya, Ichimura Kunihiro Proceedings of Japanese Liquid Crystal Society Annual meeting 2000 493-494 2000 Publisher: THE JAPANESE LIQUID CRYSTAL SOCIETY DOI： 10.11538/ekitou.2000.0_493 ISSN：1880-3490 More details Close Discotic liquid crystals possess versatile applicabilities for electronics and photonics over calamitic ones so that increasing efforts have been made on developing disk-shaped molecules, aiming at the elucidation of the structure-function relationship. We report herein a novel approach to discotic liquid crystal alignment, which was accomplished by using a thin film of a polymer bearing azobenzene side chains. A polymer film irradiated obliquely with nonpolarized light gave rise to the orientational control of discotic liquid crystals as a result of three-dimensionally photoaligned azobenzene side chains. Photocontrol of nematic liquid crystal alignment by adsorbed monolayers of an azobenzene-containing tetracationic macrocycle Peer-reviewed Masaru Nakagawa, Kunihiro Ichimura Molecular Crystals and Liquid Crystals Science and Technology. Section A 345 (1) 275-280 2000 DOI： 10.1080/10587250008023931 Light-guided movement of a liquid droplet Peer-reviewed SK Oh, M Nakagawa, K Ichimura MOLECULAR CRYSTALS AND LIQUID CRYSTALS 345 (1) 635-640 2000 Publisher: GORDON BREACH SCI PUBL LTD DOI： 10.1080/10587250008023937 ISSN：1058-725X More details Close This report demonstrates a novel strategy for the light-guided motion of a liquid droplet on photoresponsive surfaces based on reversible changes in surface free energy induced by light. When a liquid droplet in a mm-scale was placed on a substrate surface modified with a calix[4]resorcinarene derivative having photochromic azobenzene units, photoirradiation caused a gradient in surface free energy due to the photoisomerization of surface azobenzenes, leading to directional motion of the liquid droplet. This motion is ascribed to a force imbalance between two opposite edges of the liquid droplet induced by light. Photogeneration of pretilt angles of nematic liquid crystals by azobenzene-containing monolayers on poly(acrylic acid) films Peer-reviewed S Furumi, M Nakagawa, S Morino, K Ichimura JOURNAL OF MATERIALS CHEMISTRY 10 (4) 833-837 2000 Publisher: ROYAL SOC CHEMISTRY DOI： 10.1039/a908727c ISSN：0959-9428 More details Close A convenient procedure to fabricate azobenzene-containing monolayers capable of performing the photoalignment of nematic liquid crystals (LCs) with pretilt angles has been elaborated. The photoactive monolayers were readily prepared by the surface-selective adsorption of p-butylazobenzene substituted with an omega-aminoalkyl residue to the outermost surface of a poly(acrylic acid) thin film. After the fabrication of an LC cell, the monolayers generated homeotropic LC orientation, which was transformed into homogeneous alignment with tilting angles by oblique irradiation with non-polarized UV light. The azimuthal direction of the photoinduced LC alignment was consistent with the propagation direction of the UV light, suggesting that the LC photoalignment results from direction-selective E to Z photoisomerization leading to re-orientation of the azobenzene chromophores. The photogenerated pretilt angles of LC alignment were significantly dependent on the dielectric anisotropy of LC and the surface density of the azobenzene in the monolayers. Spatially controlled photoisomerizability of azobenzene moieties in Langmuir-Blodgett monolayers of ion-paired macrocyclic amphiphiles Peer-reviewed M Nakagawa, R Watase, K Ichimura MOLECULAR CRYSTALS AND LIQUID CRYSTALS 344 (1) 113-118 2000 Publisher: GORDON BREACH SCI PUBL LTD DOI： 10.1080/10587250008023823 ISSN：1058-725X More details Close Monolayers of ternary ion-paired macrocyclic amphiphiles consisting of a tetracationic cyclophane and two kinds of sulfonate surfactants with an azobenzene unit and either a single or double long chain alkyl unit were prepared by a Langmuir-Bladgett technique to elucidate the structure/property relation between a free space surrounding an azobenzene moiety and photoisomerizability in monolayers. It was found that an azobenzene unit with a hexyl group needs a minimum occupied area of about 0.5 nm(2) for sufficient E/Z photoisomerization. Characteristics of monolayers of calix[4]resorcinarenes derivatives having azobenzene chromophores Peer-reviewed K Ichimura, M Fujimaki, Y Matsuzawa, Y Hayashi, M Nakagawa MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS 8-9 353-359 1999/12 Publisher: ELSEVIER SCIENCE BV DOI： 10.1016/S0928-4931(99)00010-7 ISSN：0928-4931 More details Close The adsorption behavior of calix[4]resorcinarenes (CRAs) and their O-carboxylmethylated and O-hydroxyethylated derivatives (CRA-CMs and CRA-HEs) from solutions was studied, aiming at the fabrication of self-assembled monolayers on polar surfaces of amorphous solid such as silica, These macrocyclic amphiphiles displayed considerably enhanced adsorption constants, due to the contribution of their multi-site adsorptivity, to form densely packed monolayers simply by immersing a silica plate in dilute solutions of the amphiphiles. CRA and CRA-CM bearing four azobenzene moieties at the lower rim of the cylindrical skeleton were prepared to modify a silica surface with photo-reactive monolayers by the surface adsorption technique. Adsorbed monolayers exhibited efficient E-to-Z photoisomerizability and applied to the photocontrol of alignment of liquid crystals and of dispersibility of colloidal silica. (C) 1999 Elsevier Science S.A. All rights reserved. Fibrous self-organization of an azopyridine carboxylic acid through head-to-tail hydrogen bonds Peer-reviewed K Aoki, M Nakagawa, K Ichimura CHEMISTRY LETTERS 28 (11) 1205-1206 1999/11 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/cl.1999.1205 ISSN：0366-7022 eISSN：1348-0715 More details Close Fibrous materials were formed from an alkaline solution of an azopyridine carboxylic acid as a result of the intermolecular head-to-tail hydrogen bonding and of the suppressive effect of an alkyl side chain on the pi-pi stacking of the molecules. Convenient preparation of self-assembled monolayers derived from calix[4]resorcinarene derivatives exhibiting resistance to desorption Peer-reviewed K Ichimura, SK Oh, M Fujimaki, Y Matsuzawa, M Nakagawa JOURNAL OF INCLUSION PHENOMENA AND MACROCYCLIC CHEMISTRY 35 (1-2) 173-183 1999/10 Publisher: SPRINGER DOI： 10.1023/A:1008126427392 ISSN：1388-3127 eISSN：1573-1111 More details Close Crown conformers of O-carboxymethylated calix[4]resorcinarenes (CRA-CMs) bearing four perfluorooctyl- and octylazobenzene residues at the lower rim of the cyclic skeleton were synthesized to investigate the resistance to desorption of CRA-CMs forming self-assembled monolayers on aminosilylated silica substrates and the surface energy photocontrol based on E-to-Z photoisomerization of the azobenzene moiety. In comparison with CRA-CM monolayers on silica substrates, the desorption of CRA-CMs on the aminated substrate was remarkably suppressed even when CRA-CM monolayers were sonicated in polar solvents and even in water. The high desorption-resistance was attributable to multi-point adsorption of CRA-CMs through COOH/NH2 interactions. UV-Vis spectral studies revealed that CRA-CM substituted with p-octylazobenzene exhibited high E- to-Z photoisomerizability up to 92% in self-assembled monolayers, while less photoisomerizability was observed for CRA-CM bearing p-perfluorooctylazobenzenes due to the steric hindrance of the larger perfluoroalkyl chains. Photoinduced changes of contact angles for water up to 8.3 degrees were observed for a CRA-CM monolayer. Photogeneration of high pretilt angles of nematic liquid crystals by azobenzene-containing polymer films Peer-reviewed Seiichi Furumi, Masaru Nakagawa, Shin&＃39;ya Morino, Kunihiro Ichimura, Hidehiko Ogasawara Applied Physics Letters 74 (17) 2438-2440 1999/04/26 Publisher: American Institute of Physics Inc. DOI： 10.1063/1.123873 ISSN：0003-6951 More details Close A vertically aligned (VA) type of nematic liquid-crystal (LC) cell was explored using photoirradiated thin films of a polymethacrylate with mesogenic moieties of 4-trifluoromethoxyazobenzene as side chains. Optical anisotropy was generated by slantwise irradiation of films of the polymer with nonpolarized ultraviolet light, followed by annealing treatment to enhance the photodichroism which displayed thermal stability. The photoirradiated films brought about high pretilt angles of the LC so that a VA-type LC cell was fabricated. The cell exhibited electro-optical properties with excellent optical quality on applying voltages even after heating at 100°C for several hours. © 1999 American Institute of Physics. Photochemical generation of high pretilt angles of nematic liquid crystals by azobenzene-containing polymer thin films Furumi Seiichi, Nakagawa Masaru, Morino Shin&＃39;ya, Ichimura Kunihiro Proceedings of Japanese Liquid Crystal Society Annual meeting 1999 486-487 1999 Publisher: Japanese Liquid Crystal Society DOI： 10.11538/ekitou.1999.0_486 More details Close A vertically aligned (VA) type of nematic liquid crystal (LC) cells were explored using photoirradiated thin films of a polymethacrytate with 4-trifluoromethoxyazobenzene as side chains. Optical anisotropy was generated by slantwise irradiation of thin films of the polymer with non-polarized UV light, followed by annealing to enhance the photodichroism, which displayed thermal stability. The photoirradiated films brought about high pretilt angles of LC so that a VA type LC cells were successfully fabricated. The cell exhibited electro-optical properties with excellent optical quality on applying voltages even after heating at 100℃ for several hours. Orientational photocontrol of dye molecules by thin films of a polymethacrylate with 2-styrylpyridine side chains YAMAKI Shigeru, NAKAGAWA Masaru, MORINO Shin&＃39;ya, ICHIMURA Kunihiro Proceedings of Japanese Liquid Crystal Society Annual meeting 1999 484-485 1999 Publisher: Japanese Liquid Crystal Society DOI： 10.11538/ekitou.1999.0_484 More details Close The orientational photocontrol of anisotropic (lye molecules by a dchroic thin film of a polymethacrylatc with styrylpyridine side chains is described. Photoreaction of styrylpyridine groups in thin films upon exposure to 313 nm light involved two reaclious of E-to-Z photoisomerization and (2+2) photodimerization. Thin films of the photoactive pollymethacrylates showed the photoinduced dichroism upon linearly polarized light at 313 nm. The orientation of dye molecules was perpendicular to the direction of the electric vector of polarizedlight. The dependence of methylene spacer length between the styrylpyridine group and the polymer backbone on the orientational order parameter of the oriented dye molecules was significantly observed. Photochemistry of polyrnethacrylates with styrylpyridine side chains and their photocontrollability of liquid crystal alignment Peer-reviewed Shigeru Yamaki, Masaru Nakagawa, Shin&＃39;ya Morino, Kunihiro Ichimura Journal of Photopolymer Science and Technology 12 (2) 279-282 1999 Publisher: Tokai University DOI： 10.2494/photopolymer.12.279 ISSN：0914-9244 Effect of substituants of azobenzenes side chains tethered to polymethacrylates on three-dimensional photocontrol of nematic liquid crystals Peer-reviewed Seiichi Furumi, Tursun Huxur, Masaru Nakagawa, Shin&＃39;ya Morino, Kunihiro Ichimura Journal of Photopolymer Science and Technology 12 (2) 283-284 1999 Publisher: Tokai University DOI： 10.2494/photopolymer.12.283 ISSN：0914-9244 Thermal stability of photoalignment of nematic liquid crystals by azobenzene polymer thin films Peer-reviewed Masatoshi Kidowaki, Takenori Fujiwara, Masaru Nakagawa, Shin&＃39;ya Morino, Kunihiro Ichimura Journal of Photopolymer Science and Technology 12 (2) 285-288 1999 Publisher: Tokai University DOI： 10.2494/photopolymer.12.285 ISSN：0914-9244 Polymethacrylates with 3,3&＃39;- and 4,4&＃39;-Dihexyloxy Azobenzene Moieties in Side-Chains : Photoinduced Dichroism and Liquid Crystal Photoalignment RUSLIM Christian, NAKAGAWA Masaru, MORINO Shin&＃39;ya, ICHIMURA Kunihiro Proceedings of Japanese Liquid Crystal Society Annual meeting 1998 140-141 1998 Publisher: Japanese Liquid Crystal Society DOI： 10.11538/ekitou.1998.0_140 More details Close Poly(methyl methacrylate) copolymers with 3,3&＃39;- or 4,4&＃39;-dihexyloxy azobenzene moiety were prepared through radical polymerization. Photoisomefization behavior and photoinduced dichroism of these copolymer films upon linearly polarized light irradiation were studied to reveal the effect of different conformational changes upon E/Z isomerization. The large photoinduced dichroism was observed for the polymer with 4,4&＃39;-substituents. Generation of the dichroism affords a photoalignment regulation of nematic liquid crystals in spite of as low as 7.0 % of the chromophore content. The direction of the dichroism is related to the direction of photocontrolled alignment of nematic liquid crystals. The conformational change of the chromophore during isomerization is assumed to be a crucial factor affecting molecular alignment. Photocontrol of liquid crystal alignment by poly(methacrylate)s with styrylpyridine side chains YAMAKI Shigeru, NAKAGAWA Masaru, MORINO Shin&＃39;ya, ICHIMURA Kunihiro Proceedings of Japanese Liquid Crystal Society Annual meeting 1998 142-143 1998 Publisher: Japanese Liquid Crystal Society DOI： 10.11538/ekitou.1998.0_142 More details Close Photoreactions and liquid crystal photocontrollability of thin films of styrylpyridine-substituted methacrylate polymers are described. Photoreactions of styrylpyridine groups in thin films upon irradiation with 313 nm light involved two processes of trans-cis photoisomerization and (2+2) photodimerization. Thin films of poly(methacrylate)s with styrylpyridine side chains showed photoinduced dichroism upon polarized light irradiation as a result of axial-selective photochemical reactions. Liquid crystal cells fabricated with plates covered with films of styrylpyridine polymers displayed homeotropic alignment with high optical quality. Slantwise irradiation with polarized UV light changed the initial homeotropic alignment to tilted alignment with the angle of approximately 85°. Electrochemical and sensing properties of enzyme-polypyrrole multicomponent electrode Peer-reviewed M. Rikukawa, M. Nakagawa, N. Nishizawa, K. Sanui, N. Ogata Synthetic Metals 85 (1月3日) 1377-1378 1997/03 DOI： 10.1016/S0379-6779(97)80280-9 ISSN：0379-6779 Charge transfer interactions of cyclobis(azopyridinium-phenylene) and hydroquinone derivatives Peer-reviewed M Nakagawa, M Rikukawa, K Sanui, N Ogata SYNTHETIC METALS 86 (1-3) 1873-1874 1997/02 Publisher: ELSEVIER SCIENCE SA LAUSANNE DOI： 10.1016/S0379-6779(97)80946-0 ISSN：0379-6779 More details Close Tetracationic cyclophanes and a [2]-catenane consisting of cyclobis(azopyridinium-p-phenylene) were synthesized via the template-directed synthesis. The charge transfer transitions and stability constants for supramolecular complexes with hydroquinone derivatives were evaluated by using visible spectroscopy and spectroscopic titration. Synthesis, electrochemical, and electrical properties of (phthalocyaninato)iron complexes with azopyridines Peer-reviewed M Nakagawa, M Rikukawa, K Sanui, N Ogata SYNTHETIC METALS 84 (1-3) 391-392 1997/01 Publisher: ELSEVIER SCIENCE SA LAUSANNE DOI： 10.1016/S0379-6779(97)80797-7 ISSN：0379-6779 More details Close Syntheses of phthalocyaninatoiron complexes, Fe(Pc-tb)L-2 and [Fe(Pc-tb)L](2) (where Pc-tb=tetra-tert-butylphthalocyaninato, L = 4,4&＃39;-azopyridine (4,4&＃39;-APy) or octafluoro-4,4&＃39;-azopyridine (4,4&＃39;-FAPy)}, were carried out. These complexes were characterized with TG/DTA H-1 NMR, W-visible spectroscopy, and cyclic voltammetry. Voltammetric measurements of soluble Fe(Pc-tb)L-2 in benzene solutions revealed th at co ordination of axi al ligands on Fe(Pc-tb) greatly influenced oxidation potentials og the central metal moiety. The correlation between conductivities of polymeric [Fe(Pc-tb)L](n) complexes and bandgaps determined by the voltammetric measurements was identified. Electrical properties of iodine-doped materials comprised of (phthalocyaninato)iron and azopyridines Peer-reviewed M Nakagawa, M Rikukawa, K Sanui, N Ogata SYNTHETIC METALS 84 (1-3) 421-422 1997/01 Publisher: ELSEVIER SCIENCE SA LAUSANNE DOI： 10.1016/S0379-6779(97)80812-0 ISSN：0379-6779 More details Close The preparation and electrical properties of iodine-doped phthalocyaninatoiron polymers {[Fe(Pc)L]I-y}(n) and {[Fe(pc(tb))L]I-y}(n) {Pc=phthalocyaninato, Pc-tb=tetra-tert-butylphthalocyaninato, L=4,4&＃39;-azopyridine (4,4&＃39;-APy) and octafluoro-4,4&＃39;-azopyridine (4,4&＃39;-FAPy)} were investigated. The stoichiometry of polymer complexes was determined by TG/DTA. The iodine-doped {[Fe(Pc)(4,4&＃39;-APy)]I-y}(n) complexes were semiconducting materials in the range of 10(-4) to 10(-10) S/cm. Electrical properties of conductive Langmuir-Blodgett films comprised of head-to-tail poly(3-hexylthiophene) Peer-reviewed M Rikukawa, M Nakagawa, K Ishida, H Abe, K Sanui, N Ogata THIN SOLID FILMS 284 (15) 636-639 1996/09 Publisher: ELSEVIER SCIENCE SA LAUSANNE DOI： 10.1016/S0040-6090(95)08409-6 ISSN：0040-6090 More details Close Conductive Langmuir-Blodgett (LB) films were fabricated from mixed monolayers containing structurally homogeneous poly(3-hexyl-thiophene) and stearic acid in different molar ratios. The structure of these mixed LB films was probed by visible absorption and X-ray diffraction measurements. These regioregular polymers containing almost 100% head-to-tail couplings showed the self-organized properties and affected the molecular structure in the LB films. Conductivities of the LB films doped with strong oxidizing agents were dramatically improved due to their well-defined polymer structure and were in the range of 10(2)-10(1) S cm(-1). High conducting Langmuir-Blodgett films comprising head-to-tail poly(3-hexylthiophene) Peer-reviewed M Rikukawa, M Nakagawa, H Abe, K Ishida, K Sanui, N Ogata THIN SOLID FILMS 273 (1-2) 240-244 1996/02 Publisher: ELSEVIER SCIENCE SA LAUSANNE DOI： 10.1016/0040-6090(95)06775-2 ISSN：0040-6090 More details Close Conductive ultra thin films were fabricated from mixed monolayers containing stearic acid and structurally homogeneous poly(3-hexylthiophene), which had almost 100% head-to-tail couplings with a M(w) of 8100 (M(w)/M(n) = 1.5) as estimated by H-1 NMR, C-13 NMR, and gel permeation chromatography. The mixed monolayers were found to be stable at the air-water interface and could be readily deposited onto solid substrates as Y-type films by the vertical lifting method. These Langmuir-Blodgett (LB) films exhibited well-defined layered structures as determined by UV-Vis absorption and X-ray diffraction measurements. The conductivity of the mixed LB films doped with NOPF6 was in the range of 50-100 S cm(-1) and was 50- to 100-fold higher than that of the mixed LB films using poly(3-hexylthiophene) synthesized by the usual chemical oxidation with FeCl3. Synthesis and charge transfer interactions of cyclobis(4,4′-azopyridinium-p-phenylene) Peer-reviewed Masaru Nakagawa, Masahiro Rikukawa, Kohei Sanui, Naoya Ogata Supramolecular Science 3 (4) 215-220 1996 Publisher: Elsevier Science Ltd DOI： 10.1016/S0968-5677(96)00047-8 ISSN：0968-5677 More details Close A new tetracationic cyclophane, cyclobis(4,4′-azopyridinium-p-phenylene) (2·4PF6), was synthesized via template-directed synthesis and characterized by MS and NMR spectroscopy. For the preparation of π-electron-deficient 2·4PF6, the use of π-electron-rich templates such as 1,4-bis[2-(2-hydroxyethoxy)ethoxy]benzene (4) and 1,5-bis[2-(2-hydroxyethoxy)ethoxy]naphthalene (5) enhanced the cyclophane formation in 17 and 19% yields, respectively. 1H NMR spectra of the reaction mixture revealed that the cyclophane precursor 1·2PF6 formed supramolecular assembling complexes with hydroquinone derivatives 4 and 5 before the ring formation. The intermolecular charge transfer interaction and the stability constants (Ka) of complexes generated between the electron-acceptor 2·4PF6, and electron-donors 1,4-dimethoxybenzene 3, 4, and 5 were evaluated using UV-vis, spectroscopy and spectroscopic titration. The absorption bands attributable to CT interactions were centred at 580 nm for 3, 635 nm for 4, and 646 nm for 5, with stability constants of 17±2, 2100±200, and 2400±300, respectively. BISAXIALLY COORDINATED (PHTHALOCYANINATO) METAL-COMPOUNDS WITH AZOBISPYRIDINE Peer-reviewed M RIKUKAWA, D MATUZAKI, M NAKAGAWA, K SANUI, N OGATA SYNTHETIC METALS 71 (1-3) 2279-2280 1995/04 Publisher: ELSEVIER SCIENCE SA DOI： 10.1016/0379-6779(94)03257-7 ISSN：0379-6779 More details Close New bisaxially coordinated phthalocyanines metal compounds were synthesized by melting azopyridines and phthalocyaninato metals such as phthalocyaninato iron (II) and phthalocyaninato cobalt (II). These complexes were characterized by using NMR, FT-IR, UV-Vis spectra, and TG/DTA. ELECTROCHEMICAL AND PHOTOCHROMIC PROPERTIES OF AZOPYRIDINIUM METHYLSULFATES Peer-reviewed M NAKAGAWA, M RIKUKAWA, M WATANABE, K SANUI, N OGATA CHEMISTRY LETTERS 23 (10) 1785-1788 1994/10 Publisher: CHEMICAL SOC JAPAN DOI： 10.1246/cl.1994.1785 ISSN：0366-7022 eISSN：1348-0715 More details Close Azopyridinium methylsulfates were systematically prepared and their electrochemical and photochromic properties were evaluated by using UV spectroscopy and cyclic voltammetry. Some azopyridiniums were newly identified as photochromic compounds. Show all ︎Show first 5 Misc. 60 メタオプティクスを志向した型成形・材料 Peer-reviewed Masaru Nakagawa 72巻 (4月号) 138-140 2023/04 ナノレオロジー計測と誘電分光法によるナノ閉じ込め液体の力学物性の解明 伊藤伸太郎, 中川勝, 福澤健二 物質・デバイス領域共同研究拠点 ダイナミックアライアンス 研究成果報告書 2023/03/31 2020~2021年度 東北大学多元物質科学研究所 マテリアル・計測ハイブリッド研究センター 光機能材料化学研究分野 業績集 中川勝, 押切友也, 新家寛正 2022/03 ナノ触診原子間力顕微鏡によるナノインプリント用光硬化薄膜のナノ力学物性 梁暁斌, 中川勝 2022/02 レーザー加工印刷を新機軸としたナノインプリント技術 Micro-print and Nano-imprint法 Peer-reviewed 中川勝 クリーンテクノロジー (10) 66-72 2022/01 ナノインプリントにおける離型処理技術 Peer-reviewed 中川勝 月刊トライボロジー (1) 25-29 2022/01 Fabrication of Nanostructures by Nanoimprint Lithography Invited Peer-reviewed Shunya ITO, Masaru NAKAGAWA 66 (10) 744-749 2021/10/15 リソグラフィ応用を目指した光ナノインプリント技術 中川勝 第69回高分子討論会 1W14IL 2020/09/16 蛍光インプリントアライメント法における基板とモールドの位置合わせ 中川勝 物質・デバイス領域共同研究拠点 ダイナミックアライアンス 研究成果報告書 F-18-TU-005 2020/06/30 「光機能材料化学研究分野」研究活動報告 中川勝, 中村貴宏, 伊東駿也 東北大学 多元物質科学研究所 高分子・ハイブリッド材料研究センター 2019年度報告書 39-45 2020/03/01 Trial produce of micro/nano-patterns to screening in initial evaluation of cell functions for biomedical applications 赤坂司, 伊東駿也, 中川勝, 宮内昭浩 生体医歯工学共同研究拠点成果報告会 2019 2020 シングルナノ造形に向けた研究動向（第16章3節） Invited 伊東駿也, 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 622-624 2019/11 可視光メタマテリアルに向けたナノインプリント技術（第12章7節） Invited 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 450-453 2019/11 離型力評価装置（第11章4節1項） Invited 伊東駿也, 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 410-412 2019/11 X線反射率測定（第11章3節8項） Invited 中村貴宏, 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 406-408 2019/11 反射分光膜厚計（第11章3節7項） Invited 中村貴宏, 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 406-406 2019/11 光硬化樹脂のはく離に生じる力の測定（第11章3節6項） Invited 伊東駿也, 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 404-406 2019/11 蛍光顕微鏡による光ナノインプリント連続成形の評価（第11章3節5項） Invited 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 402-404 2019/11 モールドへの離型剤塗布（第10章6節） Invited 伊東駿也, 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 371-373 2019/11 蛍光モアレアライメント（第8章1節2項） Invited 中村貴宏, 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 280-281 2019/11 UVナノインプリント用離型剤（第7章3節2項） Invited 伊東駿也, 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 257-261 2019/11 蛍光レジスト（第7章2節2項） Invited 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 228-229 2019/11 易凝縮性ガスPFPに適した光硬化性組成物（第7章2節1項） Invited 伊東駿也, 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 226-228 2019/11 レーザー加工孔版印刷によるナノインプリントリソグラフィ（第6章7節） Invited 中村貴宏, 中川勝 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 169-170 2019/11 ナノインプリント技術から見えてきた高分子薄膜の表面・界面の近傍 Invited 中川勝 KOBUNSHI HIGH POLYMERS, JAPAN 68 (1) 24-28 2019/01 ナノインプリントリソグラフィの現状と今後の課題 Invited Peer-reviewed 中川勝 応用物理 85 (6) 480-484 2016/06 Publisher: 応用物理学会 ISSN：0369-8009 誘導ナノ構造科学 Invited 竹中幹人, 中川勝 機能材料 34 (3) 3-3 2014/03 ISSN：0286-4835 易凝縮性ガス利用光ナノインプリントに適した光硬化性組成物の開発 Invited 伊東駿也, 中川勝 OPTRONICS 33 (1) 90-95 2014/01 Publisher: オプトロニクス社 ISSN：0286-9659 光硬化性蛍光組成物によるナノインプリントプロセスの可視化 Invited 久保祥一, 中川勝 OPTRONICS 33 (1) 85-89 2014/01 Publisher: オプトロニクス社 ISSN：0286-9659 反応性密着単分子膜を特徴とするナノインプリントリソグラフィ 久保祥一, 中川勝 表面(表面談話会・コロイド懇話会) 51 (8) 386-395 2013/08/01 ISSN：0367-648X 反応性密着単分子膜を特徴とするナノインプリントリソグラフィ Invited 久保祥一, 中川勝 表面 51 (8) 6-15 2013/08 Scientific News: 液晶配向膜で半導体無機ナノロッドの方向制御 Invited 久保祥一, 田口怜, 林田研一, 成田麻美子, 波多野慎悟, 渡辺修, 彌田智一, 中川勝 KOBUNSHI HIGH POLYMERS, JAPAN 62 (8) 460-460 2013/08 【研究室紹介】東北大学 多元物質科学研究所 高分子・ハイブリッド材料研究センター Invited 中川勝 フォトポリマー懇話会 ニュースレター 61 2-5 2013/01/16 ナノロッド/ネマチック液晶ハイブリッド材料の創成とZnOナノロッドの一軸配向 久保祥一, 田口怜, 林田研一, 成田麻美子, 波多野慎悟, 渡辺修, 彌田智一, 中川勝 高分子学会予稿集(CD-ROM) 62 (1) 2013 ナノロッド/ネマチック液晶ハイブリッド材料による半導体ナノロッドの一軸配向 久保祥一, 田口怜, 林田研一, 成田麻美子, 波多野慎悟, 渡辺修, 彌田智一, 中川勝 高分子学会予稿集(CD-ROM) 62 (2) 2013 ネマチック液晶性ブロック共重合体のATRP法による合成とミクロ相分離構造の解析 小林翔, 田口怜, 久保祥一, 波多野慎悟, 小村元憲, 彌田智一, 中川勝 高分子学会予稿集(CD-ROM) 62 (1) 2013 Recent Development of Demolding Technology in Nanoimprint Lithography Invited Peer-reviewed Masaru Nakagawa KOBUNSHI HIGH POLYMERS, JAPAN 61 (9) 706-709 2012/09 Publisher: 高分子学会 ISSN：0454-1138 Magnetically-Guided Drug Delivery System using Magnetic Capsules composed of Nanometer-thick Shell KITAMOTO Yoshitaka, FUCHIGAMI Teruaki, NAKAGAWA Masaru, NAMIKI Yoshihisa 2012 (70) 27-31 2012/08/07 次世代エレクトロニクスデバイスの創出に資する革新材料・プロセス研究 Invited 中川勝 CREST領域ニュース 11 (1) 2012/08 特集の語り：エレクトロニクスの新時代を想像してみませんか？ 中川勝 KOBUNSHI HIGH POLYMERS, JAPAN 61 (3) 131-131 2012/03 ビフェニル部位を有するポリ(メタクリレート)のATRP法による合成および液晶性評価 田口怜, 久保祥一, 波多野慎悟, 彌田智一, 中川勝 高分子学会予稿集(CD-ROM) 61 (1) 2012 ビフェニル部位を側鎖とする高分子を表面グラフトした酸化亜鉛ナノロッドの合成 久保祥一, 田口怜, 林田研一, 成田麻美子, 波多野慎悟, 渡辺修, 彌田智一, 中川勝 高分子学会予稿集(CD-ROM) 61 (1) 2012 光ナノインプリント用離型剤（第8章第2節） Invited 小林敬, 中川勝 ナノインプリントの開発とデバイス応用（監修 松井真二） 123-129 2011/10 ナノインプリントパターン評価（第10章第1節） Invited 久保祥一, 中川勝 ナノインプリントの開発とデバイス応用（監修 松井真二） 151-155 2011/10 ナノインプリントリソグラフィにおける光機能材料化学 Invited 中川勝, 久保祥一 MATERIALS INTEGRATION 24 (4月5日) 248-253 2011/06 光ナノインプリントリソグラフィ用蛍光レジスト Invited 小林敬, 中川勝 Monthly DISPLAY 17 (6) 17-18 2011/05 Fluorescent Resist Materials for Nanoimprint Lithography NAKAGAWA Masaru 60 (3) 139-140 2011/03/01 ISSN：0454-1138 ポリ(シアノビフェニルオキシアルキルメタクリレート)のATRP法による合成と相転移挙動 久保祥一, 波多野慎悟, 彌田智一, 中川勝 高分子学会予稿集(CD-ROM) 60 (1 Disk1) 2011 ATRPにより合成したポリ(シアノビフェニルオキシアルキル メタクリレート)の溶液内構造形成と液晶性の検討 久保祥一, 波多野慎悟, 彌田智一, 中川勝 高分子学会予稿集(CD-ROM) 60 (2 Disk1) 2011 Detachment properties of fluorinated hydrocarbon containing adsorbed monolayers on a radical-type UV-cured resin KOHNO Akihiro, NAKAGAWA Masaru IEICE technical report 110 (243) 21-25 2010/10/15 Publisher: The Institute of Electronics, Information and Communication Engineers ISSN：0913-5685 More details Close Adsorbed monolayers from (3,3,3-trifluoropropyl)trimethoxysilane(FAS3), (tridecafluoro-1,1,2,2-tetrahydrooctyl)trimethoxysilane(FAS13), and (heptadecafluoro-1,1,2,2-tetrahydrodecyl)trimethoxysilane(FAS17), were formed by chemical vapor surface modification on silica lens surfaces cleaned by exposure to vacuum ultraviolet (VUV) light at 172nm. Changes in monolayer-modified lens surfaces concomitant with repeating a cycle of curing to induce the radical polymerization of a UV-curable resin and detaching the UV-cured resin were monitored by contact angle measurement with water and atomic force microscopy to investigate the property of the adsorbed monolayers as antisticking layers in UV nanoimprint lithography. A decrease of the contact angle for water with increasing the number of repeated cycles was mainly responsible for the removal of surface impurities in the form of nanoparticles on detaching the cured resin repeatedly. It was found that recoating the silica lens surface with monolayers from FAS13 and FAS17 after cleaning by VUV-light exposure resulted in the suppression of the decrease in the contact angle. These results indicate that the durability of an antisticking layer in UV nanoimprint lithography is markedly improved by the recoating. We measured adhesion forces generating when UV-cured resin was detached from surface-modified silica superstrates. We report dependences of the kind of fluoroalkyl-containing antisticking molecular layers on the adhesion forces and changes of the adhesion forces by increasing the number of detachment. We propose the antisticking molecular layer suitable for UV nanoimprint lithography. Reactive-monolayer-assisted thermal nanoimprint lithography 中川勝 機能材料 29 (10) 71-75 2009/09/05 植物組織から左巻き金属マイクロコイルを作製−維管束「らせん紋」テンプレート Invited 鎌田香織, 大塚雅之, 中川 勝, 彌田智一 未来材料 8 (8) 2-4 2008/08/10 Publisher: エヌ・ティー・エス ISSN：1346-0986 CdSを修飾したプルシアンブルー微粒子の光物性制御 田口実, 八木一三, 中川勝, 彌田智一, 名嘉節, 阿尻雅文, 栄長泰明 光化学討論会講演要旨集 2007 2007 CdSを修飾したプルシアンブルー微粒子の光磁性制御 田口実, 八木一三, 中川勝, 彌田智一, 栄長泰明 光化学討論会講演要旨集 2006 2006 磁性ニッケルナノチューブの開発−リサイクル可能な分子集合体を鋳型に利用− Invited 中川勝, 石井大佑, 長嶋太一 化学と工業 58 (4) 494-496 2005 光反応性有機分子層を用いた微粒子の選択吸着 Invited 中川勝 高分子加工 52 (2) 50-56 2003 Publisher: 高分子刊行会 ISSN：0023-2564 Photoreactive monomolecular layers to achieve site-selective adsorption NAKAGAWA Masaru 51 (1) 65-67 2002/05/10 環状両親媒性分子からなる単分子膜とその特性 Invited 松澤洋子, Oh, Sang-Keun, 中川勝, 市村國宏 機能材料 20 (9) 28-37 2000 Publisher: シ-エムシ- ISSN：0286-4835 単分子膜のナノ・マイクロパターン作製技術とその応用 Invited 中川勝, 市村國宏 機能材料 19 (9) 15-24 1999 Publisher: シ-エムシ- ISSN：0286-4835 Photocontrol of LC alignment by disphenyl acetylene moieties at the LC-substrate interface Obi Masaki, Nakagawa Masaru, Morino Shin&＃39;ya, Ichimura Kunihiro Preprints of Symposium on Liquid Crystals 23 254-255 1997/09/24 Publisher: Japanese Liquid Crystal Society More details Close The photocontrol of LC alignment was achieved using the surface-modificated LC cell with photoreactive molecules, called as command surface. In the photocontrol mechanism, a reorientation process with continuous isomerization of the photoactive molecule was proposed to be essential. To investigate effects of geometrical photoisomerization for LC alignment, we used diphenylacetylene (DPA) as a photoactive molecule with no photoisomerization. Our previous study shows that the re-orientation of chromophores at the LC-substrate interface play a crucial role in the photocontrol of LC alignment. In this study, 11-(4-(2-phenylethynyl)phenoxy) undecanoic acid (11DPA) was used as DPA moities and formed selfassembled complexes with poly-allylamine (PAA) on a substrate. The uni-directional LC alignment was observed on the LC cell using a substrate with DPA desity of 1nm^2/molecule. However. no photoalignment was obsered in the case of a substrate with high DPA density (0.4nm^2/molecule). Polarized absorption spectra of dichroic dye in the LC cell revealed that the direction of LC alignment was perpendicular to the LPL electricvector. In DPA substituted polymethacrylate films exhibited the parallel LC alignment to it. The reason for these differences of LC alignment direction was considered as a difference in photochemical reactions of DPA moieties. Show all ︎Show first 5 Books and Other Publications 20 高分子材料の事典 高分子学会, 中條, 善樹, 大山, 俊幸, 古賀, 毅, 佐藤, 尚弘, 原口, 和敏, 和田, 健彦, 青島, 貞人 朝倉書店 2022/11 ISBN: 9784254252729 メタマテリアルの設計、作製と新材料、デバイス開発への応用 技術情報協会 技術情報協会 2022/03 ISBN: 9784861048760 ナノインプリント技術ハンドブック（編集 応用物理学会・ナノインプリント技術研究会） 伊東駿也, 中村貴宏, 中川勝 オーム社 2019/11 光機能性有機・高分子材料における新たな息吹 中川勝 シーエムシー出版 2019/04 ISBN: 9784781314143 プリンテッド・エレクトロニクスに向けた材料、プロセス技術の開発と最新事例 中村貴宏, 中川勝 情報技術協会 2017/10 ISBN: 9784861046810 半導体微細パターニング〜限界を超えるポスト光リソグラフィ技術〜（監修 岡崎信次） 中川勝 エヌ・ティー・エス 2017/04 ISBN: 9784860434670 ナノインプリント技術（松井真二, 平井義彦 編著） 中川勝 電子情報通信学会 2014/03 ISBN: 9784885522857 高分子ナノテクノロジーハンドブック（編集代表 西敏夫） 久保祥一, 中川勝 エヌ・ティー・エス 2014/03 ISBN: 9784860434106 ナノインプリントの開発とデバイス応用（監修 松井真二） 小林敬, 久保祥一, 中川勝 シーエムシー出版 2011/10 ISBN: 9784781304564 Inorganic and metallic nanotubular materials: Recent technologies and applications (Ed. Tsuyoshi Kijima) Masaru Nakagawa, Hirokazu Oda, Kei Kobayashi Springer 2010/03 ISBN: 9783642036200 超分子サイエンス＆テクノロジー（監修 国武豊喜） 中川勝 エヌ・ティ・エス 2009/05/15 ISBN: 9784860433093 有機・無機・金属ナノチューブ（編集 清水敏美, 木島剛） 中川勝 フロンティア出版 2008/03 ISBN: 9784902410143 光機能性高分子材料の新たな潮流 中川勝, 松井真二 シーエムシー 2008/03 ISBN: 9784781300122 エコマテリアルハンドブック（監修 山本良一） 中川勝 丸善 2006/12/06 ISBN: 4621077449 機能物質の集積膜と応用展開（監修 関隆広） 中川勝 シーエムシー 2006/06 ISBN: 9784882315704 シランカップリング剤の選び方と使い方（監修 中村吉伸, 永田員也） 多賀谷基博, 中川勝 Science&Technology 2006 ISBN: 9784864280037 環状・筒状超分子新素材の応用技術 （監修 高田十志和） 中川勝 シーエムシー 2006/01 ISBN: 9784882315476 第5版実験化学講座 第28巻ナノテクノロジーの化学（編集 日本化学会） 中川勝 丸善 2005/07 ISBN: 9784621073278 光機能性有機・高分子材料の新局面（監修 市村國宏） 中川勝 シーエムシー 2002/10/01 ISBN: 9784882313632 新しい半導体プロセスと材料（監修 大見忠弘） 中川勝 シーエムシー 2000/05 ISBN: 9784882318668 Show all Show first 5 Presentations 618 超臨界水熱法による酸化ニッケルナノ結晶合成に向けた有機修飾剤の探索 川瀬智暉, 押切友也, 笘居高明, 中川勝 第23回 東北大学多元物質科学研究所研究発表会 2023/12/07 円偏光によりMie共鳴の励振されたSiナノディスクからの塩素酸ナトリウムキラル結晶化における結晶鏡像異性体過剰 新家寛正, 後藤和泰, 高野修綺, 田川美穂, 吉川洋史, 川村隆三, 押切友也, 中川勝 第52回結晶成長国内会議 2023/12/06 氷V/水界面の未知の水のスピノーダル様脱濡れにおける異方性 新家寛正, 山崎智也, 灘浩樹, 羽馬哲也, 香内晃, 麻川明俊, 押切友也, 中川勝, 木村勇気 第52回結晶成長国内会議 2023/12/05 Photoelectrochemical properties of plasmonic photocathode using nickel oxide Tomoya Oshikiri, Takashi Katsurahara, Noriko Kubota, Hiromasa Niinomi, Yasutaka Matsuo, Hiroaki Misawa, Masaru Nakagawa The 12th Asian Photochemistry Conference (APC2023), Melbourne, Australia 2023/11/30 Volume Compensating Materials after Vapor Phase Infiltration: Effect of Different Butyl Isomers of Polymer Side-Chains on High Process Temperature Durability Norikatsu Sasao, Shinobu Sugimura, Koji Asakawa, Tomoya Oshikiri, Masaru Nakagawa 36th International Microprocesses and Nanotechnology Conference (MNC 2023) 2023/11 Observation of wetting by capillary condensation of photo-curable liquid in nanogaps and its effect on cavity filling in nanoimprinting Masato Suzuki Shintaro Itoh, Yusuke Nakanishi, Kenji Fukuzawa, Masaru Nakagawa Toshiya, Asano, Naoki Azuma, Hedong Zhang 36th International Microprocesses and Nanotechnology Conference (MNC 2023) 2023/11 Thickness of surface silicon oxide layer affecting liquid spreading at a nanogap for UV nanoimprint lithography Masaru Nakagawa, Akiko Onuma, Hiromasa Niinomi, Shintaro Itoh, Kenji Fukuzawa, Toshiya Asano 36th International Microprocesses and Nanotechnology Conference (MNC 2023) 2023/11/16 Fabrication of nickel oxide thin films for photocathodes through wet and gas phase processes Tomoya Oshikiri, Takashi Katsurahara, Noriko Kubota, Hiromasa Niinomi, Yasutaka Matsuo, Hiroaki Misawa, Masaru Nakagawa 36th International Microprocesses and Nanotechnology Conference (MNC 2023), Sapporo, Japan, 2023/11/16 有機修飾剤を用いた超臨界水熱法による酸化ニッケルナノ結晶の合成と物性 川瀬智暉, 押切友也, 笘居高明, 中川勝 2023年度高分子学会東北支部研究発表会 2023/11/10 シングルナノ精度を有する光硬化成形体の蛍光強度膜厚測定法 稲川亮太, 大沼晶子, 新家寛正, 中川勝 2023年度高分子学会東北支部研究発表会 2023/11/09 異方脱濡れが示唆する水/氷 V 界面における未知の水の液晶性 Invited 新家寛正, 山崎智也, 灘浩樹, 羽馬哲也, 香内晃, 麻川明俊, 押切友也, 中川勝, 木村勇気 2023年度高分子学会東北支部研究発表会 2023/11/10 How far does a droplet of UV-curable liquid spread between the mold and silicon surfaces in nanoimprinting? Masaru Nakagawa, Akiko Onuma, Hiromasa Niinomi, Shintaro Itoh, Kenji Fukuzawa, Toshiya Asano The 22nd International Conference on Nanoimprint and Nanoprint Technologies (NNT2023) 2023/10 水素製造光カソード構築に向けた酸化ニッケル膜の作製と界面でのホール輸送能 押切友也, 葛原 隆, 久保田 紀子, 新家 寛正, 松尾 保孝, 三澤 弘明, 中川 勝 第72回高分子討論会 2023/09/28 異方スピノーダル様脱濡れが示唆する水/氷V界面における未知の水の液晶性 新家 寛正, 山崎 智也, 灘 浩樹, 羽馬 哲也, 香内 晃, 押切 友也, 中川 勝, 木村 勇気 第72回高分子討論会 2023/09/26 一桁ナノ造形に向けた孤立印刷配置されたサブピコリットル光硬化性液滴の押力延展の検討（３） 水素結合性高分子の効果 中川 勝, 吉田 健, 大沼 晶子 第72回高分子討論会 2023/09/26 湿式プロセスを用いた金ナノ粒子/酸化ニッケル/白金電極の光電気化学反応特性 押切友也, 葛原 隆, 久保田 紀子, 新家 寛正, 松尾 保孝, 三澤 弘明, 中川 勝 2023年光化学討論会 2023/09/07 In-Situ Observations of Low- and High-Density Unknown Waters at Interfaces between Water and Ices Grown/Melted by Pressure Hiromasa Niinomi, Tomoya Yamazaki, Hiroki Nada, Tetsuya Hama, Akira Kouchi, Tomoya Oshikiri, Masaru Nakagawa, Jun Nozawa, Junpei T. Okada, Satoshi Uda, Yuki Kimura 15th International Conference on the Physics and Chemistry of Ice (PCI-2023) 2023/09/04 Low- and High-Density Unknown Waters at Interfaces between Water and Ices Grown/Melted by Pressure Hiromasa Niinomi, Tomoya Yamazaki, Hiroki Nada, Tetsuya Hama, Akira Kouchi, Tomoya Oshikiri, Masaru Nakagawa, Jun Nozawa, Junpei T. Okada, Satoshi Uda, Yuki Kimura The 20th International Conference on Crystal Growth and Epitaxy (ICCGE-20), Naples, Italy 2023/08/02 Chiral Crystallization Directed by Superchiral Plasmonic Near-field Force Hiromasa Niinomi, An-Chieh Cheng, Teruki Sugiyama, Miho Tagawa, Toru Ujihara, Hiroshi Yoshikawa, Ryuzo Kawamura, Jun Nozawa, Junpei T. Okada, Satoshi Uda, Tomoya Oshikiri, Masaru Nakagawa The 20th International Conference on Crystal Growth and Epitaxy (ICCGE-20), Naples, Italy 2023/08/01 Super Chiral Field on an Achiral Gold Nanostructure Tomoya Oshikiri, Hiromasa Niinomi, Masaru Nakagawa, Hiroaki Misawa The 31st International Conference on Photochemistry (ICP-2023), Spporo, Japan, 2023/7/23-28 2023/07/24 Liquid Crystal-Like Unknown Water Inferred by Anisotropic Spinodal-like Dynamics at a Water-Ice V Interface Hiromasa Niinomi, Tomoya Yamazaki, Hiroki Nada, Tetsuya Hama, Akira Kouchi, Tomoya Oshikiri, Masaru Nakagawa, Yuki Kimura 2023/07/14 Slimming Imprint Resist Masks by Oxygen Reactive Ion Etching for Silicon Metaoptics Invited 2023/07/06 Simulation and Demonstration of Atomic-scale Precise Alignment in UV Nanoimprint Lithography Invited 2023/07/07 ビスフェノールAを骨格とする光ナノインプリントレジストの転写機能 高野 修綺, 新家 寛正, 中川 勝 第72回高分子学会年次大会 2023/05/24 一桁ナノ造形に向けた孤立印刷配置されたサブピコリットル光硬化性液滴の押力延展の検討（２）反応性密着剤の重合性官能基の効果 中川 勝, 吉田 健, 大沼 晶子 第72回高分子学会年次大会 2023/05/24 Spinodal Decomposition-like Dynamics of Unknown Water at Ice V-Water Interface Japan Geoscience Union Meeting 2023, JpGU 2023) 2023/05/21 合成石英モールドを用いたUV-NILによるシリコンナノディスク配列体の作製と光機能 高野修綺, 新家寛正, 森田伊織, 後藤和泰, 押切友也, 中川勝 2023年第2回ナノインプリント技術研究会 2023/05/19 Simulation of Fluorescence Alignment with Atomic-Scale Precision for Ultraviolet Nanoimprint Lithography Hiromasa Niinomi, Subaru Harada, Toshiaki Hayakawa, Masaru Nakagawa Photomask Japan 2023 2023/04/25 Fabrication of silicon nanodisk array by UV nanoimprint lithography 2023/03/15 Impact of nickel oxide on properties of photocathode-type nanocavity 2023/03/18 Quantifying Shear Properties of Nano-Confined Liquids Using Vertical Objective Ellipsometric Microscopy &＃34;2023 JSME Information, Intelligence and Precision Equipment Division &＃34; 2023/03/06 キラル結晶化に巨大な鏡像異性体過剰を誘起する プラズモン構造体におけるキラル近接場の数値解析 新家寛正, An-Chieh Cheng, 杉山輝樹, 田川美穂, 吉川洋史, 宇田聡, 押切友也, 中川勝 第22回東北大学多元物質科学研究所研究発表会 2022/12/08 Photo-oxidative decomposition of a fluorinated antisticking molecular layer monitored by contact angle measurements and time of flight secondary ion mass spectrometry Kanta Kawasaki, Rie Shishido, Akiko Onuma, Hiromasa Niinomi, Masaru Nakagawa MNC 2022, 35th International Microprocesses and Nanotechnology Conference 2022/11/10 Micro-print and nano-imprint method using adhesive molecular layers with low surface-free-energy and chemisorption for a shape-fixed residual layer in UV nanoimprint lithography Kanta Kawasaki, Akiko Onuma, Hiromasa Niinomi, Masaru Nakagawa MNC 2022, 35th International Microprocesses and Nanotechnology Conference 2022/11/10 &＃34;高圧下で成長する氷V/水界面 に生成する未知の水のダイナミクス&＃34; 2022/10/31 Selection of adhesive molecular layers with monomer-repellence and chemisorption for a shape-fixed residual layer in UV nanoimprint lithography Kanta Kawasaki, Akiko Onuma, Hiromasa Niinomi, Masaru Nakagawa Nanoimprint and Nanoprint Technology Conference 2022 （NNT 2022） 2022/10/06 Nanofabrication of metal/semiconductor/metal structure for efficient photocathode under strong coupling condition Tomoya Oshikiri, Xu Shi, Hiroaki Misawa, Masaru Nakagaw Nanoimprint and Nanoprint Technology Conference 2022 （NNT 2022） 2022/10/07 Atom-scale-precision fluorescence alignment demonstrated by computational simulation Hiromasa Niinomi, Subaru Harada, Toshiaki Hayakawa, Masaru Nakagawa Nanoimprint and Nanoprint Technology Conference 2022 （NNT 2022） 2022/10/06 Chiral Crystallization Directed by Chiral Near-Field Force with Nanostructured Plasmonic Metasurfaces Hiromasa Niinomi, An-Chieh Cheng, Teruki Sugiyama, Miho Tagawa, Hiroshi Yoshikawa, Satoshi Uda, Tomoya Oshikiri, Masaru Nakagawa Nanoimprint and Nanoprint Technology Conference 2022 （NNT 2022） 2022/10/05 フッ素含有自己組織化単分子膜の光酸素酸化におけるUVオゾン照射と真空UV照射の違い 2022/09/07 一桁ナノ造形に向けた孤立印刷配置された サブピコリットル光硬化性液滴の押力延展の検討 2022/09/06 光硬化性微小液滴の平板押印成形体の蛍光顕微鏡観察 2022/09/07 Efficient hot-hole transfer on metal/semiconductor interface under modal strong coupling condition Invited Tomoya Oshikiri, Xu Shi, Masaru Nakagawa, Hiroaki Misawa 2022/07/30 ナノリソグラフィで鍵を握る界面機能分子制御 Invited Masaru Nakagawa 2022/07/22 レーザー加工孔版印刷・蛍光アライメント・ハイブリッド化レジストを用いたナノインプリント技術 Invited 中川 勝 応用物理学会 次世代リソグラフィ技術研究会 NGL ワークショップ2022 2022/07/07 Fluorescence Alignment for Atomic-Scale Position Adjusetment in Ultraviolet Nanoimprint Lithography Hiromasa Niinomi, Subaru Harada, Toshiaki Hayakawa, Masaru Nakagawa The 65th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN 2022) 2022/06/01 Vapor-phase organic-inorganic hybridization applied to UV nanoimprint lithography Chiaki Miyajima, Masaru Nakagawa 2021/12/09 含フッ素自己組織化単分子膜のUV/O3による分解挙動 川崎貫太, 中川勝 第21回東北大学多元物質科学研究所研究発表会 2021/12/09 UV Nanoimprint Lithography Involving Laser-Drilled Screen Printing Masaru Nakagawa The 20th International Conference on Nanoimprint and Nanoprint Technologies (NNT2021) 2021/11/17 Area Selective Deposition of Aluminum Oxide via Metallized UV-nanoimprinted Resin Patterns Chiaki Miyajima, Masaru Nakagawa The 20th International Conference on Nanoimprint and Nanoprint Technologies (NNT2021) 2021/11/16 表面修飾された固体－液体－固体の2界面における液体およびモノマーの濡れに関する研究 川崎貫太, 中川勝 2021高分子学会東北支部研究発表会 2021/11/01 UV nanoimprint lithography with laser-drilled screen printing, fluorescence alignment, and hybridized resist materials Invited Masaru Nakagawa 34th International Microprocesses and Nanotechnology Conference (MNC 2021) 2021/10/28 レーザー加工孔版印刷を組込んだ光ナノインプリントリソグラフィ Invited 中川勝 第172回ラドテック研究会講演会 2021/08/31 フェムト秒レーザーの単パルスによるクロム堆積インプリント樹脂パターンのドライ現像 Invited 中川勝 応用物理学会 次世代リソグラフィ分科会 NGL ワークショップ2021 2021/07/09 X 線反射率測定によるアルミナドープ光硬化樹脂薄膜の内部構造解析 Invited 千葉康平, 中村貴宏, 伊東駿也, 中川勝 応用物理学会 次世代リソグラフィ分科会 NGL ワークショップ2021 2021/07/08 インプリント樹脂マスクを用いたアルミナの領域選択的な原子層堆積 Invited 宮島千晶, 伊東駿也, 中川勝 応用物理学会 次世代リソグラフィ分科会 NGL ワークショップ2021 2021/07/08 Internal Layered Structures of UV-Cured Thin Films after Sequential Vapor Infiltration Analyzed by X-ray Reflectivity Measurements Kohei Chiba, Takahiro Nakamura, Shunya Ito, Masaru Nakagawa The 64th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication 2021/06/02 Nanoimprinted Deposition Masks for Area Selective Atomic Layer Deposition of Aluminum Oxide Chiaki miyajima, Shunya Ito, Masaru Nakagawa The 64th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication 2021/06/02 二界面ナノすきまにおけるフェムトリットル孤立液滴の押印伸展に関する研究 吉田健, 大沼晶子, 伊東駿也, 中川勝 第70回高分子学会年次大会 2021/05/26 X-ray-reflectivity analysis of organic-inorganic UV-cured resin films hybridized by sequential vapor infiltration Kohei Chiba, Takahiro Nakamura, Shunya Ito, Masaru Nakagawa The 27th Symposium on Photomask and NGL Mask Technology 2021/04/20 Vapor Phase Infiltration of Thin Films and Nanopatterns of Electron Beam and Nanoimprint Resists Shunya Ito, Masaru Nakagawa The 27th Symposium on Photomask and NGL Mask Technology 2021/04/20 トリメチルアルミニウムで染色した光硬化ナノ薄膜の内部構造解析 千葉康平, 中村貴宏, 伊東駿也, 中川勝 2021年第68回応用物理学会春季学術講演会 2021/03/18 領域選択的な原子層堆積に向けた光硬化蒸着マスクのドライエッチング 宮島千晶, 伊東駿也, 中川勝 2021年第68回応用物理学会春季学術講演会 2021/03/18 Vapor Phase Infiltration to Hybridize Thin Films of Electron Beam and Nanoimprint Resists International-presentation Invited Shunya Ito, Masaru Nakagawa 2nd Workshop on Sequential Infiltration Synthesis 2020/12/15 酸素反応性イオンエッチングによるグラフェン表面の改質と原子間力顕微鏡観察応用 伊東駿也, 瀬戸陽子, 熊木治郎, 中川勝 第20回東北大学多元物質科学研究所研究発表会 2020/12/03 Organic-inorganic hybrid nanoimprint replica molds for industrial application Shunya Ito, Takahiro Nakamura, Masaru Nakagawa The 4th Symposium for The Core Research Cluster for Materials Science and the 3rd Symposium on International Joint Graduate Program in Materials Science 2020/11/17 グラフェン基板上での PMMA 孤立鎖の原子間力顕微鏡観察 伊東駿也, 瀬戸陽子, 熊木治郎, 中川勝 2020高分子学会東北支部研究発表会 2020/11/13 レーザー加工孔版印刷により孤立配置した液滴と成形体の形状評価 吉田健, 大沼晶子, 伊東駿也, 中川勝 2020高分子学会東北支部研究発表会 2020/11/13 有機－無機ハイブリッド化光硬化膜の X 線反射率測定 千葉康平, 中村貴宏, 伊東駿也, 中川勝 2020高分子学会東北支部研究発表会 2020/11/13 Femtosecond-laser single-pulse development of Cr-deposited imprint resin patterns Yusuke Isawa, Takahiro Nakamura, Shunya Ito, Masaru Nakagawa 33rd International Microprocesses and Nanotechnology Conference (MNC 2020) 2020/11/09 X線反射率測定による光硬化樹脂の解析 千葉康平, 中村貴宏, 大沼晶子, 中川勝 高分子・ハイブリッド材料 研究センター 2020 PHyM シンポジウム 2020/10/19 Print-and-imprint法により作製した光硬化薄膜 吉田健, 大沼晶子, 伊東駿也, 中川勝 高分子・ハイブリッド材料 研究センター 2020 PHyM シンポジウム 2020/10/19 Development and application of cationic photopolymers with high resistance to oxygen reactive etching and concentrated hydrochloric acid 2020/09/16 逐次浸透合成で起こる有型成形ナノパターンのライン倒れ欠陥の架橋剤による抑制 宮島千晶, 伊東駿也, 中川勝 第69回高分子討論会 2020/09/17 金属堆積ナノインプリント成形体のフェムト秒シングルパルスドライ現像 井澤優佑, 中村貴宏, 伊東駿也, 中川勝 第69回高分子討論会 2020/09/16 蛍光インプリントアライメントに資する紫外線硬化性可視蛍光液体の開発―重合開始剤の効果― 吉田拓真, 伊東駿也, 中川勝 第69回高分子討論会 2020/09/16 逐次浸透合成による電子線およびナノインプリントレジストの有機－無機ハイブリッド化 伊東駿也, 中川勝 第69回高分子討論会 2020/09/17 ナノ触診原子間力顕微鏡により可視化された光硬化超薄膜で起こる弾性率面内分布の不均一性 第69回高分子討論会 2020/09/16 Ultraviolet Nanoimprinting Technology for Lithography Usage Invited 2020/09/16 逐次浸透合成による光ナノインプリント成形パターンの倒れ欠陥と架橋剤添加による欠陥抑制 宮島 千晶, 伊東 駿也, 中村 貴宏, 中川 勝 第67回応用物理学会春季学術講演会 2020/03/15 光示差走査熱量測定による蛍光ナノインプリントアライメントに向けた 色素含有紫外線硬化性液体の探索 吉田 拓真, 伊東 駿也, 中川 勝 第67回応用物理学会春季学術講演会 2020/03/15 金属堆積光インプリント樹脂パターンのシングルパルスレーザー現像 井澤 優佑, 中村 貴宏, 伊東 駿也, 中川 勝 第67回応用物理学会春季学術講演会 2020/03/15 新しいナノインプリント技術 pirint and imprint による極限ナノ造形 Invited 中川 勝 一般社団法人表面技術協会 第141回講演大会 2020/03/03 逐次浸透合成により高分子薄膜内に形成されたAlOx の深さ分布分析 伊東駿也, 尾崎優貴, 中村貴宏, 中川勝 第19回東北大学多元物質科学研究所研究発表会 2019/12/12 室温動作単電子トランジスタに向けた表面修飾白金−金合金ナノ粒子の作製 中村貴宏, 黒田陸斗, 中川勝 第19回東北大学多元物質科学研究所研究発表会 2019/12/12 1-ヘキサンチオールを用いた相間移動法による金−白金合金ナノ粒子の表面修飾 中村貴宏, 黒田陸斗, 中川勝 高分子・ハイブリッド材料研究センター 2019 PHyM シンポジウム 2019/11/12 光ナノインプリントにおける蛍光アライメントに向けた和の角度モアレ縞の観察 吉田拓真, 伊東駿也, 中村貴宏, 中川勝 高分子・ハイブリッド材料研究センター 2019 PHyM シンポジウム 2019/11/12 Fluidic behavior of photopolymerizable monomers between silica surfaces related to single-digit-nanometer UV nanoimprinting International-presentation Shunya Ito, Motohiro Kasuya, Kazue Kurihara, Masaru Nakagawa Tohoku-Melbourne Joint Workshop 2019/11/09 Nanometer-resolved fluidity of diacrylate monomers between unmodified and modified silica surfaces for single-digit-nanometer UV nanoimprinting International-presentation Shunya Ito, Motohiro Kasuya, Kazue Kurihara, Masaru Nakagawa OKINAWA COLLOIDS 2019 2019/11/03 Resonance Shear Measurement of Diacrylate Monomers Confined between Silica Surfaces for UV Nanoimprinting International-presentation Shunya Ito, Motohiro Kasuya, Kazue Kurihara, Masaru Nakagawa OKINAWA Colloids 2019 Pre-Workshop -5th International Mini-Symposium on Surface Forces- 2019/11/01 Investigation of Additive-Type Fluorescence Moire Fringes for Imprint Alignment by Image Drawing Software International-presentation Masaru Nakagawa, Kazue Suto 32nd International Microprocesses and Nanotechnology Conference (MNC2019) 2019/10/28 Chemical Registration to Prepare Defined-Shape UV-Cured Films in Print-and-Imprint Method International-presentation Masaru Nakagawa, Kento Ochiai, Akiko Onuma, Kazue Suto, Takahiro Nakamura, Shunya Ito 32nd International Microprocesses and Nanotechnology Conference (MNC2019) 2019/10/28 Elemental depth profiles of sequential infiltration synthesis-treated resist thin films analyzed by time-of-flight secondary ion mass spectrometry International-presentation Shunya Ito, Yuki Ozaki, Takahiro Nakamura, Masaru Nakagawa 32nd International Microprocesses and Nanotechnology Conference (MNC2019) 2019/10/28 Angles of Additive-type Inclination Moire Fringes for Fluorescence Imprint Alignment International-presentation Takuma Yoshida, Shunya Ito, Takahiro Nakamura, Masaru Nakagawa 32nd International Microprocesses and Nanotechnology Conference (MNC2019) 2019/10/28 Phase transfer protocol for Au-Pt alloy nanoparticles fabricated by laser induced nucleation International-presentation Rikuto Kuroda, Takahiro Nakamura, Masaru Nakagawa The 13th Pacific Rim Conference of Ceramic Societies (PACRIM13) 2019/10/28 Phase Transfer Protocol Behaviors of Water-Dispersed Au-Pt Alloy Nanoparticles into Toluene with 1-Hexanethiol International-presentation Rikuto Kuroda, Takahiro Nakamura, Masaru Nakagawa The 13th Pacific Rim Conference of Ceramic Societies (PACRIM13) 2019/10/27 Control of Sub-50 nm Thickness of UV-Cured Thin Films by Print-and-Imprint Method International-presentation Masaru Nakagawa, Kento Ochiai, Akiko Onuma, Kazue Suto, Takahiro Nakamura, Shunya Ito the 18th International Conference on Nanoimprint and Nanoprint Technologies (NNT2019) 2019/10/14 Silica Nanoparticles-Containing Replica Resin Molds for Step-and-Repeat UV Nanoimprinting International-presentation Shunya Ito, Takahiro Nakamura, Masaru Nakagawa the 18th International Conference on Nanoimprint and Nanoprint Technologies (NNT2019) 2019/10/14 Observation of Fluorescence Inclination Moire Fringes for Imprint Alignment International-presentation Takuma Yoshida, Shunya Ito, Takahiro Nakamura, Masaru Nakagawa the 18th International Conference on Nanoimprint and Nanoprint Technologies (NNT2019) 2019/10/14 Investigation of Multiplicative-type Moire Fringes for Imprint Alignment by Image Drawing Software International-presentation Takuma Yoshida, Shunya Ito, Takahiro Nakamura, Masaru Nakagawa Tohoku University&＃39;s Chemistry Summer School 2019 2019/08/27 Laser-Induced Forward Transfer of 1-dimentional Cr Structures by Shaped Femtosecond Laser Pulses International-presentation Yusuke Isawa, Takahiro Nakamura, Masaru Nakagawa Tohoku University&＃39;s Chemistry Summer School 2019 2019/08/27 レーザー誘起前方転写法による二次元Crマイクロ構造の形成 井澤 優佑, 中村 貴宏, 中川 勝 第47回東北地区高分子若手研究会夏季ゼミナール 2019/07/12 蛍光液体パターンから生じる和のモアレ縞の角度依存性 吉田拓真, 伊東駿也, 中村貴宏, 中川勝 第47回東北地区高分子若手研究会夏季ゼミナール 2019/07/12 Influence of Rotation Center on Inclination Moire Fringes International-presentation Takuma Yoshida, Shunya Ito, Takahiro Nakamura, Masaru Nakagawa 2019/07/04 Laser-Induced Forward Transfer from Cr Thin Films Depending on Applied Laser Pulses International-presentation Yusuke Isawa, Takahiro Nakamura, Masaru Nakagawa 2019/07/04 Surface Modification of Au and Au-Pt Alloy Nanoparticles with different Compositions International-presentation Rikuto Kuroda, Takahiro Nakamura, Masaru Nakagawa 2019/07/04 Fluidity of Photopolymerizable Monomers in Unmodified and Modified Silica Nano-Gaps for Single-Digit-Nanometer UV Nanoimprinting International-presentation Invited Shunya Ito, Masaru Nakagawa the 10th International Symposium on Integrated Molecules and Materials Engineering (IMSE) 2019/07/04 Organic/Inorganic Hybridization of Photopolymerized Resin Films through Different Sequential Chemical Vapor Modifications International-presentation Invited Shunya Ito, Yuki, Ozaki, Takahiro Nakamura, Masaru Nakagawa the 10th International Symposium on Integrated Molecules and Materials Engineering (IMSE) 2019/07/04 AFM Topographic Analyses of Positive-Tone EB Resist Lines Treated with Sequential Infiltration Synthesis and Solvent Annealing International-presentation Shunya Ito, Yuki Ozaki, Takahiro Nakamura, Masaru Nakagawa the 26th Symposium on Photomask and Next Generation Lithography Mask Technology (Photomask Japan 2019) (PMJ2019) 2019/04/17 相関移動法を用いた金属・合金ナノ粒子の表面修飾における組成と修飾剤との関係 黒田陸斗, 中村貴宏, 中川勝 日本金属学会2019年春期(第164回)講演大会 2019/03/21 Characteristics of metal and alloy nanoparticles fabricated by laser-induced nucleation Invited 黒田陸斗, 中村貴宏, 中川勝 日本化学会第99回春季年会 2019/03/16 光学メタマテリアルの量産複製を目指したナノインプリント技術 Invited 中川勝 18-6 ポリマーフロンティア21 2019/03/11 力学高強度な複製モールドを目指した有機−無機ハイブリッド材料の開発 伊東駿也, 中村貴宏, 中川勝 第66回応用物理学会春季学術講演会 2019/03/09 Observation of Fluorescence Inclination Moire Fringes Generated from Fluorescent Liquid between Mold and Substrate 吉田拓真, 落合研斗, 大沼晶子, 須藤和恵, 伊東駿也, 中村貴宏, 中川勝 第66回応用物理学会春季学術講演会 2019/03/09 レーザー誘起核生成法による合金ナノ粒子作製と表面修飾 黒田陸斗, 中村貴宏, 中川勝 マテリアル・ファブリケーション・デザインセミナー 同時開催：日本セラミックス協会第7回MFD研究会 2019/03/05 ナノインプリント技術の現状と展望 Invited 中川勝 マテリアル・ファブリケーション・デザインセミナー 同時開催：日本セラミックス協会第7回MFD研究会 2019/03/04 ナノインプリント技術における新しい材料とプロセスの創製 Invited 中川勝 信州大学 化学・材料学科 セミナー 2019/02/22 ナノインプリント技術で見えてきた有機分子・高分子薄膜の表面・界面現象 Invited 中川勝 高分子学会東北支部講演会 2018/12/18 レーザ誘起核生成法により作製した金属及び合ナノ粒子の表面修飾 黒田陸斗, 中村貴宏, 中川勝 第18回東北大学多元物質科学研究所研究発表会 2018/12/13 蛍光アライメントに向けた 液体の位置選択的成形のための表面修飾 落合研斗, 伊東駿也, 中村貴宏, 中川勝 第18回東北大学多元物質科学研究所研究発表会 2018/12/13 ナノインプリントによる一桁ナノ造形 Invited 中川勝 2018年度日本表面真空学会学術講演会 2018/11/21 蛍光顕微鏡観察による位置選択的吸着分子膜表面修飾の評価 落合研斗, 伊東駿也, 中村貴宏, 中川勝 2018 年度高分子・ハイブリッド材料研究センター（PHyM）若手フォーラム 2018/11/19 ポジ型電子線レジストの各プロセスにおける分子レベルでの考察 尾崎優貴, 伊東駿也, 中村貴宏, 中川勝 2018 年度高分子・ハイブリッド材料研究センター（PHyM）若手フォーラム 2018/11/19 Surface modification of polyimide laser-drilled screen-printing masks forlow-viscosity liquids in print-and-imprint method International-presentation Takahiro Nakamura, Narumi Endo, Masaru Nakagawa 31th International Microprocesses and Nanotechnology Conference(MNC 2018) 2018/11/16 Morphological changes in positive-tone EB resist patterns induced by sequential infiltration synthesis and solvent annealing International-presentation Yuki Ozaki, Shunya Ito, Takahiro Nakamura, Masaru Nakagawa 31th International Microprocesses and Nanotechnology Conference(MNC 2018) 2018/11/16 Depth profiles of fluorescent dyes in UV-cured resin films evaluated by evanescent wave-induced fluorescence microscopy International-presentation Shunya Ito, Kento Ochiai, Masaru Nakagawa, Trevor A. Smith Melbourne-Tohoku Workshop 2018 2018/11/09 Filling behavior of diacrylate monomers into silica holes of around 10 nm in UV nanoimprinting International-presentation Shunya Ito, Motohiro Kasuya, Kazue Kurihara, Masaru Nakagawa MNE2018 2018/09/25 Print-and-imprint法におけるレーザー加工孔版印刷での低粘度化 中村貴宏, 遠藤功望, 中川勝 第67回高分子討論会 2018/09/12 トリメチルアルミニウムを用いた3種類の化学気相反応法による光硬化レジストの有機−無機ハイブリッド化の膜厚方向の化学組成解析 伊東駿也, 上原卓也, 尾崎優貴, 中村貴宏, 中川勝 第67回高分子討論会 2018/09/12 Preparation of Au and its Alloy Nanoparticles soluble in Toluene with a Mercapt-Containing Surfactant International-presentation Rikuto Kuroda, Takahiro Nakamura, Masaru Nakagawa Tohoku University&＃39;s Chemistry Summer School 2018 2018/08/27 Preparation of surface-modified metal and alloy nanoparticles by phase transfer protocol International-presentation Rikuto Kuroda, Takahiro Nakamura, Masaru Nakagawa 第5回ケースウエスタンリザーブ大学・東北大学共同シンポジウム 2018/08/03 ナノインプリントで一桁ナノ造形に挑む Invited 中川勝 2018年度第1回極限ナノ造形・構造物性研究会講演会 2018/07/30 Preparation of Au and its Alloy Nanoparticles soluble in Toluene with a Mercapt-Containing Surfactant Rikuto Kuroda, Takahiro Nakamura, Masaru Nakagawa 第46回東北地区高分子若手研究会夏季ゼミナール 2018/07/06 ナノインプリントによる高分子材料の一桁ナノ造形への挑戦 Shunya Ito, Takahiro Nakamura, Masaru Nakagawa 第46回東北地区高分子若手研究会夏季ゼミナール 2018/07/06 Organic/inorganic hybridization of NIL resit materials Invited 中川勝 次世代リソグラフィ(NGL)ワークショップ2018 2018/07/05 重合性液体のシリカナノ空間中での流動性と一桁ナノ造形 伊東駿也, 粕谷素洋, 栗原和枝, 中川勝 第4回東北大学若手研究者アンサンブルワークショップ 2018/07/04 反応性無機前駆体ガスの浸透を利用した光ナノインプリントレジスト材料の改質 上原卓也, 尾崎優貴, 伊東駿也, 廣芝伸哉, 中村貴宏, 中川勝 第8回物質・デバイス領域共同研究拠点活動報告会及び平成29年度ダイナミック・アライアンス成果報告会 2018/06/29 光ナノインプリントによる一桁nm造形に向けた重合性モノマーの粘度増加の理解 伊東駿也, 粕谷素洋, 栗原和枝, 中川勝 高分子・ハイブリッド材料研究センター 2018 PHyMシンポジウム 2018/06/19 レーザー誘起核生成法による全率固溶合金ナノ粒子合成とその表面修飾 中村貴宏, 黒田陸斗, 中川勝 高分子・ハイブリッド材料研究センター 2018 PHyMシンポジウム 2018/06/19 ナノインプリントで一桁ナノ造形に挑む 中川勝 高分子・ハイブリッド材料研究センター 2018 PHyMシンポジウム 2018/06/19 Surface Modification of Metal and Alloy Nanoparticles Fabricated by Laser-Induced Nucleation in Liquid International-presentation Rikuto Kuroda, Takahiro Nakamura, Masaru Nakagawa 5th international conference on advanced nanoparticle generation & excitation by lasers in liquids(ANGEL 2018) 2018/06/04 Fluidity of an oleophilic monomer in nano-gap between reactive adhesive monolayers for UV nanoimprinting International-presentation Invited Shunya Ito, Motohiro Kasuya, Kazue Kurihara, Masaru Nakagawa The 62st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication(EIPBN2018) 2018/05/30 Improved etching resistance of UV-cured films with/without hydroxy groups by organic/inorganic hybridization through sequential infiltration synthesis and sequential vapor infiltration International-presentation Invited Takuya Uehara, Yuki Ozaki, Shunya Ito, Nobuya Hiroshiba, Takahiro Nakamura, Masaru Nakagawa The 62st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication(EIPBN2018) 2018/05/30 Photo-induced voltage in Al-based plasmonic crystal slabs with asymmetric unit cell K. Iwata, H. Yano, M. Matsubara, M. Nakagawa, T. Ishihara 日本物理学会第73回年次大会(2018年) 2018/03/22 Nanometer-Resolved Fluidity of an Oleophilic Monomer between Silica Surfaces Modified with a Reactive Adhesive Layer 伊東駿也, 粕谷素洋, 栗原和枝, 中川勝 第65回応用物理学会春季学術講演会 2018/03/20 UV nanoimprint lithography involving a lift-off process for fabrication of Au split-ring nano-resonator arrays 上原卓也, Calafiore Giuseppe, Dhuey Scott, Cabrini Stefano, 中川勝 第65回応用物理学会春季学術講演会 2018/03/20 UV nanoimprint lithography based on area-selective atomic layer deposition 上原卓也, 尾崎優貴, 廣芝伸哉, 中村貴宏, 中川勝 第65回応用物理学会春季学術講演会 2018/03/20 Comparison of organic/inorganic hybridization of UV-cured resin films between exposure methods of an inorganic precursor 上原卓也, 尾崎優貴, 廣芝伸哉, 中村貴宏, 中川勝 第65回応用物理学会春季学術講演会 2018/03/20 Investigation of a lift-off process in UV nanoimprint technology for copying of a thin-film-type aluminum power source showing photo-induced voltage 矢野春菜, 中川勝 第65回応用物理学会春季学術講演会 2018/03/20 Photo-induced voltage and configuration of periodical triangle hole arrays in an aluminum thin film 矢野春菜, 岩田健吾, 石原照也, 中川勝 第65回応用物理学会春季学術講演会 2018/03/20 Surface Segregation of Fluorescent Dyes in Thin Films of Nanoimprintable UV-Cured Resins Studied by Evanescent Wave-Induced Fluorescence Microscopy and Spectroscopy International-presentation Shunya Ito, Hamid Soleimaninejad, Motohiro Kasuya, Masaru Nakagawa, Trevor A. Smith International workshop on Mineral processing and Metallurgy 2018 2018/03/02 Next-generation nanoimprint lithography for fabrication of micro/nano structure devices International-presentation Takahiro Nakamura, Nobuya Hiroshiba, Masaru Nakagawa 指定国立大学キックオフ国際ワークショップ 2018/02/19 ナノインプリント技術における表面・材料・プロセスの科学 Invited 中川勝 ASTEC2018第13回表面技術展・会議 〜見る・積む・削る ナノレベルからの表面処理〜 2018/02/14 レーザー加工孔版印刷におけるポリイミドの表面修飾の効果 遠藤功望, 中村貴宏, 中川勝 2017 年度高分子・ハイブリッド材料研究センター（PHyM）若手フォーラム 2017/12/11 温度の異なるグリセリン溶液中への高強度レーザー照射による金ナノ粒子合成 黒田陸斗, 中村貴宏, 中川勝 2017 年度高分子・ハイブリッド材料研究センター（PHyM）若手フォーラム 2017/12/11 スクリーン印刷用孔版の作製のためのエンジニアリングプラスチックフィルムへのパルスレーザー穴あけ加工 中村貴宏, 関健斗, 永瀬和郎, 中川勝 第27回日本MRS年次大会 2017/12/05 グリセリン中への高強度レーザー照射による金ナノ粒子の作製 黒田陸斗, 中村貴宏, 中川勝 第27回日本MRS年次大会 2017/12/05 アルミニウム薄膜への三角形、正方形、円形の貫通孔配列体の作製とそれらの可視光誘起起電力 矢野春菜, 岩田健吾, 石原照也, 中川勝 第17回東北大学多元物質科学研究所研究発表会 2017/12/04 ナノインプリントリソグラフィによる極限ナノ造形 界面科学から界面分子科学へ Invited 中川勝 日本化学会コロイドおよび界面化学部会 コロイド先端技術講座II 第6回E-Colloid:先端エレクトロニクスのためのコロイド・界面化学「次世代エレクトロニクスを拓くコロイド界面」 2017/12/01 ケイ素含有アクリレートモノマーの合成と光ナノインプリントリソグラフィでのレジスト特性 坂井彩華, 町田和彦, 伊東駿也, 熊谷真莉, 中川勝, 根本修克 2017高分子学会東北支部研究発表会 2017/11/09 Print and imprint methods using laser-drilled polyimide through-hole masks for fabrication of gold microelectrodes International-presentation Invited Takahiro Nakamura, Kento Seki, Shinya Sato, Mari Kumagai, Masaru Nakagawa The 16th International Conference on Nanoimprint and Nanoprint Technology (NNT 2017) 2017/11/08 Increase in viscosity of a low-viscosity monomer in nano-gap between silica surfaces related to UV nanoimprinting International-presentation Shunya Ito, Motohiro Kasuya, Kazue Kurihara, Masaru Nakagawa The 16th International Conference on Nanoimprint and Nanoprint Technology (NNT 2017) 2017/11/08 Infiltration behaviors of AlOx into positive-tone electron beam resists by sequential infiltration synthesis International-presentation Yuki Ozaki, Shunya Ito, Nobuya Hiroshiba, Takahiro Nakamura, Masaru Nakagawa The 30th International Microprocesses and Nanotechnology Conference (MNC 2017) 2017/11/06 Development of UV-curable liquid for in-liquid fluorescence alignment in ultraviolet nanoimprint lithography International-presentation Kento Ochiai, Mari Kumagai, Eri Kikuchi, Takahiro Nakamura, Masaru Nakagawa The 30th International Microprocesses and Nanotechnology Conference (MNC 2017) 2017/11/06 Fabrication of Au split-ring resonator arrays by reverse-tone lithography using a print-and-imprint method International-presentation Takuya Uehara, Shinya Sato, Shunya Ito, Haruna Yano, Takahiro Nakamura, Masaru Nakagawa The 30th International Microprocesses and Nanotechnology Conference (MNC 2017) 2017/11/06 ナノパターニング 〜分子の理解が必須な界面分子科学の世界に突入〜 Invited 中川勝 日本化学会秋季事業 第7回CSJ化学フェスタ2017 2017/10/18 O2 RIE耐性に優れたケイ素含有光硬化性有機材料の合成およびリバーストーンプロセスへの応用 坂井彩華, 町田和彦, 伊東駿也, 熊谷真莉, 中川勝, 根本修克 第66回高分子討論会 2017/09/20 光ナノインプリントでの液中蛍光アライメントに向けた蛍光色素の選定 落合研斗, 熊谷真莉, 菊地英里, 中村貴宏, 中川勝 第66回高分子討論会 2017/09/20 逐次浸透合成によるポジ型電子線レジストの有機−無機ハイブリッド化 尾崎優貴, 伊東駿也, 廣芝伸哉, 中村貴宏, 中川勝 第66回高分子討論会 2017/09/20 表面力・共振ずり測定による低粘度ジアクリレートモノマーのシリカ表面間のナノギャップでの流動性 伊東駿也, 粕谷素洋, 栗原和枝, 中川勝 第66回高分子討論会 2017/09/20 マクロ技術とナノ技術を融合したprint and imprint法 Invited 中村貴宏, 中川勝 公益社団法人日本セラミックス協会第30回秋季シンポジウム 2017/09/19 Photocuring behavior of fluorescent UV-curable liquid Kento Ochiai, Eri Kikuchi, Takahiro Nakamura, Masaru Nakagawa Tohoku University&＃39;s Chemistry Summer School 2017 2017/08/21 Enhanced etching durability of positive-tone electron beam resists by sequential infiltration synthesis Yuki Ozaki, Shunya Ito, Nobuya Hiroshiba, Takahiro Nakamura, Masaru Nakagawa Tohoku University&＃39;s Chemistry Summer School 2017 2017/08/21 Print and Imprint Method for Fabricating Gold Microelectrodes International-presentation Takahiro Nakamura, Masaru Nakagawa 21st International Symposium on Advanced Display Materials & Devices (ADMD 2017) 2017/07/24 光ナノインプリントにおける in-liquid 状態での蛍光アライメント Invited 菊地英里, 石戸洋太, 松原信也, 中村貴宏, 阿部誠之, 中川勝 次世代リソグラフィ(NGL)ワークショップ2017 2017/07/18 More details Close ポスター（招待） サブ 15nm 光ナノインプリント成形における界面分子科学 Invited 伊東駿也, 粕谷素洋, 川崎健司, 鷲谷隆太, 島崎譲, 宮内昭浩, 栗原和枝, 中川勝 次世代リソグラフィ(NGL)ワークショップ2017 2017/07/18 More details Close ポスター（招待） ナノインプリントアライメントにおける蛍光モアレの理論と実測 菊地英里, 石戸洋太, 松原信也, 中村貴宏, 阿部誠之, 中川勝 高分子・ハイブリッド材料研究センター 2017 PHyMシンポジウム 2017/06/16 低粘度モノマーを介したシリカ表面間に生じる表面力の再現性 伊東駿也, 粕谷素洋, 栗原和枝, 中川勝 高分子・ハイブリッド材料研究センター 2017 PHyMシンポジウム 2017/06/16 Reproducible surface forces between VUV-exposed silica surfaces in a moisture-sensitive oleophilic diacrylate monomer liquid International-presentation Shunya Ito, Motohiro Kasuya, Kazue Kurihara, Masaru Nakagawa The 61st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication(EIPBN2017) 2017/05/30 Fabrication of Polyimide Screen Masks with Through Holes by Laser Drilling for Print and Imprint Method International-presentation Takahiro Nakamura, Kento Seki, Shinya Sato, Mari Kumagai, Masaru Nakagawa, Kazuro Nagase The 61st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication(EIPBN2017) 2017/05/30 In-liquid alignment detection by fluorescence moire fringes for print and imprint method International-presentation Eri Kikuchi, Yota Ishito, Shinya Matsubara, Takahiro Nakamura, Masayuki Abe, Masaru Nakagawa The 61st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication(EIPBN2017) 2017/05/30 Print and Imprint method for Nanoimprint lithography with high-viscosity photo-curable resins International-presentation Invited Takahiro Nakamura, Masaru Nakagawa 2017 International Conference on Electronics Packaging (ICEP2017) 2017/04/21 サブ波長三角孔を配列したAl薄膜の光誘起横起電力 岩田健吾, 矢野春菜, 松原正和, 中川勝, 石原照也 日本物理学会 第72回年次大会（2017年） 2017/03/17 Print and Imprint法によるマイクロ電極作製に向けた残膜厚均一化の検討 関健斗, 中村貴宏, 佐藤慎弥, 熊谷真莉, 永瀬和郎, 中川勝 第64回応用物理学会春季学術講演会 2017/03/14 シングルナノパターニングに向けた界面分子科学からのアプローチ 伊東駿也, 中川勝 第64回応用物理学会春季学術講演会 2017/03/14 ナノトレンチへの埋め込みによる可溶性導電性高分子ナノワイヤの作製と評価 畔柳志帆, 宮崎孝道, Heo Shinae, 杉安和憲, 中川勝, 若山裕 第64回応用物理学会春季学術講演会 2017/03/14 インプリントアライメントに向けた蛍光モアレの観察 菊地英里, 石戸洋太, 松原信也, 中村貴宏, 阿部誠之, 中川勝 第64回応用物理学会春季学術講演会 2017/03/14 Print and Imprint法に向けたピコ秒パルスレーザーによる異なるエンジニアリングプラスチックフィルムへの貫通孔の形成加工 関健斗, 中村貴宏, 永瀬和郎, 中川勝 第64回応用物理学会春季学術講演会 2017/03/14 逐次浸透合成によるポジ型電子線レジストのドライエッチング速度の低下挙動 尾?優貴, 伊東駿也, 廣芝伸哉, 中村貴宏, 中川勝 2016年度高分子・ハイブリッド材料研究センター（PHyM）若手フォーラム 2017/02/27 シングルナノ造形にむけた研究 落合研斗, 菊地英里, 中村貴宏, 中川勝 2016年度高分子・ハイブリッド材料研究センター（PHyM）若手フォーラム 2017/02/27 シングルナノ造形にむけた研究 Invited 中川勝, 伊藤駿也 2017年第1回ナノインプリント技術研究会 2017/02/17 レーザ加工を活用したPrint and Imprint法 Invited 中村貴宏, 関健斗, 中川勝 第86回レーザ加工学会講演会 2016/12/12 Specific dry etching behavior of 10 nm-diameter holes of resist patterns in electron beam lithography Eri Kikuchi, Shunya Ito, Masaru Nakagawa 第16回東北大学多元物質科学研究所研究発表会 2016/12/07 Print and imprint for nanofabrication International-presentation Takahiro Nakamura, Kento Seki, Masaru Nakagawa 2nd International Conference on Photoalignment & Photopatterning in Soft Materials (PhoSM)2016 2016/11/24 Photo-induced reorientation of mesogens of nematic liquid International-presentation Mari Kumagai, Shoishi Kubo, Nobuhiro Kawatsuki, Masaru Nakagawa 2nd International Conference on Photoalignment & Photopatterning in Soft Materials (PhoSM)2016 2016/11/24 Unidirectional orientation of nanostructures comprising nematic liquid crystalline polymers International-presentation Shoishi Kubo, Masaru Nakagawa 2nd International Conference on Photoalignment & Photopatterning in Soft Materials (PhoSM)2016 2016/11/24 Dependence of film thickness on surface elasticity and acrylate consumption in UV-cured thin films on Au surfaces International-presentation Haruna Yano, Xiaobin Liang, Shoichi Kubo, Nobuko Fukuda, Hirobumi Ushijima, Ken Nakajima, Masaru Nakagawa 29th International Microprocesses and Nanotechnology Conference(MNC 2016) 2016/11/08 PMMA-selective organic-inorganic hybridization using cylindrically micro-phase separated PS-block-PMMA International-presentation Nobuya Hiroshiba, Masaru Nakagawa 29th International Microprocesses and Nanotechnology Conference(MNC 2016) 2016/11/08 Nanoimprinting silica templates with Micro-, Sub-20-nm, and 7-nm patterns fabricated by electron beam lithography International-presentation Shunya Ito, Eri Kikuchi, Masahiko Watanabe, Yoshinari Sugiyama, Masaru Nakagawa 29th International Microprocesses and Nanotechnology Conference(MNC 2016) 2016/11/08 Growth of aluminum oxide on and in imprinted resin patterns by an atomic layer deposition technique International-presentation Nobuya Hiroshiba, Shiho Kuroyanagi, Masaru Nakagawa 29th International Microprocesses and Nanotechnology Conference(MNC 2016) 2016/11/08 Etching durability enhanced with silane-containing additives in UV nanoimprint lithography International-presentation Shunya Ito, Masaru Nakagawa The 9th Integrated Molecular / Materials 2016/10/13 Screen printing of curable resins for UV nanoimprint lithography International-presentation Invited Takahiro Nakamura, Kento Seki, Masaru Nakagawa The 9th Integrated Molecular / Materials 2016/10/13 Visualization of microgels formed in UV-cured thin films by AFM International-presentation Invited Haruna Yano, Masaru Nakagawa The 9th Integrated Molecular / Materials 2016/10/13 Plasmonic nanostructures with 20 nm gaps fabricated by UV?NIL and lift?off processes International-presentation Takuya Uehara, Calafiore Giuseppe, Scott Dhuey, Alexander Koshelev, Keiko Munechika, Simone Sassolini, Stefano Cabrini, Masaru Nakagawa The 15th International Conference on 2016/09/26 UV nanoimprint lithography and lift-off processes for fabricating split-ring resonators with 20 nm gaps International-presentation Takuya Uehara, Giuseppe Calafiore, Scott Dhuey, Alexander Koshelev, Keiko Munechica, Simone Sassolini, Stefano Cabrini, Masaru Nakagawa 42nd Micro and Nano Engineering 2016（MNE2016) 2016/09/19 ケイ素含有アクリレートモノマーの合成と光硬化薄膜のO2 RIE耐性 坂井彩華, 佐藤寛紀, 伊東駿也, 中川勝, 根本修克 第65回高分子討論会 2016/09/14 非対称ユニットセルをもつアルミニウムメタマテリアルの光整流効果 岩田健吾, 矢野春菜, 富樫拓也, 松原正和, 中川勝, 石原照也 日本物理学会 2016年秋季大会 2016/09/13 Mapping images of surface elasticity observed for UV-cured resin films by atomic force microscopy Haruna Yano, Shoichi Kubo, Ken Nakajima, Masaru Nakagawa Tohoku University&＃39;s Chemistry Summer School 2016 2016/08/18 Photo-induced reorientation of mesogens in 30-nm-thick films of nematic crustalline polymers by photo-Fries rearrangement Mari Kumagai, Sho Kobayashi, Kubo Shoichi, Masaru Nakagawa Tohoku University&＃39;s Chemistry Summer School 2016 2016/08/18 Directed self-assembly of polystyrene-block-poly(methyl methacrylate) in resin trenches fabricated using UV nanoimprinting Tetsuhisa Kanahara, Ryo Okubo, Nobuya Hiroshiba, Masaru Nakagawa Tohoku University&＃39;s Chemistry Summer School 2016 2016/08/18 界面での光Fries転移型ネマチック液晶高分子の光配向 熊谷真莉, 中川勝 第44回東北地区高分子若手研究会夏季ゼミナール 2016/08/09 ビスフェノール含有光硬化性樹指を用いた光 ナノインプリントリソグラフィによる熱酸化SiO2 膜の加工 畔柳志帆, 中川勝, 若山裕 第44回東北地区高分子若手研究会夏季ゼミナール 2016/08/09 Nanoscale surface elasticity of photo-cured thin films for UV nanoimprint lithography International-presentation Haruna Yano, Shoichi Kubo, Ken Nakajima, Masaru Nakagawa The 3rd CWRU-Tohoku Joint workshop 2016/08/09 Material and Processing Science in Nanoimprint Lithography International-presentation Masaru Nakagawa, Nobuya Hiroshiba, Takahiro Nakamura The 3rd CWRU-Tohoku Joint workshop 2016/08/09 Photo-functional Material Chemistry leading to Nanoimprint Lithography International-presentation Masaru Nakagawa, Nobuya Hiroshiba, Takahiro Nakamura The 3rd CWRU-Tohoku Joint workshop 2016/08/09 ピコ秒パルスレーザー穴あけ加工によるポリイミド孔版の作製と光硬化性液体の位置選択的塗布 International-presentation 中村貴宏, 関健斗, 永瀬和郎, 中川勝 応用物理学会次世代リソグラフィ（NGL）技術研究会ワークショップ2016 2016/07/07 光硬化樹脂薄膜の表面弾性率マッピング像における膜厚依存性に関する考察 International-presentation 矢野春菜, 久保祥一, 中川勝, 梁暁斌, 藤波想, 中嶋健 応用物理学会次世代リソグラフィ（NGL）技術研究会ワークショップ2016 2016/07/07 Fabrication of split-ring resonator arrays with 20-nm-wide gaps fabricated by UV nanoimprint lithography International-presentation Takuya Uehara, Giuseppe Calafiore, Scott Dhuey, Alexander Koshelev, Keiko Munechica, Simone Sassolini, Stefano Cabrini, Masaru Nakagawa The First A3 Metamaterials Forum(A3MMF) 2016/07/05 Monitoring thermally induced cylindrical microphase separation of polystyrene-block-poly(methyl methacrylate) by atomic force microscopy International-presentation Nobuya Hiroshiba, Ryo Okubo, Azusa N. Hattori, Hidekazu Tanaka, Masaru Nakagawa The 33rd International Conference of Photopolymer Science and Technology 2016/06/22 Anisotropic oxygen reactive ion etching for removing a residual layer of 45-nm-linewidth imprint patterns International-presentation Takuya Uehara, Shoichi Kubo, Nobuya Hiroshiba, Masaru Nakagawa The 33rd International Conference of Photopolymer Science and Technology 2016/06/22 ナノインプリントリソグラフィの総合科学技術を目指して 中川勝 高分子・ハイブリッド材料研究センター2016PHyMシンポジウム 2016/06/15 高粘性光硬化性組成物の精密配置に向けたポリイミド孔版の作製 関健斗, 中村貴宏, 中川勝 高分子・ハイブリッド材料研究センター2016PHyMシンポジウム 2016/06/15 光硬化樹脂薄膜のレジスト機能のナノスケールでの均一性に関する研究 矢野春菜, 久保祥一, 中嶋健, 中川勝 高分子・ハイブリッド材料研究センター2016PHyMシンポジウム 2016/06/15 Viscosity range of UV-curable resins usable in screen printing with polyimide through-hole membrane masks for sub-100 nm-wide imprint patterns International-presentation Invited Takuya Uehara, Akiko Onuma, Akira Tanabe, Hiroaki Ikedo, Kazuro Nagase, Nobuya Hiroshiba, Takahiro Nakamura, Masaru Nakagawa The 60th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication(EIPBN 2016) 2016/05/31 膜厚サブ50 nmのネマチック液晶高分子薄膜での光Fries転位によるメソゲンの光配向挙動 熊谷真莉, 久保祥一, 川月喜弘, 中川勝 第65回高分子学会年次大会 2016/05/25 超短パルスレーザー穴あけ加工によるナノインプリント技術に資する光硬化性液滴の精密配置用孔版の作製 中村貴宏, 関健斗, 永瀬和郎, 中川勝 第65回高分子学会年次大会 2016/05/25 光ナノインプリントリソグラフィでの量産離型に向けた光硬化性樹脂の開発と誘導自己組織化への展開 中川勝, 廣芝伸哉, 服部梓, 田中秀和 物質・デバイス領域共同研究拠点 平成27年度成果報告会 2016/05/17 小分子ナノインプリントレジストへ向けた三脚型トリプチセン分子集積膜のエッチング特性 福島孝典, 松谷晃宏, 石割文崇, 庄子良晃, 上原卓也, 中川勝 物質・デバイス領域共同研究拠点キックオフシンポジウム及び活動報告会 2016/04/26 フェムト秒パルスレーザーを用いて作製したポリイミド孔版のホール形状と光硬化性液体の吐出量の関係 田辺明, 大町弘毅, 中村貴宏, 佐藤俊一, 中川勝 第63回 応用物理学会春季学術講演会 2016/03/19 PS-block-PMMAの選択的有機-無機ハイブリッド化 〜Semi-static mode とcontinuous flow modeでの比較〜 廣芝伸哉, 中川勝 第63回 応用物理学会春季学術講演会 2016/03/19 光ナノインプリント法により作製したsub-100 nm樹脂ガイドのトレンチ内でのpolystyrene-block-poly(methyl methacrylate)の誘導自己組織化 金原徹尚, 大窪諒, 廣芝伸哉, 中川勝 第63回 応用物理学会春季学術講演会 2016/03/19 原子間力顕微鏡で観察される膜厚sub-100 nmでの光硬化樹脂薄膜における表面弾性率の膜厚依存性 矢野 春菜, 久保祥一, 中川勝, 藤浪想, 中嶋健 第63回 応用物理学会春季学術講演会 2016/03/19 Fabrication of through-hole membranes by laser drilling for discharging UV-curable liquids in UV nanoimprint lithography 関健斗, 永瀬和郎, 中村貴宏, 廣芝伸哉, 中川勝, 中村貴宏 第63回 応用物理学会春季学術講演会 2016/03/19 光を利用した界面機能分子制御材料の開発 Invited 中川勝 ポリマーフロンティア21講演会 2016/03/10 光Fries転位型ネマチック液晶共重合体の合成と薄膜での光配向挙動 熊谷真莉, 久保祥一, 川月喜弘, 中川勝 高分子・ハイブリッド材料研究センター 2015 若手フォーラム 2016/03/04 光ナノインプリント樹脂ガイドでのポリスチレン-ポリメタクリル酸メチルブロック共重合体の誘導自己組織化 金原徹尚, 大窪諒, 廣芝伸哉, 中川勝 高分子・ハイブリッド材料研究センター 2015 若手フォーラム 2016/03/04 ナノインプリントリソグラフィの総合科学技術の創出に向けて Invited 中川勝 高分子学会有機エレクトロニクス研究会 2016/01/21 ナノインプリントリソグラフィの現状と界面機能分子制御 Invited 中川勝 第25回光反応・電子用材料研究会講座 2016/01/20 ナノインプリントリソグラフィにおけるSub-20nmでの課題 Invited 中川勝 第6回リソグラフィ将来技術調査専門委員会 2016/01/15 スクリーン印刷 − 光ナノインプリントリソグラフィ法の開発 田辺明, 上原卓也, 永瀬和郎, 池戸裕明, 廣芝伸哉, 中村貴宏, 中川勝 第15回 東北大学多元物質科学研究所 研究発表会 2015/12/22 キラルネマチック相の発現を目指した単峰性ランダム共重合体の合成と物性 袖村巧, 久保祥一, 樋口博紀, 菊池裕嗣, 中川勝 第15回 東北大学多元物質科学研究所 研究発表会 2015/12/22 Liquid crystalline properties and photochemical behaviors of amphiphilic nematic liquid crystalline diblock copolymers containing photo-crosslinkable mesogens International-presentation Shoichi Kubo, Sho Kobayashi, Nobuhiro Kawatsuki, Masaru Nakagawa Pacifichem2015 2015/12/15 ナノ触診AFMによる光ナノインプリントレジストの開発 畔柳志帆, 伊東駿也, 梁暁斌, 中嶋健, 中川勝 2015高分子学会東北支部研究発表会 2015/11/12 光示差走査熱量測定による光ナノインプリント用光硬化性組成物の重合性基消費率の検討 佐藤慎弥, 伊東駿也, 中川勝 2015高分子学会東北支部研究発表会 2015/11/12 UV-NIL用ケイ素含有光硬化性添加剤の合成とドライエッチング耐性(?) 佐藤寛紀, 伊東駿也, 中川勝, 綿貫公人, 目黒友康, 根本修克 2015高分子学会東北支部研究発表会 2015/11/12 Chlorine-based inductively coupled plasma etching of GaAs using ｊanus-type triptycene (TripC12) as a nanoimprint resist mask International-presentation Akihiro Matsutani, Fumitaka Ishiwari, Yoshiaki Shoji, Takuya Uehara, Masaru Nakagawa, Takanori Fukushima 28th International Microprocesses and Nanotechnology Conference(MNC 2015) 2015/11/10 Discharge of droplets of viscous UV-curable resins by screen printing for UV nanoimprint lithography International-presentation Akira Tanabe, Takuya Uehara, Kazuro Nagase, Hiroaki Ikedo, Nobuya Hiroshiba, Masaru Nakagawa 28th International Microprocesses and Nanotechnology Conference(MNC 2015) 2015/11/10 Development of silicon-containing additives to improve etching durability for sub-50 nm patterning by UV nanoimprint lithography International-presentation Shunya Ito, Hiroki Sato, Kimihito Watanuki, Nobukatsu Nemoto, Masaru Nakagawa 28th International Microprocesses and Nanotechnology Conference(MNC 2015) 2015/11/10 Anisotropic oxygen reactive ion etching for residual layer removal of UV nanoimprinted 45-nm-wide line patterns International-presentation Takuya Uehara, Shoichi Kubo, Nobuya Hiroshiba, Masaru Nakagawa 28th International Microprocesses and Nanotechnology Conference(MNC 2015) 2015/11/10 Fabrication of sub-100 nm size steep resist patterns by UV nanoimprinting and oxygen reactive ion etching International-presentation Takuya Uehara, Shoichi Kubo, Nobuya Hiroshiba, Masaru Nakagawa The 14th International Conference on Nanoimprint & Nanoprint Technology(NNT 2015) 2015/10/22 光硬化樹脂薄膜のナノスケールで不均一な表面弾性率とエッチング耐性 久保祥一, 矢野春菜, 上原卓也, 中川勝, 梁暁斌, 藤波想, 中嶋健 第64回高分子討論会 2015/09/15 光ナノインプリント‐原子層堆積法によるナノ造形 (?)〜異なる化学構造のモノマーで形成された樹脂パターン上へのAl2O3堆積〜 畔柳志帆, 廣芝伸哉, 中川勝 第64回高分子討論会 2015/09/15 酸素反応性イオンエッチングによる線幅45 nm光硬化樹脂パターンの残膜除去 上原卓也, 廣芝伸哉, 中川勝 第64回高分子討論会 2015/09/15 重合性基消費率の異なる紫外線硬化薄膜のドライエッチング耐性評価 佐藤慎弥, 畔柳志帆, 伊東駿也, 中川勝 第64回高分子討論会 2015/09/15 PS-b-PMMAミクロ相分離構造のsub-100 nm ガイドパターンでの誘導自己組織化 廣芝伸哉, 大窪諒, 中川勝, 服部梓, 田中秀和 第64回高分子討論会 2015/09/15 界面機能分子制御に立脚したナノインプリントリソグラフィ 中川勝 2015年度精密工学会秋季大会 学術講演会 2015/09/04 Al2O3 growth behaviors on UV-nanoimprinted patterns by chemical vapor deposition 畔柳志帆, 廣芝伸哉, 早川竜馬, 若山裕, 中川勝 第43回東北地区高分子若手研究会夏季ゼミナール 2015/07/08 UV-NILでの残膜均一化に向けたスクリーン印刷法 田辺明, 上原卓也, 廣芝伸哉, 中川勝 第43回東北地区高分子若手研究会夏季ゼミナール 2015/07/08 単峰性ネマチック液晶高分子へのキラル分子の相溶化部位の導入 袖村巧, 久保祥一, 樋口博紀, 菊池裕嗣, 中川勝 第43回東北地区高分子若手研究会夏季ゼミナール 2015/07/08 Graphoepitaxy法によるブロック共重合体の誘導自己組織化に向けたサブ50 nmシリコンガイドの作製 伊東駿也, 中川勝 第43回東北地区高分子若手研究会夏季ゼミナール 2015/07/08 サブ20nmの直径を有する炭素被覆モールド空隙への光硬化性組成物の充填挙動 中川勝, 中谷顕史, 廣芝伸哉 次世代リソグラフィー（NGL)ワークショップ2015 2015/07/06 光ナノインプリントリソグラフィに向けた高粘性光硬化性組成物のスクリーン印刷 廣芝伸哉, 田辺明, 上原卓也, 中川勝 次世代リソグラフィー（NGL)ワークショップ2015 2015/07/06 界面機能分子制御に立脚したナノインプリントリソグラフィ Invited 中川勝 先端ナノデバイス・材料テクノロジー第151委員会 平成27年度 第1回合同研究会 2015/07/03 ナノインプリント樹脂パターンへのアルミナ堆積 畔柳志帆, 廣芝伸哉, 中川勝 高分子・ハイブリッド材料研究センター 2015 PHyMシンポジウム 2015/06/17 ナノインプリントとスクリーン印刷技術の融合 田辺明, 中川勝 高分子・ハイブリッド材料研究センター 2015 PHyMシンポジウム 2015/06/17 光ナノインプリント‐原子層堆積法によるナノ造形 (III)〜モノマーの化学構造に着目した Al2O3 成膜様式の考察〜 畔柳志帆, 廣芝伸哉, 中川勝 第64回高分子学会年次大会 2015/05/27 非液晶性部位をランダムに導入した単峰性ネマチック液晶高分子に対するキラル分子の相溶性 袖村巧, 久保祥一, 樋口博紀, 菊池裕嗣, 中川勝 第64回高分子学会年次大会 2015/05/27 ラジカル重合型光硬化樹脂薄膜の表面弾性率の原子間力顕微鏡による解析 久保祥一, 矢野春菜, 中川勝, 梁暁斌, 藤波想, 中嶋健 第64回高分子学会年次大会 2015/05/27 Rapid growth in 30 seconds of thermally induced microphase-separation of PS-b-PMMA for directed self-assembly lithography International-presentation Nobuya Hiroshiba, Ryo Okubo, Masaru Nakagawa, Azusa N. Hattori, Hidekazu Tanaka The 59th International Conference on Electron, Ion, and Photon Beam Technology and nanofabrication(EIPBN2015） 2015/05/26 ナノインプリントリソグラフィーの科学 Invited Masaru Nakagawa 第209回フォトポリマー懇話会 2015/04/24 Rapid growth of thermally induced microphase-separation of PS-b-PMMA for lithography application International-presentation Nobuya Hiroshiba, Ryo Okubo, Masaru Nakagawa Photomask Japan 2015（PMJ2015） 2015/04/21 Discharge of high-viscous UV-curable resins by screen printing for UV nanoimprint lithography International-presentation Takuya Uehara, Kazuro Nagase, Akira Tanabe, Nobuya Hiroshiba, Hiroaki Ikedo, Masaru Nakagawa Photomask Japan 2015（PMJ2015） 2015/04/21 Rapid growth behavior of microphase-separation structure of PS-b-PMMA for directed self-assembly lithography 廣芝伸哉, 大窪諒, 服部梓, 田中秀和, 中川勝 第62回応用物理学期春季学術講演会 2015/03/11 Nano-object figuration by UVN-ALD (II)〜Installation of ALD equipment and investigation of Al2O3 deposition for resin surface〜 畔柳志帆, 廣芝伸哉, 中川勝 第62回応用物理学期春季学術講演会 2015/03/11 Nano-scale heterogeneity of surface elasticity observed for thin resin films cured by radical photopolymerization 矢野春菜, 久保祥一, 中川勝, 梁暁斌, 藤波想, 中嶋健 第62回応用物理学期春季学術講演会 2015/03/11 Control of the amount of UV-curable resin droplets discharged by screen printing for equalizing a residual layer thickness after UV nanoimprint 田辺明, 上原卓也, 永瀬和郎, 池戸裕明, 廣芝伸哉, 中川勝 第62回応用物理学期春季学術講演会 2015/03/11 sub-20 nmの孔径を有する炭素被覆モールドを用いた光硬化性組成物の充填に関する研究 中川勝, 中谷顕史, 干川康人, 京谷隆 第62回応用物理学期春季学術講演会 2015/03/11 光硬化樹脂薄膜の表面弾性率の原子間力顕微鏡による解析 矢野春菜, 久保祥一, 中川勝, 藤波想, 梁暁斌, 中嶋健 2014 高分子・ハイブリッド材料研究センター（PHyM）若手フォーラム 2014/12/12 光ナノインプリント・原子層堆積法を用いたsub-100 nm樹脂パターンへのAl2O3堆積 畔柳志帆, 廣芝伸哉, 早川竜馬, 若山裕, 中川勝 2014 高分子・ハイブリッド材料研究センター（PHyM）若手フォーラム 2014/12/12 Miscibility of chiral dopants to a unimodal nematic liquid crystalline polymer 袖村巧, 久保祥一, 樋口博紀, 菊池裕嗣, 中川勝 第24回日本MRS年次大会 2014/12/10 光反応性メソゲン含有ポリメタクリレートをサブユニットとする両親媒性ジブロック共重合体の液晶性 久保祥一, 小林翔, 川月喜弘, 中川勝 第14回 東北大学多元物質科学研究所 研究発表会 2014/12/05 光ナノインプリント-原子層堆積法を用いた３次元ナノ造形 廣芝伸哉, 畔柳志帆, 早川竜馬, 若山裕, 中川勝 第14回 東北大学多元物質科学研究所 研究発表会 2014/12/05 光ナノインプリント‐原子層堆積法によるナノ造形（?）〜Sub-100 nm樹脂パターンへのAl2O3成膜〜 畔柳志帆, 廣芝伸哉, 早川竜馬, 若山裕, 中川勝 2014高分子学会東北支部研究発表会 2014/11/13 原子間力顕微鏡によるラジカル重合型光硬化樹脂薄膜の表面弾性率マッピング 矢野春菜, 久保祥一, 中川勝, 藤波想, 梁暁斌, 中嶋健 2014高分子学会東北支部研究発表会 2014/11/13 PS-b-PMMA単層および2層薄膜の200℃における相分離の高速形成挙動 大窪諒, 廣芝伸哉, 久保祥一, 中川勝 2014高分子学会東北支部研究発表会 2014/11/13 Reverse tone UV nanoimprint lithography with fluorescent UV-curable resin International-presentation Takuya Uehara, Shoichi Kubo, Masaru Nakagawa 27th International Microprocesses and Nanotechnology Conference（MNC 2014) 2014/11/04 Fabrication of Si nanoguide structures with a few tens of nm pitch using ultraviolet nanoimprint lithography International-presentation Azusa N. Hattori, Shunya Ito, Ryo Okubo, Masaru Nakagawa, Hidekazu Tanaka The 7th International Symposiumon Surface Science（ISSS-7） 2014/11/02 UV nanoimprinting using carbon-coated anodic aluminum oxide molds with sub-20 nm holes International-presentation Akifumi Nakaya, Masaru Nakagawa International Symposium on Integrated Molecular/Materials Science and Engineering (IMSE2014) 2014/11/01 UV nanoimprint lithography with two fluorescent UV-curable resins International-presentation Invited Takuya Uehara, Shoichi Kubo, Masaru Nakagawa International Symposium on Integrated Molecular/Materials Science and Engineering (IMSE2014) 2014/11/01 Selection of additives to decrease demolding energies in UV nanoimprinting International-presentation Shunya Ito, Masaru Nakagawa International Symposium on Integrated Molecular/Materials Science and Engineering (IMSE2014) 2014/11/01 Rapid curing for UV-nanoimprinting International-presentation Yota Ishito, Masaru Nakagawa International Symposium on Integrated Molecular/Materials Science and Engineering (IMSE2014) 2014/11/01 Liquid crystalline property of a unimodal nematic liquid crystalline polymer with a chiral dopant International-presentation Takumi Sodemura, Shoichi Kubo, Hiroki Higuchi, Hirotsugu Kikuchi, Masaru Nakagawa International Symposium on Integrated Molecular/Materials Science and Engineering (IMSE2014) 2014/11/01 Uniform residual layer thickness in UV-NIL achieved by screen printing with high-viscosity resins International-presentation Takuya Uehara, Kazuro Nasase, Akira Tanabe, Hiroaki Ikedo, Masaru Nakagawa 13th International Conference on Nanoimprint and Nanoprint Technology (NNT 2014) 2014/10/22 Nanoimprint molds of carbon-coated anodic aluminum oxide films with sub-20 nm hole structures International-presentation Akifumi Nakaya, Yasuto Hoshikawa, Haruya Kasa, Junji Nishii, Takashi Kyotani, Masaru Nakagawa 13th International Conference on Nanoimprint and Nanoprint Technology (NNT 2014) 2014/10/22 Monolayer-assisted nanoimprint lithography to fabricate visible frequency metamaterials International-presentation Shoichi Kubo, Takuya Uehara, Masaru Nakagawa 13th International Conference on Nanoimprint and Nanoprint Technology (NNT 2014) 2014/10/22 Investigation of the minimum UV-exposure period for high-throughput UV nanoimprinting International-presentation Yota Ishito, Masaru Nakagawa 13th International Conference on Nanoimprint and Nanoprint Technology (NNT 2014) 2014/10/22 Development of silicon-containing additives for UV nanoimprint lithography to improve durability of resist material to O2 reactive ion etching International-presentation Shunya Ito, Hiroki Sato, Yuhei Tasaki, Yukuke Honda, Nobukatsu Nemoto, Masaru Nakagawa 13th International Conference on Nanoimprint and Nanoprint Technology (NNT 2014) 2014/10/22 熱ナノインプリント成形したポリジメチルシロキサングラフト化ポリイミド膜の物質選択透過性 中谷顕史, 平孝介, 小田龍馬, 長瀬裕, 中川勝 第63回高分子討論会 2014/09/24 Science in Nanoimprint Lithography Invited 中川勝 第63回高分子討論会 2014/09/24 単峰性ネマチック液晶高分子の誘導自己組織化による機能性ナノ構造 久保祥一, 中川勝 第63回高分子討論会 2014/09/24 光ナノインプリントプロセスの高速化を目指した最短成型時間に関する考察 石戸洋太, 中川勝 第63回高分子討論会 2014/09/24 スクリーン印刷法による光ナノインプリント成形体の残膜均一化 上原卓也, 永瀬和郎, 田辺明, 池戸裕明, 中川勝 第63回高分子討論会 2014/09/24 Sub-20 nm構造を有する炭素被覆陽極酸化アルミニウムモールドの作製と ナノインプリント転写 中谷顕史, 干川康人, 笠晴也, 西井準治, 京谷隆, 中川勝 第63回高分子討論会 2014/09/24 Innovative Nanoimprint Lithography International-presentation Shinji Matsui, Hiroshi Hiroshima, Yoshihiko Hirai, Masaru Nakagawa Advanced Architectures in Photonics 2014 2014/09/21 連続UVナノインプリントにおける離型層劣化と離型力の関係の検討 伊吉就三, 岡田真, 春山雄一, 松井真二, 中川勝, 廣島洋 第75回応用物理学会秋季学術講演会 2014/09/17 Cl2-誘導結合型プラズマエッチングにおけるヤヌス型トリプチセンTripC12 のエッチング特性の評価 松谷晃宏, 石割文崇, 庄子良晃, 上原卓也, 中川勝, 福島孝典 第75回応用物理学会秋季学術講演会 2014/09/17 Reverse tone UV nanoimprint lithography for fabricating sub-100nm size Au split-ring resonators Invited Takuya Uehara, Shoichi Kubo, Masaru Nakagawa Tohoku University&＃39;s Chemistry Summer School 2014 2014/08/24 誘電体多層膜フィルタを組み込んだ光通信波長帯用自己形成光導波路 石戸洋太, 郷田将, 杉原興浩, 中川勝 第42回東北地区高分子若手研究会夏季ゼミナール 2014/07/28 光メタマテリアルを目指したナノインプリントリソグラフィ 上原卓也, 久保祥一, 中川勝 第42回東北地区高分子若手研究会夏季ゼミナール 2014/07/28 加熱成型したグラフト化ポリイミド膜のパーベーパレーション特性 中谷顕史, 中川勝 第42回東北地区高分子若手研究会夏季ゼミナール 2014/07/28 ポリスチレン含有ブロックコポリマー薄膜のミクロ相分離構造観察 大窪諒, 久保祥一, 廣芝伸哉, 中川勝 第42回東北地区高分子若手研究会夏季ゼミナール 2014/07/28 界面機能分子制御によるナノ構造機能材料の創製 伊東駿也, 袖村巧, 久保祥一, 中川勝 材料フェスタ in 仙台 2014/07/28 Surface-assisted unidirectional orientation of nematic liquid crystalline polymer-grafted inorganic nanorods International-presentation Shoichi Kubo, Masaru Nakagawa The18th International Symposium on Advanced Display Materials and Devices (ADMD 2014) 2014/07/23 Decrease of demolding energy in UV nanoimprinting using molecular and macromonomer fluorinated additives International-presentation Shunya Ito, Masaru Nakagawa The18th International Symposium on Advanced Display Materials and Devices (ADMD 2014) 2014/07/23 光ナノインプリントリソグラフィで作製した誘導自己組織化用シリコンガイド 伊東駿也, 中川勝 応用物理学会次世代リソグラフィ（NGL）技術研究会ワークショップ2014 2014/07/17 凝縮性ガス雰囲気を用いた革新的光ナノインプリントリソグラフィ 松井真二, 廣島洋, 平井義彦, 中川勝 応用物理学会次世代リソグラフィ（NGL）技術研究会ワークショップ2014 2014/07/17 リバーサル光ナノインプリントにおける光硬化性蛍光組成物 上原卓也, 久保祥一, 中川勝 応用物理学会次世代リソグラフィ（NGL）技術研究会ワークショップ2014 2014/07/17 UVナノインプリントにおける光硬化性樹脂の最適添加剤の探索 伊吉就三, 岡田真, 春山雄一, 山下恒雄, 中川勝, 廣島洋, 松井真二 応用物理学会次世代リソグラフィ（NGL）技術研究会ワークショップ2014 2014/07/17 Nanoimprint lithography based on molecular control of interface function Invited 中川勝 第2回マイクロ・ナノ加工研究会 2014/07/01 光ナノインプリントにおける離型促進効果を示す低分子・高分子フッ素系添加剤の探索 伊東駿也, 中川勝 高分子・ハイブリッド材料研究センター2014PHyM シンポジウム 2014/06/06 リバースプロセスを用いた光ナノインプリントリソグラフィによるsub-100nm 金構造体の作製 上原卓也, 久保祥一, 中川勝 高分子・ハイブリッド材料研究センター2014PHyM シンポジウム 2014/06/06 次世代デバイスへ向けた先進ナノ構造制御 廣芝伸哉, 久保祥一, 中川勝 附置研究所間アライアンスによるナノとマクロをつなぐ物質・デバイス・システム創製戦略プロジェクト 平成25年度アライアンス報告会 2014/05/30 自己形成光導波路を用いた光通信帯用光分波モジュールの作製 郷田将, 石戸洋太, 中川勝, 杉原興浩 第63回高分子学会年次大会 2014/05/28 光架橋部位をランダムに導入したサブユニットを有する両親媒性ジブロック共重合体の合成と液晶性 久保祥一, 小林翔, 川月喜弘, 中川勝 第63回高分子学会年次大会 2014/05/28 光ナノインプリントリソグラフィによる誘導自己組織化に資するシリコンガイドの作製 中川勝, 服部梓, 伊東駿也, 小林敬, 田中秀和 第63回高分子学会年次大会 2014/05/28 ケイ素含有光硬化性有機材料の合成とドライエッチング耐性の評価 佐藤寛紀, 伊東駿也, 中川勝, 田崎裕平, 本多勇介, 根本修克 第63回高分子学会年次大会 2014/05/28 キラル分子を添加した単峰性ネマチック液晶高分子の液晶相の同定 袖村巧, 久保祥一, 樋口博紀, 菊池裕嗣, 中川勝 第63回高分子学会年次大会 2014/05/28 Fabrication of sprit-ring resonator arrays towards visible frequency metamaterials by monolayer-assisted nanoimprint lithography International-presentation Shoichi Kubo, Tatsuya Tomioka, Takuya Uehara, Masaru Nakagawa, Morihisa Hoga, Takuo Tanaka META’14, the 5th International Conference on Metamaterials, Photonic Crystals and Plasmonics 2014/05/20 界面機能分子制御を基盤としたナノインプリントリソグラフィ 中川勝 産総研東北センター 講演会 2014/05/12 Study of Antisticking Layer Resistance on Repeated UV Nanoimprint International-presentation Shuso Iyoshi, Makoto Okada, Tetsuya Katase, Katsuhiko Tone, Yuichi Haruyama, Masaru Nakagawa, Hiroshi Hiroshima, Shinji Matsui Photomask Japan 2014 (PMJ) 2014/04/15 Development of UV-curable Resins Suitable for UV Nanoimprinting Using Condensable Gas International-presentation Shunya Ito, Masaru Nakagawa Photomask Japan 2014 (PMJ) 2014/04/15 Monolayer-assisted nanoimprint lithography for metal nano/micro fabrication International-presentation Shoichi Kubo, Masaru Nakagawa Photomask Japan 2014 (PMJ) 2014/04/15 デンドリマー型エン・チオールフォトポリマーのＵＶ硬化特性と光ナノインプリント感光材料への応用 山田正嗣, 中川勝, 平岡亜希子, 市村國宏, 青木健一 日本化学会第94春季年会 2014/03/27 サブ100 nmサイズ金構造体の作製に向けた光ナノインプリントリソグラフィ 上原卓也, 久保祥一, 中川勝 第61回応用物理学期春季学術講演会 2014/03/17 連続ＵＶナノインプリントおける離型層劣化要因の検討 伊吉就三, 岡田真, 春山雄一, 中川勝, 廣島洋, 松井真二 第61回応用物理学期春季学術講演会 2014/03/17 熱ナノインプリント法によるPMMAポリマー表面への0.3 nm原子ステップの大面積転写 譚 ゴオン, 船迫友之, 三田正弘, 奥田徳路, 森潤一, 小山浩司, 中川勝, 松田晃史, 吉本護 第61回応用物理学期春季学術講演会 2014/03/17 シングルナノパターニングを目指した光ナノインプリントリソグラフィによるSiナノガイドの作製 服部梓, 伊東駿也, 中川勝, 田中秀和 第61回応用物理学期春季学術講演会 2014/03/17 光硬化性蛍光組成物によるナノインプリントプロセスの可視化 久保祥一, 中川勝 2013年度第4回シングルナノパターニング研究グループ講演会 2014/01/24 易凝縮性ガス利用光ナノインブリントに適した光硬化性組成物の開発 伊東駿也, 中川勝 2013年度第4回シングルナノパターニング研究グループ講演会 2014/01/24 ナノインプリントリソグラフィのレジスト材料 Invited 中川勝 2013年度第4回シングルナノパターニング研究グループ講演会 2014/01/24 20 nm-Class patterning using UV-curable resins suitable for UVnanoimprinting in a condensable gas International-presentation Shunya Ito, Shu Kaneko, Masaru Nakagawa 第2回アライアンス国際シンポジウム 2014/01/21 光学活性分子を添加したネマチック液晶性高分子の特性 袖村巧, 久保祥一, 中川勝 2013PHyM若手フォーラム 2013/12/20 誘電体多層膜を用いた光通信帯用自己形成光分波モジュールの作製 郷田将, 石戸洋太, 中川勝, 杉原興浩 2013PHyM若手フォーラム 2013/12/20 ドライエッチング耐性の向上を目的としたケイ素含有添加剤の開発 伊東駿也, 田崎裕平, 中川勝, 佐藤寛紀, 本多勇介, 根本修克 第13回東北大学多元物質科学研究所 研究発表会 2013/12/06 加熱成型したポリジメチルシロキサングラフト化ポリイミド膜のエタノール選択透過性 中谷顕史, 平孝介, 長瀬裕, 中川勝 第13回東北大学多元物質科学研究所 研究発表会 2013/12/06 Split-ring Resonator Arrays for Visible Frequency Metamaterials Fabricated by Nanoimprint Lithography International-presentation Shoichi Kubo, Tatsuya Tomioka, Masaru Nakagawa, Morihisa Hoga, Takuo Tanaka MRS Fall meeting 2013/12/01 Surface density of polymerization initiator determining surface-assisted unidirectional orientation of polymer-grafted inorganic semiconductor nanorods with nematic liquid crystalline molecules International-presentation Shoichi Kubo, Rei Taguchi, Masaru Nakagawa MRS Fall meeting 2013/12/01 ケイ素含有モノ マーを添加した光ナノインプリント用光硬化性組成物の成形とドライエッチン グ耐性 田崎裕平, 伊東駿也, 中川 勝, 佐藤寛紀, 本多勇介, 根本修克 高分子学会東北支部研究発表会 2013/11/14 有機−無機ハイブリッド誘電体多層膜を用いた光通信帯用自己形成光分波モジュールの設計 郷田将, 石戸洋太, 中川勝, 杉原興浩 高分子学会東北支部研究発表会 2013/11/14 低分子ネマチック液晶を添加したネマチック液晶性ブロック共重合体のミクロ相分離構造形成 小林翔, 久保祥一, 小村元憲, 彌田智, 中川勝 高分子学会東北支部研究発表会 2013/11/14 Investigation of fluorinated molecular and polymer additives suitable for a viscous acrylate monomer in UV nanoimprinting International-presentation Shunya Ito, Masaru Nakagawa 26th International Microprocesses and Nanotechnology Conference(ＮＭＣ2013) 2013/11/05 Microphase separation of a nematic liquid crystalline block copolymer thin film assisted by small nematic liquid crystalline molecules International-presentation Shoichi Kubo, Sho Kobayashi, Shingo Hadano, Motonori Komura, Tomokazu Iyoda, Masaru Nakagawa 26th International Microprocesses and Nanotechnology Conference(ＮＭＣ2013) 2013/11/05 Au split-ring resonator arrays for visible metamaterials fabricated by nanoimprint lithography International-presentation Takuya Uehara, Shoichi Kubo, Masaru Nakagawa The 12th International Conference on 2013/10/21 Influence of thermal molding on ethanol permselectivity of polydimethylsiloxane-grafted polyimide membranes International-presentation 中谷顕史, 平 孝介, 長瀬 裕, 中川 勝 平成25 年度化学系学協会東北大会及び日本化学会東北支部70周年記念国際会議 2013/09/28 Unique release property of UV-curable resins in UV nanoimprinting using condensable gas International-presentation 伊東駿也, 金子 周, 中川 勝 平成25 年度化学系学協会東北大会及び日本化学会東北支部70周年記念国際会議 2013/09/28 Synthesis and orientation control of polymer-grafted International-presentation 久保祥一, 田口 怜, 林田研一, 成田麻美子, 波多野慎悟, 渡辺 修, 彌田智一, 中川 勝 平成25 年度化学系学協会東北大会及び日本化学会東北支部70周年記念国際会議 2013/09/28 Synthesis of the silicon-containing additives to UV-NIL resin and investigation of their dry etching resistance International-presentation 田崎裕平, 金子 周, 中川 勝, 根本修克, 工藤敦志, 服部貴裕 平成25 年度化学系学協会東北大会及び日本化学会東北支部70周年記念国際会議 2013/09/28 Fabrication and optical characterization of light -induced self -written waveguides incorporated with a multilayer filter comprising organic-inorganic hybird materials International-presentation Invited 石戸洋太, 上原卓也, 中川勝, 杉原興浩 International Symposium on Integrated Molecular/Materials Science and Engineering(IMSE2013) 2013/09/19 Fabrication of Au split-ring resonator arrays by UV nanoimprint lithography International-presentation Invited 上原卓也, 久保祥一, 中川勝 International Symposium on Integrated Molecular/Materials Science and Engineering(IMSE2013) 2013/09/19 Release Layer Free Acrylate Resins for UV Nanoimprinting with Unmodified Silica Molds International-presentation Invited 中川勝, 伊東駿也 International Symposium on Integrated Molecular/Materials Science and Engineering(IMSE2013) 2013/09/19 Study on the effect of additives in repeated UV nanoimprint demolding ? 伊吉就三, 岡田真, 春山雄一, 松井真二, 中川勝, 廣島洋 第74回応用物理学会秋季学術講演会 2013/09/16 Synthesis of the silicon-containing additives to UV-NIL resin and investigation of their dry etching resistance 田崎裕平, 金子周, 中川勝, 佐藤寛紀, 本多勇介, 根本修克 第62回高分子討論会 2013/09/11 Effects of release layers and fluorinated additives on release property in step-and-repeat UV nanoimprinting using condensable gas Invited 伊東駿也, 中川勝 第62回高分子討論会 2013/09/11 Uniaxial orientation of hybrid materials comprising nematic liquid crystals and inorganic semiconductor nanorods Invited 久保祥一, 田口怜, 林田研一, 成田麻美子, 波多野慎悟, 渡辺修, 彌田智一, 中川勝 第62回高分子討論会 2013/09/11 光硬化性有機‐無機ハイブリッド材料の多層膜フィルタを導入した分波型自己形成光導波路 石戸洋太, 中川勝, 杉原興浩 第41回東北地区高分子若手研究会夏季ゼミナール 2013/08/05 熱ナノインプリント成型によるポリイミド膜のピラーパターン作製 中谷 顕史, 久保 祥一, 中川 勝 第41回東北地区高分子若手研究会夏季ゼミナール 2013/08/05 低分子液晶混合によるネマチック液晶性ブロック共重合体のミクロ相分離構造への影響 小林翔, 田口怜, 久保祥一, 多野慎悟, 小村元憲, 彌田智一, 中川勝 第41回東北地区高分子若手研究会夏季ゼミナール 2013/08/05 光ナノインプリント用光硬化性組成物の開発 金子周, 中川勝 第41回東北地区高分子若手研究会夏季ゼミナール 2013/08/05 Sub-50 nm-width Au split ring resonator arrays fabricated by UV nanoimprint lithography 上原卓也, 久保祥一, 中川勝 NGL2013 Workshop 2013/07/16 Development of UV-curable resins suitable for UV nanoimprinting using condensable gas 伊東駿也, 金子周, 中川勝 NGL2013 Workshop 2013/07/16 Innovative Nanoimprint Lithography using PFP Condensable Gas International-presentation Invited Hiroshi Hiroshima, Masaru Nakagawa, Yoshihiko Hirai, Shinji Matsui 30th International Conference of Photopolymer Science and Technology (ICPST-30) 2013/06/25 低/高屈折率有機-無機ハイブリッド材料を用いた多層膜フィルタの作製と自己形成光導波路での分波特性 石戸洋太, 中川勝, 杉原興浩 2013PHyMシンポジウム 2013/06/12 分離膜を目指した陽極酸化アルミニウムモールドによるポリイミド膜の加熱成型 中谷顕史, 久保祥一, 中川勝 2013PHyMシンポジウム 2013/06/12 ケイ素含有官能基を持つ光硬化性モノマーの合成とドライエッチング耐性の評価 田崎裕平, 金子周, 中川勝, 服部貴裕, 工藤敦志, 根本修克 第62回高分子学会年次大会 2013/05/29 Fabrication and optical characterization of light-induced self-written waveguides incorporated with a multilayer filter comprising organic-inorganic hybrid materials 石戸洋太, 上原卓也, 中川勝, 杉原興浩 第62回高分子学会年次大会 2013/05/29 ATRP synthesis of nematic liquid crystalline block copolymers and analysis of the microphase-separated structure 小林翔, 田口怜, 久保祥一, 波多野慎悟, 小村元憲, 彌田智一, 中川勝 第62回高分子学会年次大会 2013/05/29 Fabrication of Au split-ring resonator arrays responsive to a magnetic field at a visible frequency region by UV nanoimprint lithography 上原卓也, 富岡辰弥, 久保祥一, 法元盛久, 中川 勝 第62回高分子学会年次大会 2013/05/29 凝縮ガス利用光ナノインプリントに適した光硬化性組成物へのシリコーン系添加剤の導入による離型促進効果 伊東 駿也, 金子周, 中川勝 第62回高分子学会年次大会 2013/05/29 Hybrid materials comprising nanorods and nematic liquid crystals toward uniaxial orientation of ZnO nanorods 久保祥一, 田口怜, 林田研一, 成田麻美子, 波多野慎悟, 渡辺修, 彌田智一, 中川勝 第62回高分子学会年次大会 2013/05/29 Au split-ring resonator arrays responsive to a magnetic field in a visible frequency region fabricated by UV nanoimprint lithography International-presentation Takuya Uehara, Tatsuya Tomioka, Shoichi Kubo, Morihisa Hoga, Masaru Nakagawa The 57th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN2013) 2013/05/28 界面機能分子制御に基づくナノインプリントリソグラフィデバイスの創出 Invited 中川勝 バイオテンプレート研究会 第3回講演会 2013/04/26 Study on the effect of additives in repeated UV nanoimprint demolding 伊吉就三, 岡田真, 春山雄一, 松井真二, 中川勝, 廣島洋 第60回応用物理学会春季学術講演会 2013/03/27 Fabrication and optical investigation of Au split-ring resonator arrays responsive to a magnetic field at a visible frequency region 富岡辰弥, 久保祥一, 中川勝, 法元盛久, 田中拓男 第60回応用物理学会春季学術講演会 2013/03/27 Investigation of Acrylate Thin Films Absorbing Pentafluoropropane 金子周, 中川勝 第60回応用物理学会春季学術講演会 2013/03/27 Innovative Nanoimprint Lithography Invited Shinji Matsui, Hiroshi Hiroshima, Yoshihiko Hirai, Masaru Nakagawa NPIE-JST Workshop on &＃34;Intellirent Electronics 2013/03/06 界面機能分子制御を基盤としたナノインプリントリソグラフィ技術 Invited 中川勝 先進機能表面セミナー 2013/02/26 凝縮性ガスＰＦＰに適した光ナノインプリント用光硬化性組成物 Invited 中川勝 2012年第5回ナノインプリント技術研究会 2013/02/15 酸化亜鉛ナノロッドのグラムスケール合成およびビフェニル部位を側鎖とするポリ（メタクリレート）の表面グラフト 田口 怜, 久保祥一, 中川 勝 2012高分子・ハイブリッド材料研究センター(PHyM)若手フォーラム 2012/12/21 ペンタフルオロプロパン利用光ナノインプリントによるサブ50 nmパターン作製と形状評価 金子 周, 中川 勝 2012高分子・ハイブリッド材料研究センター(PHyM)若手フォーラム 2012/12/21 Fabrication of Au nanorod and split-ring arrays by reactive-monolayer-assisted thermal nanoimprint lithography involving electrodeposition International-presentation Shoichi Kubo, Tatsuya Tomioka, Koichi Nagase, Morihisa Hoga, Masaru Nakagawa The 13th RIES-Hokudai International Symposium &＃34;律&＃34;[ritsu] Joined with The 1st International Symposium of Nano-Macro Materials, Devices, and System Research Alliance Project 2012/12/12 多波長変換へ向けた色素添加ポリマーマイクロアレイの作製とその蛍光解析 古川怜, 小林敬, 久保祥一, 杉原興宏, 中川勝 第12回東北大学多元物質科学研究所研究発表会 2012/12/10 熱ナノインプリントリソグラフィと電解析出による金ナノロッドおよびスプリットリング配列の作製 富岡辰弥, 久保祥一, 中川勝 第12回東北大学多元物質科学研究所研究発表会 2012/12/10 ナノインプリントリソグラフィにおける単分子膜工学 Invited 中川勝 第32回表面科学 学術講演会 2012/11/20 陽極酸化アルミニウムモールドによるポリイミド膜のパターン作製 中谷顕史, 尹哲民, 鈴木沙耶花, 長瀬裕, 中川勝 2012高分子学会東北支部研究発表会 2012/11/15 単分子膜修飾金薄膜上での光硬化性樹脂の光ナノインプリント成型挙動 上原卓也, 富岡辰弥, 久保祥一, 中川勝 2012高分子学会東北支部研究発表会 2012/11/15 低/高屈折率有機-無機ハイブリッド材料を用いた多層膜フィルターの作製 石戸洋太, 上原卓也, 杉原興浩, 中川勝 2012高分子学会東北支部研究発表会 2012/11/15 Resolution limit of nanoimprinted patterns on dry or immersion fluorescence microscope observation Shoichi Kubo, Tatsuya Tomioka, Masaru Nakagawa Kyoto DSA Workshop 2012/11/01 Resist materials suitable for UV nanoimprinting using condensable gas Masaru Nakagawa, Shu Kaneko Kyoto DSA Workshop 2012/11/01 Study of the Resistance of Antisticking Layer on Repeated UV Nanoimprint International-presentation Shuso Iyoshi, Makoto Okada, Kei Kobayashi, Shu Kaneko, Tetsuya Katase, Katsuhiko Tone, Yuichi Haruyama, Masaru Nakagawa, Hiroshi Hiroshima, Shinji Matsui 25th International Microprocesses and Nanotechnology Conference (MNC2012) 2012/10/30 Ultraviolet-Curable Resins comprising a diacrylate monomer hardly absorbing condensable pentafluoropropane (PFP) gas to achieve high throughput in ultraviolet nanoimprinting using PFP International-presentation Shu Kaneko, Cheol Yun Min, Masaru Nakagawa 第25回マイクロプロセス・ナノテクノロジー国際会議（MNC 2012) 2012/10/30 Resolution limits of fluorescent nanoimprinted patterns on fluorescence microscopic observation International-presentation Shoichi Kubo, Tatsuya Tomioka, Masaru Nakagawa 第25回マイクロプロセス・ナノテクノロジー国際会議（MNC 2012) 2012/10/30 UV-curable resins suitable for UV-NIL in pentafluoropropane International-presentation Masaru Nakagawa, Shu Kaneko The 11th International Conference on Nanoimprint & Nanoprint Technology (NNT2012) 2012/10/24 Lipid-based magnetic nanomedicines for cancer International-presentation Yoshihisa Namiki, Teruaki Fuchigami, Masaru Nakagawa, Yoshitaka Kitamoto PACIFIC RIM MEETING ON ELECTROCHEMICAL AND SOLID-STATE SCIENSE(PRIME2012) 2012/10/07 FePt Magnetic Hollow Spheres Designed for Nano-Scale Drug Delivery System Targeted to Cancer Tumor International-presentation Teruaki Fuchigami, Masaru Nakagawa, Yoshihisa Namiki, Yoshitaka Kitamoto PACIFIC RIM MEETING ON ELECTROCHEMICAL AND SOLID-STATE SCIENSE(PRIME2012) 2012/10/07 色素添加ポリマーマイクロアレイの作製とその蛍光解析 古川怜, 小林敬, 久保祥一, 杉原興浩, 中川勝 第61回高分子討論会 2012/09/19 PDMSグラフト芳香族ポリイミド膜の作製と表面修飾 鈴木沙耶花, 土屋翔, 尹哲民, 中川勝, 岡村陽介, 長瀬裕 第61回高分子討論会 2012/09/19 凝縮性ガスPFP利用光ナノインプリントリソグラフィに適した光硬化性組成物の開発 金子 周, 尹 哲民, 中川 勝 第61回高分子討論会 2012/09/19 光ナノインプリントにおけるフッ素系添加剤含有光硬化性組成物の離型特性 伊東駿也, 金子 周, 尹 哲民, 中川 勝 第61回高分子討論会 2012/09/19 Liquid Crystallinity of Poly(methacrylate)s Containing Biphenyl Moieties Synthesized by ATRP International-presentation Rei Taguchi, Shoichi Kubo, Shingo Hadano, Tomokazu Iyoda, Masaru Nakagawa KJF (Korea-Japan Joint Forum) International Conference on Organic Materials for Electronics and Photonics 2012 (KJF2012) 2012/08/29 Gas Permeability of Patterned PDMS-grafted Polyimide Membranes Fabricated by Nanocasting Method International-presentation Cheol Min Yun, Yu Nagase, Masaru Nakagawa KJF (Korea-Japan Joint Forum) International Conference on Organic Materials for Electronics and Photonics 2012 (KJF2012) 2012/08/29 Multi-Layer Thin Film Filter Using High Refractive Index Hybrid Material International-presentation Okihiro Sugihara, Yu Kurata, Masaru Nakagawa KJF (Korea-Japan Joint Forum) International Conference on Organic Materials for Electronics and Photonics 2012 (KJF2012) 2012/08/29 ナノインプリントリソグラフィによるメタマテリアルの作製 久保祥一, 中川 勝 附置研究所アライアンス「次世代エレクトロニクス」グループ（Ｇ1）分科会信州大学ジョイントシンポジウム 2012/08/01 光硬化性有機-無機ハイブリッド低屈折率材料を用いた高反射率誘電体多層膜フィルタの作製 上原卓也, 杉原興浩, 中川 勝 第40回東北地区高分子若手研究会夏季ゼミナール 2012/07/25 低表面自由エネルギーを形成する光硬化組成物の調製と光ナノインプリントへの応用 伊東駿也, 尹 哲民, 中川 勝 第40回東北地区高分子若手研究会夏季ゼミナール 2012/07/25 シアノビフェニルを有するポリ(メタクリレート)のランダム共重合化による液晶性の変化 田口怜, 久保祥一, 中川 勝 第40回東北地区高分子若手研究会夏季ゼミナール 2012/07/25 溶解度パラメータに基づくアクリレート化合物のペタンフルオロプロパン吸収特性の解析 金子周, 中川 勝 第40回東北地区高分子若手研究会夏季ゼミナール 2012/07/25 界面化学結合型熱ナノインプリントと電解析出による金ナノ構造体の作製 富岡辰弥, 久保祥一, 中川 勝 第40回東北地区高分子若手研究会夏季ゼミナール 2012/07/25 Study of Demolding Characteristics in continuous UV Nanoimprinting 伊吉就三, 岡田真, 春山雄一, 松井真二, 小林敬, 金子周, 中川勝, 廣島洋 NGL2012ワークショップ 2012/07/19 UV-cureble resins suitable for UV-NIL in pentafluoropropane Invited Masaru Nakagawa NGL2012ワークショップ 2012/07/19 Reactive-monolayer-assited Thermal Nanoimprint Lithography International-presentation Invited Shoichi Kubo, Masaru Nakagawa The 29th International Conference of Photopolymer Science and Technology (ICPST-29) 2012/06/26 光硬化樹脂での長鎖フルオロアルキル 基の表面偏析における偏析助剤の添加効果 伊東駿也, 尹 哲民, 中川 勝 高分子・ハイブリッド材料研究センター2012 PHyMシンポジウム 2012/06/07 中空シリカ粒子含有低屈折率光硬化 性組成物を用いた多層膜フィルター 上原卓也, 杉原興浩, 中川 勝 高分子・ハイブリッド材料研究センター2012 PHyMシンポジウム 2012/06/07 界面化学結合型熱ナノインプリントリ ソグラフィによるメタマテリアル材料の作製 久保祥一, 富岡辰弥, 中川 勝 高分子・ハイブリッド材料研究センター2012 PHyMシンポジウム 2012/06/07 Study of Demolding Characteristics in Continuous UV Nanoimprinting International-presentation Shuso Iyoshi, Makoto Okada, Yuichi Haruyama, Shinji Matsui, Kei Kobayashi, Shu Kaneko, Masaru Nakagawa, Hiroshi Hiroshima The 56th InternaTonal Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication(EIPBN2012) 2012/05/29 Release Layer Free Acrylate Resins for Ultraviolet Nanoimprinting Prepared by Adding Segregation Auxiliary Agents International-presentation Shunya Ito, Cheol Min Yun, Kei Kobayashi, Masaru Nakagawa The 56th InternaTonal Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication(EIPBN2012) 2012/05/29 Au Nanorods and Nanogap Split-Ring Structures Fabricated by Reactive-Monolayer-Assisted Thermal Nanoimprinting and Electrodeposition International-presentation Tatsuya Tomioka, Shoichi Kubo, Koichi Nagase, Morihisa Hoga, Masaru Nakagawa The 56th InternaTonal Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication(EIPBN2012) 2012/05/29 Fluoroalkyl-Containing Surfactants to Reduce Release Energy of UV-Cured Acrylate Resin International-presentation Masaru Nakagawa, Yoshitaka Tsukidate The 56th InternaTonal Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication(EIPBN2012) 2012/05/29 Preparation of UV-curable organic-inorganic hybrid materials with low refractive index for application to high reflection multilayer filters 上原卓也, 杉原興浩, 中川 勝 第61回高分子学会年次大会 2012/05/29 Synthesis of zinc oxide nanorods grafting poly(methacrylate)s containing biphenyl moieties 久保祥一, 田口怜, 林田研一, 成田麻美子, 波多野慎悟, 渡辺 修, 彌田智一, 中川勝 第61回高分子学会年次大会 2012/05/29 Absorption of condensable pentafluoropropane by UV-curable resins affecting morphology of resin patterns fabricated by ultraviolet nanoimprinting 金子 周, 小林 敬, 中川 勝 第61回高分子学会年次大会 2012/05/29 Adhesive force of a UV-cured resin causing radical photopolymerization to a fluorinated silica surface with an antisticking reagent (II) - Locking for reagents reducing adhesive force 月館義隆, 中川 勝 第61回高分子学会年次大会 2012/05/29 Effect of Fluoroalkyl group on the Membrane Properties of PDMS Graft Aromatic Polyimide 鈴木沙耶花, 佐藤美穂, 原田昌貴, 長瀬 裕, 尹 哲民, 中川 勝 第61回高分子学会年次大会 2012/05/29 Separation property of nanoimprinted PDMS-grafted aromatic polyimide membranes 尹 哲民, 永瀬 康一, 山本 清, 鈴木 沙耶花, 長瀬 裕, 中川 勝 第61回高分子学会年次大会 2012/05/29 Surface segregation of long-chain fluoroalkyl moiety in thin films of UV-cured acrylate resins by adding segregation auxiliary agents 伊東駿也, 尹哲民, 小林敬, 中川勝 第61回高分子学会年次大会 2012/05/29 界面化学結合型熱ナノインプリントと電解析出により得られる 配列した金ナノロッドおよびスプリットリング構造 富岡辰弥, 久保祥一, 永瀬康一, 法元盛久, 中川 勝 第61回高分子学会年次大会 2012/05/29 Synthesis of poly(methacrylate)s containing biphenyl moieties by ATRP and characterization of their liquid crystallinity 田口怜, 久保祥一, 波多野慎悟, 彌田智一, 中川勝 第61回高分子学会年次大会 2012/05/29 Hybrid magnetic capsules composed of self-assembled monolayer of FePt nanoparticles and polymer designed for drug delivery system International-presentation Teruaki Fuchigami, Masaru Nakagawa, Yoshihisa Namiki, Yoshitaka Kitamoto 14th International Association of Colloid and Interface Scientists (IACIS 2012) 2012/05/13 Surface segregation of 1H,1H,9H-hexadecafluorononyl acrylate in dimethacrylate resin films cured by ultraviolet light exposure International-presentation Shunya Ito, Cheol Min Yun, Kei Kobayashi, Masaru Nakagawa 14th International Association of Colloid and Interface Scientists (IACIS 2012) 2012/05/13 Gram-scale synthesis of zinc oxide nanorods in basic ethanol solutions International-presentation Shoichi Kubo, Masaru Nakagawa 14th International Association of Colloid and Interface Scientists (IACIS 2012) 2012/05/13 Noble metal mesh structures with a controlled aperture ratio fabricated by reactive-monolayer-assisted thermal nanoimprint lithography International-presentation Shoichi Kubo, Koichi Nagase, Masaru Nakagawa 14th International Association of Colloid and Interface Scientists (IACIS 2012) 2012/05/13 Magnetically guided drug delivery system using FePt network capsule filled with anti-cancer drugs 渕上輝顕, 北本仁孝, 中川 勝, 並木禎尚 電気化学会第79回大会 2012/03/29 Control of interfacial functions by molecules in UV nanoimprinting Invited 中川勝 日本化学会第92春季年会(2012)アドバンスト・テクノロジー・プログラム（ATP） 2012/03/26 Magnetic capsules with a hybrid shell composed of magnetic nanoparticles and biocompatible polymer International-presentation Teruaki Fuchigami, Yoshitaka Kitamoto, Masaru Nakagawa, Yoshihisa Namiki Softinterface International Mini-Symposium on Biointerface -Interface between Bio and Materials-[SIMS2012] 2012/03/17 Decrease of Surface Free Energy of Resin Films by Adding a Fluoroalkyl-Containing Acrylate 伊東駿也, 尹 哲民, 小林敬, 中川 勝 2012年春季 第59回応用物理学関係連合講演会 2012/03/15 Au split-ring structures fabricated by reactive-monolayer-assisted thermal nanoimprinting and electrodeposition 富岡辰弥, 永瀬康一, 久保祥一, 法元盛久, 中川 勝 2012年春季 第59回応用物理学関係連合講演会 2012/03/15 Shear Property of Interface between Cured Resin and Release Layer in UV Nanoimprinting 遠藤彩子, 小林 敬, 中川 勝 2012年春季 第59回応用物理学関係連合講演会 2012/03/15 Surface Science in Ultraviolet Nanoimprinting Invited 中川勝 2012年春季第59回応用物理学関係連合講演会 2012/03/15 Fabrication of replica molds for UV nanoimprinting using silica/UV-cured resin nanocomposites International-presentation Cheol Min Yun, Shimpei Kudo, Shoichi Kubo, Masaru Nakagawa JSPS-APCPI Joint Symposium on Active Polymers for Pattern Integration 2012/03/08 Thermal properties of poly(methacrylate)s tethering side-chain cyanobiphenyloxy moieties synthesized by ATRP International-presentation Rei Taguchi, Shoichi Kubo, Masaru Nakagawa JSPS-APCPI Joint Symposium on Active Polymers for Pattern Integration 2012/03/08 UVナノインプリントの離型解析と材料技術 中川勝 応用物理学会関西支部セミナー 2012/02/28 Thermal nanoimprint process and its application to separation membrane Cheol Min Yun, Koichi Nagase, Kiyoshi Yamamoto, Yu Nagase, Masaru Nakagawa 第3回在日韓国科学技術者協会 合同分科会 2012/02/25 ナノインプリントリソグラフィにおける界面機能分子制御 Invited 中川勝 第21回光反応・電子用材料研究会講座 次世代パターン形成技術展望 2012/01/19 シアノビフェニル含有ポリメタクリレートのATRP法による合成と特性 久保 祥一, 波多野 慎悟, 彌田 智一, 中川 勝 PHyM若手フォーラム 2011/12/21 離型剤FAS13の表面被覆率と光ナノインプリントにおける離型性の関係 遠藤 彩子, 小林 敬, 中川 勝 PHyM若手フォーラム 2011/12/21 シリカナノ粒子分散光硬化性組成物から作製した光ナノインプリントモールドの特性 工藤 進平, 尹 哲民, 永瀬 康一, 久保 祥一, 中川 勝 PHyM若手フォーラム 2011/12/21 PFP利用光ナノインプリントにおけるアクリレートモノマーの化学構造の影響 金子周, 小林敬, 月館義隆, 中川勝 PHyM若手フォーラム 2011/12/21 貴金属メッシュ型透明導電膜上でのCu-In-Ga-Se薄膜の形成挙動 永瀬 康一, 徳田 剛大, 吉野 賢二, 片岡 浩, 花畑 博之, 久保 祥一, 中川 勝 第11回東北大学多元物質科学研究所研究発表会 2011/12/08 Separation membranes of nanoimprinted PDMS-grafted polyimide Cheol Min Yun, Koichi Nagase, Kiyoshi Yamamoto, Yu Nagase, Masaru Nakagawa 第11回東北大学多元物質科学研究所研究発表会 2011/12/08 離型剤の被覆率変化が光ナノインプリントの離型に与える影響 遠藤 彩子, 小林 敬, 中川 勝 第20回ポリマー材料フォーラム 2011/11/24 フルオロアル キル構造含有アクリレートの添加による光硬化樹脂表面の撥水化と撥油化 伊東 駿也, 尹 哲民, 小林 敬, 中川 勝 2011高分子学会東北支部研究発表会 2011/11/17 Step and repeat UV nanoimprinting under pentafluoropropane gas ambient International-presentation Shuso Iyoshi, Makoto Okada, Kei Kobayashi, Shu Kaneko, Tetsuya Katase, Katsuhiko Tone, Yuichi Haruyama, Masaru Nakagawa, Hiroshi Hiroshima, Shinji Matsui 第24回マイクロプロセス・ナノテクノロジー国際会議 （MNC 2011) 2011/10/24 Silica/UV-cured resin nanocomposites for replica molds in UV nanoimprinting International-presentation Shimpei Kudo, Cheol Min Yun, Koichi Nagase, Shoichi Kubo, Masaru Nakagawa 第24回マイクロプロセス・ナノテクノロジー国際会議 （MNC 2011) 2011/10/24 Changes in weight and viscosity of UV-curable resins and monomers by absorbing a condensable pentafluoropropane gas effective in UV nanoimprint International-presentation Shu Kaneko, Kei Kobayashi, Yoshitaka Tsukidate, Hiroshi Hiroshima, Shinji Matsui, Masaru Nakagawa 第24回マイクロプロセス・ナノテクノロジー国際会議 （MNC 2011) 2011/10/24 Gas permeability of nanoimprinted PDMS-grafted polyimide membranes International-presentation Cheol Min Yun, Kiyoshi Yamamoto, Koichi Nagase, Yu Nagase, Masaru Nakagawa The 10th International Conference on Nanoimprint and Nanoprint Technology (NNT2011) 2011/10/19 Fluorinated 1-octanol working as an adhesive-force-reducing reagent for a UV-curable resin in UV nanoimprinting International-presentation Masaru Nakagwa, Yoshitaka Tsukidate The 10th International Conference on Nanoimprint and Nanoprint Technology (NNT2011) 2011/10/19 Fabrication of noble metal mesh structures by reactive-monolayer-assisted thermal nanoimprint lithography and their application for transparent conductive films 久保 祥一, 永瀬 康一, 大嶽 知之, 姜 義哲, 片岡 浩, 山田 正, 中川 勝 第60回高分子討論会 2011/09/28 Investigation of structures in solution and liquid-crystalline properties of poly(cyanobiphenyloxyalkyl methacrylate)s synthesized by ATRP 久保 祥一, 波多野 慎吾, 彌田 智一, 中川 勝 第60回高分子討論会 2011/09/28 Magnetically guided drug delivery system using magnetic capsules 渕上 輝顕, 河村 亮, 北本 仁孝, 中川 勝, 並木 禎尚 第35回 日本磁気学会学術講演会 2011/09/27 積層型修飾によるペロブスカイト型光触媒における水分解の研究 International-presentation 石原 崇弘, 森 裕貴, Guijun Ma, Fuxiang Zhang, 守屋 映祐, 片山 正士, 久保田 純, 中川 勝, 堂免 一成 第108回触媒討論会 2011/09/20 Application of molecular control of interface function to UV nanoimprint lithography 中川 勝 日本化学会東北支部平成23年度化学系学協会東北大会 2011/09/17 More details Close 依頼 Transparent conductive polymer substrates covered with a silver fish-net structure prepared by reactive-monolayer-assisted thermal nanoimprint lithography International-presentation Koichi Nagase, Masahiko Kawashima, Tomoyuki Ohtake, Eui-Chul Kang, Shoichi Kubo, Masaru Nakagawa 26th European Photovoltaic Solar Energy Conference 2011/09/05 Adhesive forces of a UV-cured resin for UV nanoimprinting affected by antisticking reagents and their surface coverages 遠藤 彩子, 小林 敬, 中川 勝 東北地区高分子若手研究会 高分子学会東北支部 2011/07/27 フォトポリマーナノコンポジット材料の光学特性と耐熱性 工藤 進平, 永瀬 康一, 杉原 興浩, 中川 勝 東北地区高分子若手研究会 高分子学会東北支部 2011/07/27 Transparent conductive polymer substrates with a silver fish-net prepared by reactive-monolayer-assisted thermal nanoimprint lithography 久保 祥一, 中川 勝 NGLワークショップ2011 2011/07/11 Adhesive forces of a resin cured by radical photopolymerization on detachment from silica surfaces modified with antisticking reagents 遠藤 彩子, 小林 敬, 中川 勝 NGLワークショップ2011 2011/07/11 Fluorescent UV-curable resists to evaluate nanoimprinted patterns and antisticking layers International-presentation Invited Masaru Nakagawa International Conference on Materials for Advanced Tschnologies (ICMAT2011) 2011/06/26 界面化学結合型熱ナノインプリントリソグラフィにより得られる透明導電銀樹脂シート 永瀬康一, 久保祥一, 中川 勝 東北大学多元物質科学研究所 高分子・ハイブリッド材料研究センター 2011 PHyM シンポジウム 2011/06/17 光ナノインプリントリソグラフィ用蛍光レジスト −モールド表面へのレジスト付着挙動の追跡− 小林 敬, 中川 勝 東北大学多元物質科学研究所 高分子・ハイブリッド材料研究センター 2011 PHyM シンポジウム 2011/06/17 Resolution limit to observe nanoimprinted patterns using fluorescent molecules International-presentation Tatsuya Tomioka, Kei Kobayashi, Shoichi Kubo, Masaru Nakagawa The 6th International Symposium on Integrated Molecular/Materials Engineering(ISIMME-6) 2011/06/07 Organic-inorganic nanocomposite materials for compact waveguides fabricated by UV-nanoimprinting International-presentation Shu Kaneko, Okihiro Sugihara, Masaru Nakagawa The 6th International Symposium on Integrated Molecular/Materials Engineering(ISIMME-6) 2011/06/07 Phase transition behaviors of homo- and co-polymers from cyanobiphenyloxyalkyl methacrylate synthesized by ATRP International-presentation Invited Shoichi Kubo, Shingo Hadano, Tomokazu Iyoda, Masaru Nakagawa The 6th International Symposium on Integrated Molecular/Materials Engineering(ISIMME-6) 2011/06/07 Adhesion force of UV-cured resin increased by low surface coverage of antisticking layer International-presentation Invited Masaru Nakagawa, Ayako Endo, Kei Kobayashi The 6th International Symposium on Integrated Molecular/Materials Engineering (ISIMME-6) 2011/06/07 Release property of fluorinated silica surfaces for UV-curable resins evaluated by fluorescence microscopy and mechanical measurement International-presentation Invited Masaru Nakagawa The 55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication（EIPBN2011） 2011/05/31 含フッ素離型剤処理シリカ表面に対するラジカル重合型光硬化樹脂の付着力(I)−C8-アルコールの添加効果− 月館義隆, 中川勝 第60回高分子学会年次大会 2011/05/25 有機-無機複合材料を用いた小型光導波路の作製 金子周, 杉原興浩, 中川勝 第60回高分子学会年次大会 2011/05/25 単分子蛍光観測による高分子薄膜の空間的密度分布の解明 久保祥一, 羽渕聡史, Martin Vacha, 中川勝 第60回高分子学会年次大会 2011/05/25 光ナノインプリント成型したZrO2ナノ粒子分散光硬化性樹脂薄膜の耐熱性評価 工藤進平, 永瀬康一, 杉原興浩, 中川勝 第60回高分子学会年次大会 2011/05/25 ポリ(シアノビフェニルオキシアルキル メタクリレート）のATRP法による合成と相転移挙動 久保祥一, 波多野慎悟, 彌田智一, 中川勝 第60回高分子学会年次大会 2011/05/25 界面化学結合型熱ナノインプリントリソグラフィにより作製される網目状銀透明導電樹脂基板 中川勝, 久保祥一 附置研究所間アライアンス「次世代エレクトロニクス」グループ（Ｇ１）分科会 琉球大学ジョイントシンポジウム 2011/05/11 光ナノインプリントにおける界面機能分子制御 中川勝 日本化学会 2011/03/26 離型剤処理シリカ表面に対するラジカル重合型光硬化樹脂の付着力 −トリメトキシシラン誘導体でのアルキル基とフルオロアルキル基の違い− 遠藤彩子, 小林 敬, 中川 勝 第58回応用物理学関係連合講演会 2011/03/24 乾式および液浸式蛍光顕微鏡観察におけるナノインプリントパターンの検出下限 富岡辰弥, 小林敬, 久保祥一, 中川勝 第58回応用物理学関係連合講演会 2011/03/24 界面化学結合型熱ナノインプリントリソグラフィにより作製される網目状銀透明導電樹脂基板 永瀬康一, 川島政彦, 大嶽知之, 姜義哲, 久保祥一, 中川勝 第58回応用物理学関係連合講演会 2011/03/24 高屈折率ハイブリッド材料開発と光回路応用 杉原興浩, 工藤進平, 金子周, 久保祥一, 中川勝 エレクトロニクス実装学会大会 2011/03/08 光ナノインプリントリソグラフィ用蛍光レジスト Invited 小林敬, 中川勝 NGL研究会 2011/02/22 Infiltration of a neutral aqueous solution into thin poly(styrene) films International-presentation Shoichi Kubo, Masaru Nakagawa PACIFICHEM 2010 2010/12/15 Antisticking molecular layers in UV nanoimprint lithography International-presentation Invited Masaru Nakagawa PACIFICHEM 2010 2010/12/15 単分子蛍光観測によるポリ(スチレン)薄膜の空間密度分布の解明 久保祥一, 羽渕聡史, Martin Vacha, 中川勝 第10回東北大学多元物質科学研究所研究発表会 2010/12/01 光ナノインプリントで成型された有機ー無機複合材料の光導波路における曲げ損失 金子周, 杉原興浩, 中川勝 第10回東北大学多元物質科学研究所研究発表会 2010/12/01 光ナノインプリント法による有機−無機複合材料の光導波路 金子周, 杉原興浩, 中川勝 2010高分子学会東北支部研究発表会 2010/11/18 蛍光顕微鏡によるナノインプリントパターンの観察方法に関する研究 富岡辰弥, 小林敬, 久保祥一, 中川勝 2010高分子学会東北支部研究発表会 2010/11/18 Adhesive force measurement of ultrathin antisticking molecular layers against a UV-cured resin for UV nanoimprint International-presentation Ayako Endo, Kei Kobayashi, Masaru Nakagawa JSPS/NRF 4th Joint Seminar 2010/11/11 Submicron Au line patterns fabricated by reactive-monolayer-assisted thermel nanoimprint lithography involving electrodeposition International-presentation Koichi Nagase, Shoichi Kubo, Masaru Nakagawa JSPS/NRF 4th Joint Seminar 2010/11/11 Molecular control of interfacial function in nanoimprint lithography International-presentation Masaru Nakagawa JSPS/NRF 4th Joint Seminar 2010/11/11 Step and Repeat UV nanoimprinting in pentafluoropropane suppressing resin adhesion to a fluorinated mold surface proved by fluorescent microscopy International-presentation Kei Kobayashi, Shoichi Kubo, Hiroshi Hiroshima, Shinji Matsui, Masaru Nakagawa The 23rd International Microprocesses and Nanotechnology Conference (MNC2010) 2010/11/09 Optical property and UV nanoimprinting of ZrO2-nanoparticles/photopolymer composites International-presentation Shimpei Kudo, Koichi Nagase, Shoichi Kubo, Okihiro Sugihara, Masaru Nakagawa The 23rd International Microprocesses and Nanotechnology Conference (MNC2010) 2010/11/09 Resist pattern Inspection using fluorescent dye-doped poly(styrene) thin films in reactive monolayer-assisted thermal nanoimprint lithography International-presentation Shoichi Kubo, Yuko Sato, Masaru Nakagawa The 23rd International Microprocesses and Nanotechnology Conference (MNC2010) 2010/11/09 Research and development on process science and CD control in high-throughput UV nanoimprint International-presentation Invited Shinji Matsui, Hiroshima Hiroshi, Yoshihiko Hirai, Masaru Nakagawa The 23rd International Microprocesses and Nanotechnology Conference (MNC2010) 2010/11/09 磁性ナノ粒子集積体の超臨界水熱処理による籠型構造微粒子の作製 北本仁孝, 渕上輝顕, 河村亮, 山崎陽太郎, 中川勝, 長瀬有貴, 並木禎尚 粉体粉末冶金協会平成22年度秋季大会 2010/11/09 ラジカル系光硬化樹脂に対するフッ化炭化水素鎖含有吸着単分子膜のはく離特性 鴻野晃洋, 中川勝 電子情報通信学会 有機エレクトロニクス研究会(OME) 2010/10/22 Research and development on process science and CD control in high-throughput UV nanoimprint International-presentation Shinji Matusi, Hiroshima Hiroshi, Yoshihiko Hirai, Masaru Nakagawa 2010 International Symposium on Lithography Extensions 2010/10/20 Evaluation of interaction between antisticking layer and UV-curable resin by scanning probe microscopy International-presentation Invited M. Okada, M. Iwasa, Y. Haruyama, K. Kanda, K. Kuramoto, M. Nakagawa, S. Matsui The 9th International Conference on Nanoimprint and Nanoprint Technology (NNT 2010) 2010/10/13 Flurorescent radical photopolymerization resin and its advantages in UV nanoimprinting International-presentation Kei Kobayashi, Shoichi Kubo, Hiroshima Hiroshi, Shinji Matsui, Masaru Nakagawa The 9th International Conference on Nanoimprint and Nanoprint Technology (NNT 2010) 2010/10/13 Reactive-monolayer-assisted thermal nanoimprint lithography for fine metal patterning International-presentation Shoichi Kubo, Koichi Nagase, Masaru Nakagawa The 9th International Conference on Nanoimprint and Nanoprint Technology (NNT 2010) 2010/10/13 界面化学結合型熱ナノインプリントリソグラフィにより得られる電解析出金パターン 永瀬康一, 久保祥一, 中川勝 平成22年度化学系学協会東北大会 2010/09/25 光硬化性蛍光レジストによる光ナノインプリントプロセスでの成型不良の発生機構の解明 小林敬, 久保祥一, 松井真二, 中川勝 平成22年度化学系学協会東北大会 2010/09/25 Study of antisticking molecular layers showing low adhesive forces and high durability to UV-cured resin for UV nanoimprint International-presentation Ayako Endo, Kei Kobayashi, Masaru Nakagawa ISIMME2010 2010/09/22 UV nanoimprinting of epoxy-based and acrylate-based UV-curable composite resins International-presentation Shimpei Kudo, Koichi Nagase, Okihiro Sugihara, Masaru Nakagawa ISIMME2010 2010/09/22 Synthesis of zinc oxide nanocrystals in basic ethanol and methanol solutions International-presentation Shoichi Kubo, Masaru Nakagawa ISIMME2010 2010/09/22 UV nanoimprinting and defect inspection using fluorescent resists International-presentation Masaru Nakagawa, Kei Kobayashi, Shoichi Kubo ISIMME2010 2010/09/22 塩基性アルコール中における酸化亜鉛ナノロッドの合成および発光特性 久保祥一, 中川勝 第59回高分子討論会 2010/09/15 界面化学結合型熱ナノインプリントリソグラフィにおけるポリ(スチレン）薄膜のレジスト機能 久保祥一, 中川勝 第59回高分子討論会 2010/09/15 表面修飾ZrO2ナノ粒子分散光硬化性樹脂薄膜の光学特性と成形性 工藤進平, 永瀬康一, 久保祥一, 中川勝 第59回高分子討論会 2010/09/15 光ナノインプリント用光硬化性樹脂に対する離型分子層の付着力測定によりはく離特性 遠藤彩子, 小林敬, 松井真二, 中川勝 第59回高分子討論会 2010/09/15 走査型プローブ顕微鏡による離型膜とUVナノインプリントレジストとの付着力評価 岡田真, 岩佐真行, 春山雄一, 神田一浩, 倉本圭, 中川勝, 松井真二 2010年秋季第71回応用物理学会学術講演会 2010/09/14 光ナノインプリントにおける界面機能分子制御 中川勝 2010年秋季第71回応用物理学会学術講演会 2010/09/14 界面化学結合型熱ナノインプリントリソグラフィと電解金めっきによる金パターン形成と光反応性単分子膜による効果 永瀬康一, 大嶽知之, 姜義哲, 久保祥一, 中川勝 2010年秋季第71回応用物理学会学術講演会 2010/09/14 ベンゾフェノン基含有光反応性単分子膜による光硬化樹脂-Siウエハ界面の密着性の向上 小林敬, 栗原正彰, 法元盛久, 松井真二, 中川勝 2010年秋季第71回応用物理学会学術講演会 2010/09/14 UV-NIL用蛍光レジストによるモールド表面への樹脂付着挙動の追跡 小林敬, 久保祥一, 大幸武司, 松井真二, 中川勝 2010年秋季第71回応用物理学会学術講演会 2010/09/14 Semitransparent conductive porous Au thin films prepared by dewetting controlled spincoating of thiol-passivated Au nanoparticle solution International-presentation Koichi Nagase, Masahiko Kawashima, Masaru Nakagawa 25th European Photovoltaic Solar Energy Conference and Exhibition (25th EU PVSEC) 2010/09/06 ZrO2ナノ粒子を含むアクリル系およびエポキシ系光硬化性樹脂の光学特性 工藤進平, 杉原興浩, 中川勝 東北支部夏季ゼミ 2010/08/02 光ナノインプリント用光硬化性樹脂に対するフッ素含有離型分子層の付着力測定 遠藤彩子, 鴻野晃洋, 小林敬, 中川勝 東北支部夏季ゼミ 2010/08/02 蛍光レジストによるナノインプリント転写評価 Invited 中川勝 学術振興会第132委員会 2010/07/30 ZrO2ナノ粒子を含むアクリル系およびエポキシ系光硬化性樹脂の屈折率と透明性評価 工藤進平, 永瀬康一, 中川勝, 杉原興浩 高分子学会夏期大学 2010/07/14 光ナノインプリント用光硬化樹脂に対する低付着力離型分子層の探索 遠藤彩子, 鴻野晃洋, 小林敬, 中川勝 高分子学会夏期大学 2010/07/14 界面化学結合型熱ナノインプリントリソグラフィの電解金めっきへの応用 永瀬康一, 久保祥一, 中川勝 高分子学会夏期大学 2010/07/14 光ナノインプリント用蛍光レジスト：樹脂パターン検査技術への応用と離型メカニズムの可視化 小林敬, 久保祥一, 中川勝 高分子学会夏期大学 2010/07/14 ポリ（スチレン）薄膜における金ウエットエッチング水溶液の透過挙動 久保祥一, 中川勝 高分子学会夏期大学 2010/07/14 蛍光レジストによる光ナノインプリントプロセスの可視化 小林敬, 中川勝, 廣島洋, 松井真二 次世代リソグラフィ技術研究会(NGL2010) 2010/07/12 UV nanoimprinting of UV-curable resins containing ZrO2 nanoparticles International-presentation Shimpei Kudo, Okihiro Sugihara, Masaru Nakagawa The 3rd Asian Symposium on Nano Imprint Lithography (ASNIL 2010) 2010/06/30 Facile molding of poly(styrene) thin film using plasticizer visualized by fluorescent microscopy International-presentation Shoichi Kubo, Yuko Sato, Masaru Nakagawa The 3rd Asian Symposium on Nano Imprint Lithography (ASNIL 2010) 2010/06/30 Mechanical measurement system for detecting adhesion forces generated between UV-cured resin and modified silica surfaces International-presentation Masaru Nakagawa, Akihiro Kohno, Shinji Matsui The 3rd Asian Symposium on Nano Imprint Lithography (ASNIL 2010) 2010/06/30 Optical property of UV-cured resins containing surface-modified ZrO2 nanoparticles International-presentation Shimpei Kudo, Okihiro Sugihara, Masaru Nakagawa JJPS/NRF 3rd Joint Seminar 2010/06/24 Visualization of UV-nanoimprinted process using fluorescent UV-curable resists International-presentation Kei Kobayashi, Shoichi Kubo, Masaru Nakagawa JJPS/NRF 3rd Joint Seminar 2010/06/24 Semitransparent conductive porous Au films on a thiol-containing primer layer formed from Au nanoparticle ink International-presentation Koichi Nagase, Masahiko Kawashima, Masaru Nakagawa The 27th International Conference of Photopolymer Science and Technology Materials & Processes for Advanced Microlithography and Nanotechnology (ICPST-27) 2010/06/22 Reactive-monolayer-assisted thermal nanoimprint lithography with benzophenone-containing trimethoxysilane derivative for fabrication of patterned chromium and copper thin films International-presentation Shoichi Kubo, Tomoyuki Ohtake, Eui-Chul Kang, Masaru Nakagawa The 27th International Conference of Photopolymer Science and Technology Materials & Processes for Advanced Microlithography and Nanotechnology (ICPST-27) 2010/06/22 Formation of adsorbed monolayer from pentafluorophenyltriethoxysilane and its antisticking property to a UV-curable resin studied by Highly Sensitive UV-visible spectroscopy International-presentation Sosuke Korenaga, Kei Kobayashi, Akihiro Kohno, Shoichi Kubo, Masaru Nakagawa The 27th International Conference of Photopolymer Science and Technology Materials & Processes for Advanced Microlithography and Nanotechnology (ICPST-27) 2010/06/22 ナノインプリントリソグラフィにおける光の利用と界面機能分子制御 Invited 中川勝 第49回湘北地区懇話会 2010/06/10 Research and development on process science and CD control in high-throughput UV nanoimprint International-presentation Invited Shinji Matsui, Hiroshima Hiroshi, Yoshihiko Hirai, Masaru Nakagawa The 54th International Conference on Electron, Ion, and Photon Beam Technologiy and Nanofabrication (EIPBN2010) 2010/06/01 Facile wide-scale defect detection of UV-nanoimprinted resist patterns by fluorescent microscopy International-presentation Kei Kobayashi, Shoichi Kubo, Shinji Matsui, Masaru Nakagawa The 54th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN2010) 2010/06/01 ラジカル系光硬化樹脂に対するフルオロアルキル基含有吸着単分子膜のはく離特性 中川勝, 鴻野晃洋, 月館義隆, 松井真二 第59回高分子年次大会 2010/05/26 ポリ（塩化ジアリルジメチルアンモニウム)修飾シリカ微粒子表面へのFePtナノ粒子の集積化とシリカ微粒子のアルカリ溶出による磁性ソフトシェル微粒子の形成 渕上輝顕, 河村亮, 中川勝, 並木禎尚, 北本仁孝 第59回高分子年次大会 2010/05/26 ポリ(塩化ジアリルジメチルアンモニウム)修飾シリカ微粒子表面へのFePtナノ粒子の集積化と超臨界水熱処理によるFePt網目状微粒子の形成 河村亮, 長瀬有貴, 玉尾有加, 渕上輝顕, 北本仁孝, 並木禎尚, 中川勝 第59回高分子年次大会 2010/05/26 ポリ（スチレン）薄膜の金のウエットエッチングに対するレジスト機能 佐藤祐子, 月館義隆, 久保祥一, 中川勝 第59回高分子年次大会 2010/05/26 界面化学結合型熱ナノインプリントリソグラフィ(IV)ー金の電解析出に対するレジストライン幅の影響ー 永瀬康一, 大嶽知之, 姜義哲, 久保祥一, 中川勝 第59回高分子年次大会 2010/05/26 ナノインプリント密着層および離型層の材料化学 Invited 中川勝 日本化学会ATP（ナノインプリント） 2010/03/26 残膜除去プロセスによるポリ（スチレン）薄膜内部の親水化 久保祥一, 佐藤祐子, 中川勝 2010年春季第57回応用物理学関係連合講演会 2010/03/17 蛍光色素含有高分子による熱ナノインプリント成型時の可塑化効果の可視化 佐藤祐子, 久保祥一, 中川勝 2010年春季第57回応用物理学関係連合講演会 2010/03/17 UV-NIL用蛍光レジストによるモールド表面への樹脂付着の検出 小林敬, 久保祥一, 坂井信支, 松井真二, 中川勝 2010年春季第57回応用物理学関係連合講演会 2010/03/17 高感度紫外可視分光法によるフッ素含有吸着単分子膜への光硬化樹脂の付着の検討 是永宗祐, 鴻野晃洋, 久保祥一, 中川勝 2010年春季第57回応用物理学関係連合講演会 2010/03/17 ナノインプリントリソグラフィにおける界面機能分子制御 Invited 中川勝 平成22年東北ポリマー懇話会 2010/01/22 離型剤の再塗布により改善される光硬化樹脂のはく離 鴻野晃洋, 中川勝 第9回東北大学多元物質科学研究所研究発表会 2009/12/10 UV/オゾン処理によるポリ(スチレン）薄膜のウエットエッチング耐性変化 佐藤祐子, 月館義隆, 久保祥一, 中川勝 第9回東北大学多元物質科学研究所研究発表会 2009/12/10 FePtナノ粒子吸着シリカ微粒子の作製 河村亮, 工藤有希子, 並木禎尚, 中川勝 第9回東北大学多元物質科学研究所研究発表会 2009/12/10 光硬化樹脂のはく離 Invited 中川勝 Semicon Japan 2009/12/02 光ナノインプリント用蛍光レジストII 小林敬, 坂井信支, 松井真二, 中川勝 第18回ポリマー材料フォーラム 2009/11/26 マイクログラビア塗工方式による磁性導電性棒状フィラーを含む光硬化性樹脂薄膜の作製と導電性評価 小林敬, 落合博, 中川勝 第18回ポリマー材料フォーラム 2009/11/26 親油性金ナノ粒子溶液からの多孔塗膜構造とレジスト機能 永瀬康一, 川島政彦, 中川勝 第18回ポリマー材料フォーラム 2009/11/26 界面化学結合型ナノインプリントリソグラフィによる高分子薄膜の成型と金属膜の微細加工 Invited 中川勝 第18回ポリマー材料フォーラム 2009/11/26 ZrO2ナノ粒子分散光硬化性樹脂の作製 工藤進平, 杉原興浩, 中川勝 2009年高分子学会東北支部研究発表会 2009/11/19 熱ナノインプリント用蛍光レジストにおけるドライエッチングの影響 佐藤祐子, 久保祥一, 中川勝 2009年高分子学会東北支部研究発表会 2009/11/19 ペンタフルオロフェニルトリエトキシシランの吸着単分子膜の形成挙動と光硬化性樹脂のはく離特性 是永宗祐, 鴻野晃洋, 久保祥一, 中川勝 2009年高分子学会東北支部研究発表会 2009/11/19 Influence of recoating a silica surface with antisticking layers formed from fluoroalkyl-containing trimethoxysilane derivatives by chemical vapor modification International-presentation Akihiro Kohno, Nobuji Sakai, Shinji Matsui, Masaru Nakagawa MNC2009 2009/11/19 Fluorescent UV-curable resists for UV nanoimprint lithography International-presentation Kei Kobayashi, Nobuji Sakai, Shinji Matsui, Masaru Nakagawa MNC2009 2009/11/18 Resist properties of poly(methyl methacrylate) and poly(styrene) thin films patterned by thermal nanoimprint lithography for Au electrodeposition International-presentation Koichi Nagase, Shoichi Kubo, Masaru Nakagawa MNC2009 2009/11/18 Growth behavior of an adsorbed monolayer from a benzophenone-containing trimethoxysilane derivative on a fused silica surface by chemical vapor surface modification International-presentation Shoichi Kubo, Masaru Nakagawa MNC2009 2009/11/17 光硬化性樹脂のはく離に生じる力の測定 Invited 中川勝 MNC2009技術セミナー 2009/11/16 体内深部での利用を目指した磁気装置の開発 並木禎尚, 中川勝, 北本仁孝, 石井由希子 第31回バイオマテリアル学会大会 2009/11/16 がん治療用磁気ドラッグデリバリーシステムへの応用を目指した体内深部に移植可能な磁気照射装置の開発 第47回日本人工臓器学会大会 2009/11/12 金属アレルギーを回避できる癌治療用デバイスの開発−動物モデルを用いた基礎的検討− 並木禎尚, 中川勝, 北本仁孝, 石井由希子 第39回日本皮膚アレルギー・接触皮膚炎学会総会学術大会 2009/11/06 Reactive-monolayer-assisted thermal nanoimprint lithography International-presentation Invited Masaru Nakagawa ISIMME2009 2009/10/27 Synthesis of zinc oxide nanorods by simple reaction route in basic ethanol International-presentation Shoichi Kubo, Masaru Nakagawa ISIMME2009 2009/10/27 Enhanced durability of antisticking layers formed from fluoroalkyl-containing trimethoxysilane derivatives to UV nanoimprint by repeated chemical vapor surface modification International-presentation Akihiro Kohno, Masaru Nakagawa ISIMME2009 2009/10/27 Surface adsorption of oleic acid-passivated FePt nanoparticles on a silica microspheres with a mercaptopropyl surface International-presentation Ryo Kawamura, Yoshihisa Namiki, Masaru Nakagawa ISIMME2009 2009/10/27 ナノ粒子分散ハイブリッドポリマーの創製と積層膜応用 杉原興浩, 倉田優生, 戒能俊邦, 中川勝 第58回高分子討論会 2009/09/17 ポリスチレン微粒子とシリカ微粒子表面への表面修飾FePtナノ粒子の吸着挙動 河村亮, 工藤有希子, 中川勝, 北本仁孝, 並木禎尚 第58回高分子討論会 2009/09/17 表面修飾FePtナノ粒子の合成と特性 河村亮, 中川勝, 北本仁孝, 並木禎尚 第58回高分子討論会 2009/09/17 界面化学結合型熱ナノインプリントリソグラフィ(III)−熱ナノインプリント用蛍光レジスト− 佐藤祐子, 永瀬康一, 久保祥一, 中川勝 第58回高分子討論会 2009/09/17 界面化学結合型熱ナノインプリントリソグラフィ（II)−電解めっきによるサブミクロン金パターンの形成− 永瀬康一, 大嶽知之, 高岡利明, 久保祥一, 中川勝 第58回高分子討論会 2009/09/17 界面化学結合型熱ナノインプリントリソグラフィ（I)−和周波発生分光法による単分子膜の光グラフト反応の追跡− 小田博和, 恩田健, 中川勝 第58回高分子討論会 2009/09/17 均一形状の磁性導電性ニッケル棒状フィラーの作製と光実装型異方導電高分子シートへの応用 小林敬, 中川勝 第58回高分子討論会 2009/09/16 離型分子層の高耐久性化へのアプローチ Invited 並木禎尚, 中川勝, 北本仁孝, 石井由希子 2009年秋季第70回応用物理学会学術講演会 2009/09/08 光ナノインプリント用蛍光レジストの開発 Masaru Nakagawa 2009年秋季第70回応用物理学会学術講演会 2009/09/08 光硬化性樹脂の繰り返し剥離における離型剤再塗布の効果 Shoichi Kubo, Masaru Nakagawa 2009年秋季第70回応用物理学会学術講演会 2009/09/08 光ナノインプリントリソグラフィによるレジストパターンの造形 小林敬, 中川勝 第37回東北地区高分子若手研究会夏季ゼミナール 2009/07/30 界面化学結合型熱ナノインプリントリソグラフィによるポリスチレン成型と電解めっきによる金薄膜のマイクロサイズ加工 永瀬康一, 久保祥一, 中川勝 第37回東北地区高分子若手研究会夏季ゼミナール 2009/07/30 光架橋型単分子密着層を特徴とする界面化学結合型熱ナノインプリントリソグラフィ 久保祥一, 小田博和, 中川勝 第37回東北地区高分子若手研究会夏季ゼミナール 2009/07/30 光反応性密着層を特徴とするナノインプリント法 Invited 中川勝 第31回ナノテク部会研究会 2009/07/09 Photo-induced grafit reactions of 4-methoxybenzophenone with thermoplastic polymers designed for reactive-monolayer-assisted thermal nanoimprint lithography Tomoyuki Ohtake, Toshikaki Takaoka, Hirokazu Oda, Masaru Nakagawa 26th International Conference of Photopolymer Science and Technology (ICPST-26) 2009/07/01 Optical monitoring of a poly8styrene) residual layer on a photocrosslinkable monolayer in thermal nanoimprint lithography Koichi Nagase, Tomoyuki Ohtake, Toshiaki Takaoka, Shoichi Kubo, Masaru Nakagawa 26th International Conference of Photopolymer Science and Technology (ICPST-26) 2009/07/01 Dewetting photocontrol of poly(styrene) thin films by a photocrosslinkable monolayer in thermal nanoimprint lithography Hirokazu Oda, Tomoyuki Ohtake, Toshiaki Takaoka, Masaru Nakagawa 26th International Conference of Photopolymer Science and Technology (ICPST-26) 2009/07/01 光反応性吸着単分子膜上におけるポリ（スチレン）薄膜の脱ぬれの光制御 小田博和, 大嶽知之, 高岡利明, 中川勝 第58回高分子年次大会 2009/05/27 マイクログラビア塗工方式による光硬化型異方導電高分子シートの作製 小林敬, 落合博, 中川勝 第58回高分子年次大会 2009/05/27 熱ナノインプリント―電解めっき法によるマイクロ金バンプの作製 永瀬康一, 大嶽知之, 高岡利明, 中川勝 第56回応用物理学関係連合講演会 2009/03/30 樹脂の繰り返し光硬化によるフッ素系シランカップリング剤単分子膜の構造変化 鴻野晃洋, 坂井信支, 松井真二, 中川勝 第56回応用物理学関係連合講演会 2009/03/30 アニールによるF-SAMの構造変化観察 岡田真, 中松健一郎, 姜有志, 春山雄一, 神田一浩, 中川勝, 松井真二 第56回応用物理学関係連合講演会 2009/03/30 ナノインプリントリソグラフィによる金属パターン形成 Invited 中川勝 第5回高分子学会東北地区若手セミナー 2009/03/09 ポリ（スチレン）薄膜の熱ナノインプリント成型における光架橋型吸着膜のパーシャルフィル抑制効果 小田博和, 大嶽知之, 高岡利明, 中川勝 多元物質科学研究所発表会 2008/12/11 無機酸化物ナノ粒子分散ハイブリッド高分子の光学特性と応用 倉田優生, 杉原興浩, 小松京嗣, 中川勝 多元物質科学研究所発表会 2008/12/11 親油性金ナノ粒子溶液からの塗膜形成 永瀬康一, 川島政彦, 中川勝 第17回ポリマー材料フォーラム 2008/11/27 光硬化型異方導電高分子シート(II) 小林敬, 中川勝 第17回ポリマー材料フォーラム 2008/11/27 Photo-curable anisotropic conductive polymer sheet International-presentation Kei Kobayashi, Masaru Nakagawa 3rd Internal Symposium on Integrated Molecular / Materials Engineering (ISIME2008) 2008/11/07 Optical study on poly(styrene) resist patterns prepared by thermal nanoimprint lithography International-presentation Koichi Nagase, Masaru Nakagawa 3rd Internal Symposium on Integrated Molecular / Materials Engineering (ISIME2008) 2008/11/07 Thermal nanoimprinting of poly(styrene) and poly(4-vinylpyridine) double-layered thin films and internal-structure visualization by TEM International-presentation Invited Masaru Nakagawa 3rd Internal Symposium on Integrated Molecular / Materials Engineering (ISIME2008) 2008/11/07 Submicron pattern of a gold thin film by thermal nanoimprint and wet-etching with a photo-crosslinkable thiol-type monolayer International-presentation Hirokazu Oda, Tomoyuki Ohtake, Toshiaki Takaoka, Masaru Nakagawa 3rd Internal Symposium on Integrated Molecular / Materials Engineering (ISIME2008) 2008/11/06 Thermal nanoimprinting and visualization of poly(styrene) and poly(4-vinylpyridine) double-layered thin films designed for electroless deposition International-presentation Masaru Nakagawa, Noriyoshi Kamata 21st, International Macroprocesses and Nanotechnology Conference (MNC2008) 2008/10/29 Profiling of a poly(styrene) residual layer in hot emboss using a mm-scale mold by a reflective thickness monitor International-presentation Koichi Nagase, Masaru Nakagawa 7th International Conference on Nanoimprint and Nanoprint Technology (NNT08) 2008/10/14 Photo-induced chemisorption of poly(styrene) resist suppressing partial filling in thermal nanoimprint lithography International-presentation Hirokazu Oda, Tomoyuki Ohtake, Toshiaki Takaoka, Masaru Nakagawa 7th International Conference on Nanoimprint and Nanoprint Technology (NNT08) 2008/10/14 Show all Show first 5 Industrial Property Rights 85 Method for producing substrate wtih fine projection-and-recess pattern, and substrate with fine projection-and-recess pattern obtained thereby Masaru Nakagawa, Takuya Uehara, Kazuro Nagase, Hiroaki Ikedo US 10,613,433 B2 Property Type: Patent 位置合わせ方法、インプリント方法、及びインプリント装置 松原信也, 阿部誠之, 石戸洋太, 久保祥一, 中川勝 特許6669432 Property Type: Patent 微細凹凸パターン付き基板の製造方法 永瀬和郎, 池戸裕明, 中川勝, 上原卓也 特許第6005698号 Property Type: Patent ナノインプリント用複製モールド 中川勝, 工藤進平, 尹哲民, 永瀬康一, 久保祥一 特許第5879086号 Property Type: Patent ウエットエッチング用基板及び金属パターンを有する基板の製造方法 大嶽知之, 姜義哲, 中川勝, 久保祥一 特許第5774814号 Property Type: Patent 光硬化樹脂の特性試験装置、その試験装置で使用する保持具、特性試験方法 金田匡規, 中川勝, 鴻野晃洋 特許第5583374号 Property Type: Patent チオール基含有感紫外線化合物および、その用途 中川 勝, 小田博和, 大嶽知之, 高岡利明 特許第5301872号 Property Type: Patent 限外濾過膜およびその製造方法、並びにナノ粒子のサイズ分別方法 中川 勝, 多賀谷基博, 古川英光, 彌田智一 特許第4874179号 Property Type: Patent 光メタセンシング 商標 登録第6747732号 Property Type: Photonic Meta Sensing 商標 登録第6747733号 Property Type: Holder: デクセリアルズ株式会社，国立大学法人東北大学 光ナノインプリント用硬化性組成物 新田真也, 木津智仁, 中川勝, 伊東駿也 特許第7369786号 Property Type: Patent Holder: サンアプロ株式会社, 国立大学法人東北大学 電解コンデンサ用電極箔およびその製造方法 壷井祐樹, 中坊徹, 北野匡章, 木村秀基, 白石篤志, 中川勝, 伊東駿也 特許第7313013号 Property Type: Patent 高耐熱性合金ナノ粒子溶液 中村貴宏, 中川勝, 早川俊昭 特許7198548 Property Type: Patent パターン形成方法、凹凸構造体の製造方法及びレプリカモールドの製造方法 小田博和, 大川泰央, 飯村慶太, 法元盛久, 須向一行, 中川勝 特許7082694 Property Type: Patent パターン形成方法及び凹凸構造体の製造方法 特許7023391 Property Type: Patent インプリント装置、インプリント装置の運転方法及びデバイスの製造方法 原巧, 佐藤永治, 木口屋秀成, 中川勝, 鈴木剛人, 佐藤卓広, 草野大 特許6989764 Property Type: Patent パターン形成方法及び凹凸構造体の製造方法 伊藤公夫, 小田博和, 大川泰央, 法元盛久, 須向一行, 中川勝 特許6940939 Property Type: Patent Holder: 大日本印刷， 国立大学法人東北大学 パターン形成方法、凹凸構造体の製造方法及びレプリカモールドの製造方法 小田博和, 大川泰央, 飯村慶太, 法元盛久, 須向一行, 中川勝 特許6940940 Property Type: Patent Holder: 大日本印刷， 国立大学法人東北大学 インプリント装置、インプリント装置の運転方法及びデバイスの製造方法 原巧, 佐藤永治, 木口屋秀成, 中川勝, 永瀬和郎, 野々田剛 特許6936986 Property Type: Patent Holder: 旭化成エンジニアリング株式会社, 国立大学法人東北大学, 株式会社ミノグループ インプリント装置、インプリント装置の運転方法及びデバイスの製造方法 原巧, 佐藤永治, 木口屋秀成, 中川勝, 永瀬和郎, 野々田剛 特許6936985 Property Type: Patent Holder: 旭化成エンジニアリング株式会社, 国立大学法人東北大学, 株式会社ミノグループ 位置合わせ方法、インプリント方法およびインプリント装置 松原信也, 阿部誠之, 中川勝, 菊地英里 特許6864443 Property Type: Patent Holder: 旭化成株式会社, 国立大学法人東北大学 発電素子、発電装置、電子機器、及び発電素子の製造方法 安田拓夫, 中川勝, 中村貴宏, 早川俊昭 特許6845521 Property Type: Patent Holder: 株式会社GCEインスティチュート, 国立大学法人東北大学 More details Close 台湾202232875 発電素子、及び発電素子の製造方法 後藤博史, 中川勝, 中村貴宏, 稲秀樹 特許6781437 Property Type: Patent 第一被覆ナノ粒子の製造方法及びコロイド溶液の製造方法 中村貴宏, 中川勝, 後藤博史, 稲秀樹 特許6781438 Property Type: Patent パターン形成方法及びレプリカモールドの製造方法 法元盛久, 伊藤公夫, 小田博和, 大川泰央, 中川勝 特許6757241 Property Type: Patent 光ナノインプリント用硬化性組成物 白石篤志, 中川勝, 関健斗 特許6723888 Property Type: Patent 電解コンデンサ用電極箔の製造方法 石川康幸, 中坊徹, 久保祥一, 月館義隆, 中川勝 特許6717489 Property Type: Patent 位置合わせ方法、積層体の製造方法、位置合わせ装置、積層体製造装置、及び積層体 中川勝, 原田スバル, 早川俊昭 Property Type: Patent 磁性粒子、及びその製造方法、並びに磁性粒子含有製剤 並木禎尚, 北本仁孝, 渕上輝顕, 河村亮, 中川勝 Property Type: Patent 位置合わせ方法、積層体の製造方法、位置合わせ装置、積層体製造装置、および積層体 中川勝, 原田スバル, 早川俊昭 Property Type: Patent 低温修復用の貴金属合金ナノ粒子ろう材 (レーザー合成合金ナノ粒子) 中川勝, 中村貴宏, 早川俊昭 Property Type: Patent インプリントモールドおよびその製造方法ならびに再生インプリントモールドの製造方法 山崎裕之, 安藤雅郎, 竹内正樹, 中川勝, 伊東駿也 Property Type: Patent 防食コーティング用光硬化性組成物およびその硬化被膜 北野匡章, 木村秀基, 白石篤志, 中川勝, 伊藤駿也, 中坊徹 Property Type: Patent 個体認証用構造体及びその製造方法並びに個体認証方法 安藤雅郎, 山崎裕之, 竹内正樹, 中川勝, 伊東駿也 Property Type: Patent More details Close 台湾202213137 (2022.4.1) 熱可塑性樹脂のアブレーション加工方法 盛田祐輔, 中坊徹, 中川勝, 中村貴宏, 早川俊昭 Property Type: Patent 電解コンデンサ用電極箔の製造方法 石川康幸, 中坊徹, 中川勝 Property Type: Patent 光ナノインプリントのアライメント方法、および基板 中川勝, 早川俊昭 Property Type: Patent 導電膜 柿沼文一, 藤野昌男, 奈良崎亘, 栗原啓 田中武, 中川勝, 早川俊昭, 中村貴宏 Property Type: Patent 試験装置および試験方法 柿沼文一, 藤野昌男, 奈良崎亘, 栗原啓 田中武, 中川勝, 早川俊昭, 中村貴宏 Property Type: Patent 発電素子 阿部誠之, 石原照也, 中川勝 Property Type: Patent インプリント印刷装置 野々田剛, 池戸裕明, 中川勝 Property Type: Patent ウェットエッチング用基板 大嶽知之, 姜義哲, 中川勝, 久保祥一 特許第5782161号 Property Type: Patent 開始剤修飾ナノロッド及びその製造方法、グラフト化ナノロッド及びその製造方法、グラフト化ナノロッド分散液晶、グラフト化ナノロッド分散液晶配向膜、偏光光学素子、並びに、キャップ剤修飾ナノロッド 成田麻美子, 渡辺修, 林田研一, 久保祥一, 田口怜, 中川勝 特許第6091232号 Property Type: Patent 開始剤修飾ナノロッド及びその製造方法、グラフト化ナノロッド及びその製造方法、グラフト化ナノロッド分散液晶、グラフト化ナノロッド分散液晶配向膜、偏光光学素子、並びに、キャップ剤修飾ナノロッド 成田麻美子, 渡辺修, 林田研一, 久保祥一, 田口怜, 中川勝 Property Type: Patent 光硬化物の製造方法 中川勝, 月館義隆, 大幸武司, 三宅弘人 Property Type: Patent 光インプリント方法 中川勝, 伊東駿也, 尹哲民, 大幸武司, 三宅弘人, 湯川隆生 特許第6090732号 Property Type: Patent 金属膜パターン付き基体の製造方法 中川勝, 永瀬康一, 久保祥一 特許第5818252号 Property Type: Patent レジストパターン形成方法、並びにそれを用いたナノインプリント用モールド、フォトマスク及び半導体デバイスの製造方法 法元盛久, 福田雅治, 河野佑介, 中川勝 特許第5860244号 Property Type: Patent 光硬化物の製造方法 中川勝, 月館義隆, 大幸武司, 三宅弘人 Property Type: Patent 蛍光レジスト組成物および、その用途 大嶽知之, 中川勝, 川島政彦, 高岡利明, 久保祥一 特許第5397941号 Property Type: Patent 電磁波制御材の製造方法、及び電磁波制御材 川島政彦, 中川勝, 大嶽知之, 高岡利明 Property Type: Patent ナノインプリント成型積層体の検査方法 大嶽知之, 中川勝, 川島政彦, 高岡利明, 久保祥一 Property Type: Patent 金属配線基板の製造方法、及び金属配線基板 川島政彦, 中川勝, 大嶽知之, 高岡利明 Property Type: Patent 透明導電基板の製造方法、及び透明導電基板 川島政彦, 中川勝, 永瀬康一, 大嶽知之, 高岡利明 Property Type: Patent パターン形成用光硬化性組成物及びこれを用いた膜厚測定方法 坂井信支, 平澤玉乃, 小林敬, 中川勝 Property Type: Patent 太陽電池用基板及び太陽電池用基板の製造方法 中川勝, 川島政彦 Property Type: Patent 光硬化樹脂の特性試験装置、その試験装置で使用する保持具、特性試験方法 金田匡規, 中川勝, 鴻野晃洋 Property Type: Patent 光硬化樹脂の特性試験装置、その試験装置で使用する保持具、特性試験方法 金田匡規, 中川勝, 鴻野晃洋 Property Type: Patent 光硬化樹脂の特性試験装置、その試験装置で使用する保持具、特性試験方法 金田匡規, 中川勝, 鴻野晃洋 Property Type: Patent 光硬化樹脂の特性試験装置、その試験装置で使用する保持具、特性試験方法 金田匡規, 中川勝, 鴻野晃洋 特許第1149103号 Property Type: Patent 金属パターンを有する基板の製造方法、およびその基板 中川勝, 永瀬康一, 大嶽知之, 高岡利明 特許第5196489号 Property Type: Patent 金属線を有する基板及びその製造方法 川島政彦, 中川 勝 Property Type: Patent 多孔質膜及びこれを用いた透明電極 川島政彦, 中川 勝 特許第5432486号 Property Type: Patent 異方導電性樹脂組成物、異方導電性部材、及びその実装方法、並びに電子機器 中川 勝, 小林敬, 長嶋太一, 川崎真一, 落合 博 Property Type: Patent 導電性磁性粉体 中川勝, 小田博和 Property Type: Patent 印刷用シリコーン膜及び金属パターン印刷方法 中川勝, 多賀谷基博, 彌田智一 Property Type: Patent カチオン性ポリマー、カチオン性ポリマー吸着粉体、薄膜被覆粉体及びそれを含む皮膚外用剤 勝山智祐, 秦英夫, 中川勝 特許第4847762号 Property Type: Patent カチオン性ポリマー 勝山智祐, 秦英夫, 中川勝 Property Type: Patent 金属被覆物、金属配線基板及びそれらの製造方法 中川勝, 鈴木悠二, 名輪希, 彌田智一 Property Type: Patent 高分子微粒子の電荷調整方法，高分子微粒子の分散水溶液，及びその製造方法 中川勝, 岸本洋昭, 長井勝利 Property Type: Patent 導電性中空形状材料および異方導電材料 中川勝, 長嶋太一, 斉藤道雄, 川島真一, 山田光昭, 羽山秀和, 石川雄一, 孫仁徳 Property Type: Patent 共重合体高分子，金属被覆物，金属配線基板 中川勝, 鈴木悠二, 名輪希, 彌田智一 Property Type: Patent 磁性中空材料およびその製造方法 中川勝, 長嶋太一, 斉藤道雄, 川島真一, 村瀬裕明, 山田光昭 Property Type: Patent 第４級アンモニウム塩及びその製造方法 勝山智祐, 秦英夫, 中川勝 Property Type: Patent シランカップリング剤 中川勝 Property Type: Patent ブロック共重合体，およびミクロ相分離構造膜の製造方法 彌田智一, 田顔清, 孔祥興, 渡辺一史, 阿部二朗, 中川勝, 植草貴行 特許第3979470号 Property Type: Patent 新規両性化合物およびその分子集合体 中川勝, 青木健一, 関隆広, 市村國宏, 小野沢孝, 太原研二 Property Type: Patent メソ組織体の製造方法 関隆広, 中川勝, 川島康裕 特許第3748541号 Property Type: Patent 高分子グラフト基板製造方法 中川勝, 市村國宏 特許第4020247号 Property Type: Patent 中空形状物及びその製造方法 中川勝, 関隆広, 市村國宏 特許第3533402号 Property Type: Patent 金属配線基板および金属配線基板の製造方法 中川勝, 市村國宏 Property Type: Patent インプリントモールドおよびその製造方法ならびに再生インプリントモールドの製造方法 山崎裕之, 安藤雅郎, 竹内正樹, 中川勝, 伊東駿也 Property Type: Patent 光硬化物の製造方法 中川勝, 月館義隆, 大幸武司, 三宅弘人 Property Type: Patent 磁性粒子、及びその製造方法、並びに磁性粒子含有製剤 並木禎尚, 北本仁孝, 渕上輝顕, 河村亮, 中川勝 特許第5526156号 Property Type: Patent パターン形成用光硬化性組成物及びこれを用いた膜厚測定方法 坂井信支, 平澤玉乃, 小林敬, 中川勝 Property Type: Patent Show all Show first 5 Research Projects 17 モノマー超薄膜の光重合とナノスケールでの力学物性の均一化 Competitive 中川勝 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 2015/04/01 - 2019/03/31 蛍光干渉縞によるsub-10nmアライメント制御技術の創世 Competitive 中川勝 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 2014/04/01 - 2016/03/31 ナノインプリントにおけるレジスト残膜の均一化を実現する液状レジンパターン配置印刷技術開発 Competitive 岐阜県産業経済振興センター Offer Organization: 経済産業省 System: 戦略的基盤技術高度化支援事業（サポイン事業） 2013/09 - 2016/03 超高速ナノインプリントグラフィ技術のプロセス科学と制御技術の開発 Competitive 松井真二 Offer Organization: 科学技術振興機構 System: JST Basic Research Programs (Core Research for Evolutional Science and Technology :CREST) 2008/10 - 2014/03/31 分子エレクトロニクスに資する電極作製技術と機能分子接合 Competitive 中川勝 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 2010/04/01 - 2012/03/31 「強磁性中空骨格をもつ癌血管指向性ナノ粒子の創製」と「生体適合磁石の体内留置」を組み合わせた癌治療ドラッグデリバリーシステムの開発 Competitive 並木禎尚 Offer Organization: 新エネルギー・産業技術総合開発機構 System: The Other Research Programs 2008/06 - 2012/03 超異方性ナノシリンダー構造形成・転写過程のX線散乱-分光同時評価とダイナミクス Competitive 彌田 智一 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 2006/04/01 - 2011/03/31 熱ナノインプリント対応金属加工用レジスト高分子薄膜の究明 Competitive 中川勝 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 2008/04 - 2010 微細配線用異方導電高分子シートの開発 Competitive 中川勝 Offer Organization: 新エネルギー・産業技術総合開発機構 System: 産業技術研究助成事業 若手研究グラント 2005/07 - 2008/06 垂直配向ナノ相分離構造の創製と転写ナノ金属化材料 Competitive 彌田 智一 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 2003/04/01 - 2006/03/31 ポジ型感光性高分子の界面吸着膜による環境低負荷型金属配線基板の開発 Competitive 中川勝 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 2002/04/01 - 2005/03/31 レドックス機能共役分子の動的ナノ組織化と電子構造制御 Competitive 彌田 智一 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 2002/04/01 - 2004/03/31 ブロック共重合体のミクロ相分離を利用した電子・イオンチェンネルの作製 Competitive 彌田 智一 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 2002/04/01 - 2003/03/31 パターン化単分子膜上での界面電荷情報の増幅による選択的な物質補捉 Competitive 中川勝 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 2001/04/01 - 2003/03/31 界面吸着分子の光重合反応を利用したナノ・マイクロパターン化単分子膜の作製 Competitive 中川勝 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 2000/04/01 - 2002/03/31 二次元高分子組織体のフォトメカニカル特性 Competitive 関隆宏 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 1997/04/01 - 1998/03/31 高分子表面で規制される色素分子の光化学的な配向制御 Competitive 市村國宏 Offer Organization: 日本学術振興会 System: Grant-in-Aid for Scientific Research 1996/04/01 - 1997/03/31 Show all Show first 5 Social Activities 7 宮城第一高等学校 見学 2020/10/21 - 2020/10/21 次世代の半導体製造技術にイノベーション 2018/06/25 - KOACHで半導体の世界が変わった 2018/04/10 - 期待のナノインプリントリソグラフィ、現状と今後の課題 2016/08/08 - 東北大と産総研との連携事例-CO2ナノインプリント技術 2016/03 - 先端技術の普及には、KOACHのクリーン環境が欠かせない 2015/07/10 - ナノインプリントに新風 大面積化で用途も拡大 2014/03/17 - Show all Show first 5 Media Coverage 18 世界最先端の技術改革を支えるKOACH新たな価値を創造 週刊ダイヤモンド 2018/07/28 Type: Newspaper, magazine 高度な製造環境をつくるクリーンルーム 日刊工業新聞 2017/05/12 Type: Newspaper, magazine ナノインプリントリソグラフィの現状と今後の課題 JSAP Bulletin 2016/08 Type: Promotional material 東工大など、ナノインプリントでアクリル樹脂に原子サイズの加工に成功 日刊工業新聞 2014/06/16 Type: Newspaper, magazine 半導体ナノロッド 基板上に1方向配列 化学工業日報（８面) 2013/05/23 Type: Newspaper, magazine 磁性、導電性制御できるニッケルナノチューブ 化学工業日報 2009/09/19 Type: Newspaper, magazine プリント基板 金属配線幅１／５０の１００ナノ 日本経済新聞（１５面) 2007/09/21 Type: Newspaper, magazine １００ナノ?の微細に成功 感光性単分子膜を塗布 化学工業日報（５面) 2007/09/11 Type: Newspaper, magazine ナノサイズ金粒子、基板に規則的に配列 日経産業新聞 2005/11/16 Type: Newspaper, magazine 金ナノ粒子、高分子膜透過させてパターン形成 化学工業日報（８面) 2005/11/08 Type: Newspaper, magazine 電気的接合で微細配線（異方導電性フィルム) 化学工業日報（８面) 2005/06/06 Type: Newspaper, magazine 磁性ニッケルナノチューブの開発、リサイクル可能な分子集合体を鋳型に利用 化学と工業（第５８巻、第４号、ｐ４９４) 2005/04/01 Type: Newspaper, magazine 仕事に使える技術の話１７ 極小のチューブ プレジデント（ｐ１４８) 2004/12/26 Type: Newspaper, magazine ニッケルナノチューブ量産 日経産業新聞（１１面) 2004/03/31 Type: Newspaper, magazine ひらめきの瞬間（そのためにうまれた) 日経サイエンス（裏表紙の前面) 2004/03/25 Type: Newspaper, magazine ２１世紀の気鋭 金属で中空繊維 日経産業新聞（７面) 2003/09/18 Type: Newspaper, magazine 単分子膜の感光剤 日経産業新聞（８面) 2003/06/27 Type: Newspaper, magazine ニッケル電極太さ自在に 日経産業新聞 2002/04/18 Type: Newspaper, magazine Show all Show first 5
